-
1
المؤلفون: David E. Kotecki, Jonathan D. Chapple‐Sokol
المصدر: Journal of Applied Physics. 77:1284-1293
مصطلحات موضوعية: Materials science, Hydrogen, Silicon, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Substrate (electronics), Chemical vapor deposition, Silane, chemistry.chemical_compound, chemistry, Silicon nitride, Thin film, Stoichiometry
-
2
المؤلفون: Steven G. Barbee, Justin Wai-chow Wong, Donald Leslie Wilson, David E. Kotecki, Rudolph J. Eschbach, Steven P. Zuhoski, Richard A. Conti, Jonathan D. Chapple-Sokol, Theodore D. Cacouris
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:2752
مصطلحات موضوعية: Chemistry, business.industry, Nuclear engineering, General Engineering, Analytical chemistry, Fluid mechanics, Injector, Chemical vapor deposition, Computational fluid dynamics, law.invention, law, Mass transfer, Heat transfer, Deposition (phase transition), Wafer, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::833e40b252e26424942eb09a694c669e
https://doi.org/10.1116/1.587187