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1دورية أكاديمية
المؤلفون: Biasotto, Cleber, Gonda, Viktor, Nanver, Lis K., Scholtes, Tom L.M., van der Cingel, Johan, Vidal, Daniel, Jovanović, Vladimir
المصدر: Journal of Electronic Materials. November 2011 40(11):2187-2196
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2
المؤلفون: T.L.M. Scholtes, Vladimir Jovanovic, V. Gonda, Lis K. Nanver, Johan van der Cingel, Cleber Biasotto, Daniel Vidal
المصدر: Journal of Electronic Materials, 40 (11), 2011
مصطلحات موضوعية: Fabrication, Materials science, medicine.medical_treatment, ultrashallow junctions, Analytical chemistry, low-temperature processing, Dopant Activation, excimer laser annealing, law.invention, reflective masking layer, Electrical resistivity and conductivity, law, tilted implantations, Materials Chemistry, medicine, Electrical and Electronic Engineering, Diode, Excimer laser, business.industry, Condensed Matter Physics, Laser, Electronic, Optical and Magnetic Materials, Transmission electron microscopy, Optoelectronics, business, Layer (electronics)
وصف الملف: application/pdf
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3
المؤلفون: V. Gonda, Cleber Biasotto, Lis K. Nanver, J. van der Cingel, Vladimir Jovanovic
المساهمون: De Lima Monteiro, D., Bonnaud, O., Morimoto, N.
المصدر: ECS Transactions, 23 (1), 2009
مصطلحات موضوعية: Materials science, Dopant, business.industry, Oxide, Recrystallization (metallurgy), Chemical vapor deposition, ultrashallow junctions, excimer laser annealing, amorphous silicon recrystallization, Secondary ion mass spectrometry, chemistry.chemical_compound, Optics, chemistry, Transmission electron microscopy, business, Sheet resistance, Diode
وصف الملف: application/pdf
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المؤلفون: Biasotto, C.
المساهمون: Nanver, L.K.
المصدر: None
مصطلحات موضوعية: CMOS, strained silicon, ultrashallow junctions, DotFET, low-temperature gate-stack, MISFETs, D-DotFET, silicon-germanium dots, excimer laser annealing
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=narcis______::07765923fd838885c47b4edc4ca33508
http://resolver.tudelft.nl/uuid:b742f141-1351-432f-b551-6249e65ce822 -
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مصطلحات موضوعية: CMOS, strained silicon, ultrashallow junctions, DotFET, low-temperature gate-stack, MISFETs, D-DotFET, silicon-germanium dots, excimer laser annealing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::e08a2efad90888e9a47ae65b5a51f35c
http://resolver.tudelft.nl/uuid:b742f141-1351-432f-b551-6249e65ce822 -
6
مصطلحات موضوعية: Si CVD epitaxy, Si dopant drive-in, C-V doping profiling, varactor diodes, ultrashallow junctions, Schottky diodes, Si device modeling, arsenic doping, excimer laser annealing, low-temperature junction formation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::8aa4e3d00228d1967326bfd7f5c5e29c
http://resolver.tudelft.nl/uuid:9acfce4e-0cab-4d85-b1a3-ce9ed0cdb748