المؤلفون: Hosoya, T.^Aff2, Shindo, S.^Aff2, Yaguchi, H.^Aff2, Ichikawa, T.^Aff2, Tanimoto, K.^Aff3, Kazumori, M.^Aff4, Yanagi, H.^Aff5, Asakura, H.^Aff6

المساهمون: Kittel, Peter, editor^Aff1

المصدر: Advances in Cryogenic Engineering : Part A. 41:769-776