المؤلفون: Knezevic, T., Liu, X., Hardeveld, E., Suligoj, T., Nanver, L.K.

المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 40(6):858-861 Jun, 2019

المؤلفون: Erwin Hardeveld, Tomislav Suligoj, Xingyu Liu, Lis K. Nanver, Tihomir Knezevic

المصدر: IEEE electron device letters, 40(6):8686173, 858-861. IEEE

مصطلحات موضوعية: Silicon, Materials science, Analytical chemistry, chemistry.chemical_element, Chemical vapor deposition, 01 natural sciences, Photodiode, Ultrashallow junctions, Saturation current, 0103 physical sciences, Monolayer, Electron injection, Electrical and Electronic Engineering, Boron, Quantum tunnelling, Diode, 010302 applied physics, chemical-vapor deposition, electron injection, monolayer, photodiodes, pure boron, silicon, ultrashallow junction, Chemical-vapor deposition, 22/4 OA procedure, Acceptor, Pure boron (PureB), Electronic, Optical and Magnetic Materials, chemistry

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6372318a1550437214f8376f13699cc5
https://doi.org/10.1109/led.2019.2910465