-
1
المؤلفون: Wenhu Liu, Nagarajan Raghavan, Xing Wu, Michel Bosman, Thomas Kauerauf, Kin Leong Pey
المصدر: 2011 International Reliability Physics Symposium.
مصطلحات موضوعية: Materials science, business.industry, Transistor, Gate dielectric, Electrical engineering, Noise (electronics), law.invention, Threshold voltage, law, Gate oxide, Logic gate, Electrode, Optoelectronics, business, Metal gate
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9bb35ea818eaadfe2b62b4c3f2cdc36d
https://doi.org/10.1109/irps.2011.5784474 -
2
المؤلفون: Hongyu Yu, Miyuki Kouda, Sunil Singh Kushvaha, Michel Bosman, Zhongrui Wang, K. Shubhakar, Nagarajan Raghavan, Hiroshi Iwai, K. L. Pey, Sean J. O’Shea, Kuniyuki Kakushima
المصدر: 2011 International Reliability Physics Symposium.
مصطلحات موضوعية: Materials science, Dielectric strength, business.industry, Time-dependent gate oxide breakdown, Nanotechnology, Dielectric, law.invention, Nanoelectronics, law, Optoelectronics, Grain boundary, Crystallite, Scanning tunneling microscope, Metal gate, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c1850c906cac0dff85fd6b262a479c4e
https://doi.org/10.1109/irps.2011.5784578