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المؤلفون: Ivana Capan, Lis K. Nanver, Tomislav Suligoj, Tihomir Knezevic
المساهمون: Integrated Devices and Systems
المصدر: IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices, 68(6), 2810-2817. IEEEمصطلحات موضوعية: Junctions, ultrashallow junctions, Silicon, Materials science, chemistry.chemical_element, pure boron (PureB) diodes, 01 natural sciences, law.invention, Single-photon avalanche diodes, law, 0103 physical sciences, Doping, Breakdown voltage, interface charge, photodiode, Electrical and Electronic Engineering, Photodiodes, Diode, 010302 applied physics, Equivalent series resistance, business.industry, cryogenic measurement, Schottky diode, Computational modeling, Electronic, Optical and Magnetic Materials, Photodiode, thin-film boron layers, chemistry, Performance evaluation, Optoelectronics, single-photon avalanche diode (SPAD), business, Aluminum, Dark current
وصف الملف: application/pdf
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المؤلفون: D. Thammaiah Shivakumar, Tihomir Knežević, Lis K. Nanver
المساهمون: MESA+ Institute, Integrated Devices and Systems
المصدر: Shivakumar, D T, Knežević, T & Nanver, L K 2021, ' Nanometer-thin pure boron CVD layers as material barrier to Au or Cu metallization of Si ', Journal of Materials Science: Materials in Electronics, vol. 32, no. 6, pp. 7123-7135 . https://doi.org/10.1007/s10854-021-05422-7
Journal of Materials Science: Materials in Electronics, 32(6), 7123-7135. Springerمصطلحات موضوعية: Materials science, Silicon, aluminum (Al), electron-beam-assisted physical vapor deposition (EBPVD), copper (Cu), gold (Au), material barrier, boron thin-films, ultrashallow junctions, UT-Hybrid-D, chemistry.chemical_element, 02 engineering and technology, 01 natural sciences, Electron beam physical vapor deposition, Aluminium, 0103 physical sciences, Electrical and Electronic Engineering, Boron, Deposition (law), 010302 applied physics, business.industry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Copper, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, chemistry, Physical vapor deposition, Optoelectronics, Nanometre, 0210 nano-technology, business
وصف الملف: application/pdf
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المؤلفون: Erwin Hardeveld, Tomislav Suligoj, Xingyu Liu, Lis K. Nanver, Tihomir Knezevic
المصدر: IEEE electron device letters, 40(6):8686173, 858-861. IEEE
مصطلحات موضوعية: Silicon, Materials science, Analytical chemistry, chemistry.chemical_element, Chemical vapor deposition, 01 natural sciences, Photodiode, Ultrashallow junctions, Saturation current, 0103 physical sciences, Monolayer, Electron injection, Electrical and Electronic Engineering, Boron, Quantum tunnelling, Diode, 010302 applied physics, chemical-vapor deposition, electron injection, monolayer, photodiodes, pure boron, silicon, ultrashallow junction, Chemical-vapor deposition, 22/4 OA procedure, Acceptor, Pure boron (PureB), Electronic, Optical and Magnetic Materials, chemistry
وصف الملف: application/pdf
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المؤلفون: Shannan Chang, Yaping Dan, Chufan Zhang
المصدر: Advances in Physics: X, Vol 6, Iss 1 (2021)
مصطلحات موضوعية: Materials science, molecular monolayer doping, Silicon, QC1-999, ultrashallow junctions, General Physics and Astronomy, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, Integrated circuit, Quantum devices, law.invention, Condensed Matter::Materials Science, Computer Science::Hardware Architecture, Computer Science::Emerging Technologies, molecular beam epitaxy, law, Condensed Matter::Superconductivity, Hardware_INTEGRATEDCIRCUITS, ion implantation, Quantum computer, business.industry, Physics, Doping, Transistor, sub-second thermal annealing, Ion implantation, chemistry, ComputerSystemsOrganization_MISCELLANEOUS, Optoelectronics, Condensed Matter::Strongly Correlated Electrons, business, Hardware_LOGICDESIGN, Molecular beam epitaxy
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المؤلفون: P. Vogelsang, Tihomir Knežević, A. Sakic, Carel Th. H. Heerkens, T.L.M. Scholtes, K. Kooijman, Gerard Nicolaas Anne van Veen, Lis K. Nanver
المصدر: Solid-State Electronics. :38-44
مصطلحات موضوعية: Materials science, business.industry, Analytical chemistry, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Photodiode, law.invention, Responsivity, law, Etching (microfabrication), Materials Chemistry, Electron beam processing, Optoelectronics, Wafer, Irradiation, Electrical and Electronic Engineering, business, silicon photodiodes, electron detection, low-energy electrons, boron deposition, ultrashallow junctions, responsivity, electron signal gain, electron irradiation, dark current degradation, Dark current, Diode
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المؤلفون: T.L.M. Scholtes, Vladimir Jovanovic, V. Gonda, Lis K. Nanver, Johan van der Cingel, Cleber Biasotto, Daniel Vidal
المصدر: Journal of Electronic Materials, 40 (11), 2011
مصطلحات موضوعية: Fabrication, Materials science, medicine.medical_treatment, ultrashallow junctions, Analytical chemistry, low-temperature processing, Dopant Activation, excimer laser annealing, law.invention, reflective masking layer, Electrical resistivity and conductivity, law, tilted implantations, Materials Chemistry, medicine, Electrical and Electronic Engineering, Diode, Excimer laser, business.industry, Condensed Matter Physics, Laser, Electronic, Optical and Magnetic Materials, Transmission electron microscopy, Optoelectronics, business, Layer (electronics)
وصف الملف: application/pdf
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المؤلفون: V. Gonda, Cleber Biasotto, Lis K. Nanver, J. van der Cingel, Vladimir Jovanovic
المساهمون: De Lima Monteiro, D., Bonnaud, O., Morimoto, N.
المصدر: ECS Transactions, 23 (1), 2009
مصطلحات موضوعية: Materials science, Dopant, business.industry, Oxide, Recrystallization (metallurgy), Chemical vapor deposition, ultrashallow junctions, excimer laser annealing, amorphous silicon recrystallization, Secondary ion mass spectrometry, chemistry.chemical_compound, Optics, chemistry, Transmission electron microscopy, business, Sheet resistance, Diode
وصف الملف: application/pdf
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المؤلفون: Maryam Shayesteh, Anne-Marie Kelleher, John Kearney, Ray Duffy, Mary Anne White
المصدر: Applied Physics Letters. 96:231909
مصطلحات موضوعية: Silicon, Materials science, Physics and Astronomy (miscellaneous), Annealing (metallurgy), Analytical chemistry, Activation, chemistry.chemical_element, Elemental semiconductors, Germanium, Epitaxy, Annealing, Ultrashallow junctions, Diffusion, Doping, Thermal stability, Sheet resistance, Deactivation, Recrystallization (metallurgy), Phosphorus, Recrystallization, Implantation, Crystallography, chemistry, Defects, Mechanism, Shallow junction
وصف الملف: application/pdf
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المؤلفون: K. R. C. Mok, Lis K. Nanver, Mahdi Aminian, Edoardo Charbon, Lin Qi
مصطلحات موضوعية: Materials science, ultrashallow junctions, medicine.disease_cause, law.invention, Optics, ultraviolet (UV), law, medicine, Geiger counter, Electrical and Electronic Engineering, Diode, Avalanche diode, chemical vapor deposition (CVD), business.industry, Avalanche breakdown, Electronic, Optical and Magnetic Materials, Anode, Wavelength, Single-photon avalanche diode, Optoelectronics, single-photon avalanche diode (SPAD), business, boron, Geiger-mode avalanche photodiode, Ultraviolet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6773005556c4db49f89f81bed9d7f55e
https://infoscience.epfl.ch/record/204091