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المؤلفون: Xuan Gong, Wei William Lee, Yukun Wu, Hui Wang
المصدر: Sensors
Volume 20
Issue 19
Sensors, Vol 20, Iss 5710, p 5710 (2020)
Sensors (Basel, Switzerland)مصطلحات موضوعية: Computer science, kernel approximation, Feature vector, intrusion detection, 02 engineering and technology, Intrusion detection system, lcsh:Chemical technology, Biochemistry, Article, Analytical Chemistry, symbols.namesake, 0202 electrical engineering, electronic engineering, information engineering, Gaussian function, lcsh:TP1-1185, support vector machine, Electrical and Electronic Engineering, Instrumentation, random Fourier feature, NSL-KDD, 020208 electrical & electronic engineering, Autoencoder, Atomic and Molecular Physics, and Optics, Support vector machine, Feature Dimension, Feature (computer vision), stacked auto-encoder, symbols, 020201 artificial intelligence & image processing, Algorithm, Curse of dimensionality
وصف الملف: application/pdf
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المؤلفون: David Wei Zhang, Shi-Jin Ding, Wei William Lee, Ji-Tao Wang
المصدر: Applied Surface Science. 206:321-330
مصطلحات موضوعية: Auger electron spectroscopy, Materials science, Annealing (metallurgy), Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Sputter deposition, Condensed Matter Physics, Electron spectroscopy, Copper, Surfaces, Coatings and Films, Amorphous solid, Surface coating, chemistry, X-ray photoelectron spectroscopy
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المؤلفون: Ji-Tao Wang, Shi-Jin Ding, Qing-Quan Zhang, Wei William Lee, David Wei Zhang
المصدر: Journal of Physics: Condensed Matter. 13:6595-6608
مصطلحات موضوعية: Auger electron spectroscopy, X-ray photoelectron spectroscopy, Annealing (metallurgy), Sputtering, Chemistry, Scanning electron microscope, Analytical chemistry, General Materials Science, Thin film, Sputter deposition, Condensed Matter Physics, Electron spectroscopy
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المؤلفون: Qing-Quang Zhang, David Wei Zhang, Wei William Lee, Shi-Jin Ding, Yong-Dong Zhou, Ji-Tao Wang
المصدر: Applied Surface Science. 178:140-148
مصطلحات موضوعية: Materials science, Annealing (metallurgy), Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Surfaces and Interfaces, General Chemistry, Dielectric, Condensed Matter Physics, Surfaces, Coatings and Films, Carbide, Amorphous solid, chemistry.chemical_compound, chemistry, X-ray photoelectron spectroscopy, Aluminium, Fluoropolymer, Fluoride
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المؤلفون: David Wei Zhang, Wei William Lee, Shi-Jin Ding, Ji-Tao Wang
المصدر: Chemical Vapor Deposition. 7:142-146
مصطلحات موضوعية: Permittivity, Chemistry, Process Chemistry and Technology, Analytical chemistry, Infrared spectroscopy, Surfaces and Interfaces, General Chemistry, Plasma, Dielectric, symbols.namesake, X-ray photoelectron spectroscopy, Plasma-enhanced chemical vapor deposition, symbols, Thin film, Raman spectroscopy
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::73e1b93cf6702012f5de3865b616842b
https://doi.org/10.1002/1521-3862(200107)7:4<142::aid-cvde142>3.0.co;2-c -
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المؤلفون: Peng-Fei Wang, Ji-Tao Wang, Wei William Lee, David Wei Zhang, Shi-Jin Ding
المصدر: Thin Solid Films. 385:115-119
مصطلحات موضوعية: Chemistry, Metals and Alloys, Analytical chemistry, Surfaces and Interfaces, Chemical vapor deposition, Dielectric, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, Bond length, Molecular geometry, X-ray photoelectron spectroscopy, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Thin film
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المؤلفون: Wang Peng-Fei, Zhang Wei, Ding Shi-Jin, Wei William Lee
المصدر: Chinese Physics. 10:324-328
مصطلحات موضوعية: Nuclear magnetic resonance, Materials science, X-ray photoelectron spectroscopy, Chemical bond, Binding energy, X-ray, Analytical chemistry, General Physics and Astronomy, Chemical vapor deposition, Spectral line, Deposition temperature
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المؤلفون: Shi-Jin Ding, Pengfei Wang, Wei William Lee, Ji-Tao Wang, David Wei Zhang
المصدر: Journal of Physics D: Applied Physics. 34:155-159
مصطلحات موضوعية: Acoustics and Ultrasonics, Chemistry, Analytical chemistry, Infrared spectroscopy, Chemical vapor deposition, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Chemical bond, X-ray photoelectron spectroscopy, Plasma-enhanced chemical vapor deposition, Fluorocarbon, Fourier transform infrared spectroscopy, Spectroscopy
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المؤلفون: Richard A. Chapman, Wei William Lee, M. Hanratty, Antonio L. P. Rotondaro, Mark S. Rodder, Ih-Chin Chen, Sunil V. Hattangady, J.C. Hu, Robert Kraft, Chih-Ping Chao, H. Yang, Amitava Chatterjee
المصدر: International Electron Devices Meeting. IEDM Technical Digest.
مصطلحات موضوعية: Electron mobility, Materials science, business.industry, Electrical engineering, Analytical chemistry, chemistry.chemical_element, PMOS logic, chemistry, CMOS, Gate oxide, MOSFET, Metal gate, business, Tin, NMOS logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ca93296654543f936719e26e9eb31a39
https://doi.org/10.1109/iedm.1997.650508 -
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المؤلفون: Judith A. Halstead, Wei William Lee, Robert R. Reeves
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:653-655
مصطلحات موضوعية: Auger electron spectroscopy, Materials science, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Chemical vapor deposition, Tungsten, equipment and supplies, Condensed Matter Physics, Rutherford backscattering spectrometry, Electron spectroscopy, Surfaces, Coatings and Films, Tungsten film, Carbon film, chemistry, Plasma-enhanced chemical vapor deposition