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المؤلفون: Uthayasankaran Peralagu, Ian M. Povey, Yen-Chun Fu, Paul K. Hurley, David Millar, Iain G. Thayne, Olesya Ignatova, Khalid Hossain, Xu Li, Matthew J. Steer, Terry G Golding, Manish Jain, Ravi Droopad
المصدر: ECS Transactions. 69:15-36
مصطلحات موضوعية: Engineering, Anisotropic etching, Fabrication, Fin, Passivation, business.industry, TK, Optoelectronics, High resolution, Nanotechnology, Dry etching, business, Two stages
وصف الملف: application/pdf
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المؤلفون: M. Chang, Jessica S. Kachian, Kasra Sardashti, Jun Hong Park, Ravi Droopad, Andrew C. Kummel, Evgueni Chagarov, Tyler Kent, Mary Edmonds
المصدر: Journal of the American Chemical Society. 137:8526-8533
مصطلحات موضوعية: Silicon, Passivation, Chemistry, Hydride, Inorganic chemistry, Dangling bond, chemistry.chemical_element, General Chemistry, Chemical vapor deposition, Substrate (electronics), Biochemistry, Catalysis, Colloid and Surface Chemistry, Chemical engineering, Gate oxide, Layer (electronics)
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3
المؤلفون: Evgeniy Chagarov, Ravi Droopad, Andrew C. Kummel, Tyler Kent, Mary Edmonds
المصدر: ACS Nano. 9:4843-4849
مصطلحات موضوعية: Materials science, Passivation, business.industry, Transistor, Fermi level, Inorganic chemistry, General Engineering, Oxide, General Physics and Astronomy, equipment and supplies, law.invention, Condensed Matter::Materials Science, symbols.namesake, chemistry.chemical_compound, Semiconductor, chemistry, law, symbols, Optoelectronics, General Materials Science, Density functional theory, Scanning tunneling microscope, business, Metallic bonding
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4
المؤلفون: Kechao Tang, Felix Palumbo, Liangliang Zhang, Paul C. McIntyre, Ravi Droopad
المصدر: CONICET Digital (CONICET)
Consejo Nacional de Investigaciones Científicas y Técnicas
instacron:CONICETمصطلحات موضوعية: Fabrication, Materials science, Hydrogen, Passivation, Ciencias Físicas, chemistry.chemical_element, 02 engineering and technology, 01 natural sciences, purl.org/becyt/ford/1 [https], Trap (computing), Condensed Matter::Materials Science, 0103 physical sciences, MOSCAP, General Materials Science, Physics::Atomic Physics, Deposition (law), INTERFACE TRAPS, 010302 applied physics, business.industry, AL2O3, HYDROGEN DEPASSIVATION, purl.org/becyt/ford/1.3 [https], 021001 nanoscience & nanotechnology, BORDER TRAPS, INGAAS, Astronomía, Hysteresis, chemistry, RELIABILITY, Optoelectronics, 0210 nano-technology, Forming gas, business, Layer (electronics), CIENCIAS NATURALES Y EXACTAS
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8ed54a005fe6dd6d0a8c215ab0a5984
https://pubs.acs.org/doi/10.1021/acsami.6b16232 -
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المؤلفون: Jessica S. Kachian, Evgueni Chagarov, Tyler Kent, M. Chang, Ravi Droopad, Kasra Sardashti, Andrew C. Kummel, Steven Wolf, Mary Edmonds
المصدر: 2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA).
مصطلحات موضوعية: Materials science, Diffusion barrier, Passivation, Silicon, business.industry, Dangling bond, chemistry.chemical_element, Nanotechnology, Strained silicon, Germanium, Substrate (electronics), chemistry, Optoelectronics, Field-effect transistor, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::10ba3180db183e0abd7341e9b605a055
https://doi.org/10.1109/vlsi-tsa.2016.7480528 -
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المؤلفون: Ravi Droopad, Wilhelm Melitz, Jian Shen, Darby L. Feldwinn, Andrew C. Kummel
المصدر: Microelectronic Engineering. 88:377-382
مصطلحات موضوعية: Condensed matter physics, Passivation, Interfacial bonding, Annealing (metallurgy), Chemistry, Scanning tunneling spectroscopy, Electronic structure, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, law.invention, Crystallography, law, Monolayer, Electrical and Electronic Engineering, Scanning tunneling microscope, Surface reconstruction
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المؤلفون: Paul C. McIntyre, Ravi Droopad, Kechao Tang
المصدر: Journal of Applied Physics. 123:025708
مصطلحات موضوعية: 010302 applied physics, Materials science, Passivation, Hydrogen, business.industry, Annealing (metallurgy), Oxide, General Physics and Astronomy, chemistry.chemical_element, Biasing, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Gallium arsenide, chemistry.chemical_compound, chemistry, Deuterium, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Forming gas
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المؤلفون: Ian M. Povey, Ravi Droopad, Paul K. Hurley, Iain G. Thayne, Yen-Chun Fu, Xu Li, Scott Monaghan, Uthayasankaran Peralagu, Olesya Ignatova, Jun Lin
المصدر: 2015 11th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME).
مصطلحات موضوعية: Materials science, Passivation, business.industry, Annealing (metallurgy), Fermi level, Electrical engineering, Analytical chemistry, Epitaxy, law.invention, symbols.namesake, Capacitor, law, symbols, Electronic band structure, business, Forming gas, Molecular beam
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3890bb9de8c2cf2a95dc9143cb08922f
https://doi.org/10.1109/prime.2015.7251406 -
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المؤلفون: Jessica S. Kachian, Mary Edmonds, Tyler Kent, Evgueni Chagarov, Andrew C. Kummel, M. Chang, Ravi Droopad
المصدر: 2015 International Symposium on VLSI Technology, Systems and Applications.
مصطلحات موضوعية: Materials science, Passivation, Silicon, chemistry, business.industry, Annealing (metallurgy), Monolayer, Nucleation, Optoelectronics, chemistry.chemical_element, Nanotechnology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9921dfd1145f640c2fca5608c34f89bd
https://doi.org/10.1109/vlsi-tsa.2015.7117592 -
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المؤلفون: Tyler Kent, Andrew C. Kummel, Mary Edmonds, Ravi Droopad, Jessica S. Kachian, Evgueni Chagarov, M. Chang
المصدر: 2015 International Symposium on VLSI Technology, Systems and Applications.
مصطلحات موضوعية: Materials science, Passivation, Silicon, business.industry, Fermi level, Oxide, chemistry.chemical_element, symbols.namesake, chemistry.chemical_compound, Semiconductor, chemistry, Gate oxide, MOSFET, Electronic engineering, symbols, Optoelectronics, Field-effect transistor, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3eaf93b56ca1a0bcdd73e90f197d496e
https://doi.org/10.1109/vlsi-tsa.2015.7117580