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1
المصدر: Microelectronic Engineering. :271-274
مصطلحات موضوعية: Materials science, business.industry, Proximity effect (electron beam lithography), Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, Resist, X-ray lithography, Electrical and Electronic Engineering, business, Lithography, Three dimensional model
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2
المؤلفون: Stephan Wagner, Vivek K. Singh, Yan Borodovsky, Kenny Kal Vin Toh, Bin Hu, Srinivas B. Bollepalli
المصدر: Optical Microlithography XXI.
مصطلحات موضوعية: Moore's law, Pixel, Image quality, Computer science, Computational lithography, business.industry, media_common.quotation_subject, Sizing, law.invention, Design for manufacturability, Computational science, Optics, Optical proximity correction, law, Wafer, Node (circuits), Photolithography, business, Lithography, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::222f3e774cc70fc093ad25bb02f37705
https://doi.org/10.1117/12.773248 -
3
المؤلفون: Paul Davids, Srinivas B. Bollepalli
المصدر: Optical Microlithography XXI.
مصطلحات موضوعية: Mathematical optimization, Generalized inverse, Iterative method, Computer science, Bilinear interpolation, Inverse problem, law.invention, Matrix (mathematics), Coherence theory, law, Photolithography, Projection (set theory), Representation (mathematics), Lithography, Algorithm, Partial coherence
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ac177a0c05049d84b19ae9d6020617f5
https://doi.org/10.1117/12.772040 -
4
المؤلفون: Richard E. Schenker, Bin Hu, Yan Borodovsky, Vivek K. Singh, Kenny Kal Vin Toh, Karmen Yung, Wen-Hao Cheng, Srinivas B. Bollepalli
المصدر: Optical Microlithography XXI.
مصطلحات موضوعية: Materials science, business.industry, Computational lithography, Phase (waves), Integrated circuit, Chip, law.invention, Optics, Optical proximity correction, law, Photolithography, business, Random logic, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::da9d2b831b4fc8ec64aaa387fd743b04
https://doi.org/10.1117/12.771677 -
5
المؤلفون: Wenlong Jiang, Olga Vladimirsky, James W. Taylor, Klaus Simon, Srinivas B. Bollepalli, Q. Leonard, Yuli Vladimirsky, Niru V. Dandekar
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, Resist, Proximity effect (electron beam lithography), Chemistry, business.industry, Wafer, X-ray lithography, Photomask, business, Lithography, Immersion lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d9ecc628b2634bb486496da11df939e
https://doi.org/10.1117/12.351161 -
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المؤلفون: L. Rathbun, Yuli Vladimirsky, Olga Vladimirsky, Q. Leonard, Lei Yang, James W. Taylor, Srinivas B. Bollepalli, Richard C. Tiberio, Jaz Bansel, Mumit Khan, Franco Cerrina, Klaus Simon
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Fabrication, X-ray lithography, Nanotechnology, Photoresist, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8289491f50e34e4ef03a3a8fb8a83cb6
https://doi.org/10.1117/12.351147 -
7
المؤلفون: Franco Cerrina, Srinivas B. Bollepalli, Mumit Khan
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Image formation, Engineering, business.industry, law.invention, Wavelength, Optics, Resist, law, Wafer, X-ray lithography, Photolithography, business, Lithography, Generator (mathematics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1096c3102f90e640e961345f43530e6c
https://doi.org/10.1117/12.276038 -
8
المؤلفون: Scott Daniel Hector, Franco Cerrina, Juan R. Maldonado, Srinivas B. Bollepalli, Mumit Khan, Jeffrey A. Leavey
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Image formation, Materials science, Fabrication, business.industry, Attenuation, Synchrotron, law.invention, Optics, Resist, law, Photomask, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1a8491c029b038cf98fde155b51bd6d3
https://doi.org/10.1117/12.275772 -
9دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
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المؤلفون: Juan R. Maldonado, Mumit Khan, Franco Cerrina, Srinivas B. Bollepalli, Geng Han
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17:3426
مصطلحات موضوعية: Physics, business.industry, Extreme ultraviolet lithography, General Engineering, Synchrotron radiation, Optics, Beamline, Optoelectronics, X-ray lithography, business, Lithography, Next-generation lithography, Storage ring, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e4591aefdd532dac622c68f834f01f61
https://doi.org/10.1116/1.591024