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المؤلفون: Nicolas Reckinger, Emmanuel Dubois, D.A. Yarekha, Constantin Augustin Dutu, Sylvie Godey, Jean-Pierre Raskin, Xiaohui Tang, Jacek Ratajczak, J. Lacszcz, Laurianne Nougaret
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: Thin Solid Films
Thin Solid Films, Elsevier, 2012, 520, pp.4501-4505. ⟨10.1016/j.tsf.2012.02.076⟩
Thin Solid Films, 2012, 520, pp.4501-4505. ⟨10.1016/j.tsf.2012.02.076⟩مصطلحات موضوعية: 010302 applied physics, Materials science, Fabrication, Annealing (metallurgy), Schottky barrier, Ultra-high vacuum, Metals and Alloys, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Surfaces and Interfaces, 021001 nanoscience & nanotechnology, 01 natural sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Erbium, X-ray photoelectron spectroscopy, chemistry, Transmission electron microscopy, 0103 physical sciences, Materials Chemistry, Thin film, 0210 nano-technology
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المؤلفون: Fritz Phillipp, E. Dupois, A. Łaszcz, J. Katcki, P. A. van Aken, Nicolas Reckinger, J. Ratajczak, A. Czerwinski
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: XIII International Conference on Electron Microscopy, EM'2008
XIII International Conference on Electron Microscopy, EM'2008, 2008, Cracow-Zakopane, Poland
Journal of Microscopy
Journal of Microscopy, Wiley, 2010, 237, pp.379-383. ⟨10.1111/j.1365-2818.2009.03264.x⟩
Journal of Microscopy, 2010, 237, pp.379-383. ⟨10.1111/j.1365-2818.2009.03264.x⟩مصطلحات موضوعية: 010302 applied physics, Histology, Materials science, business.industry, Annealing (metallurgy), Schottky barrier, chemistry.chemical_element, Nanotechnology, 02 engineering and technology, Atmospheric temperature range, 021001 nanoscience & nanotechnology, 01 natural sciences, Pathology and Forensic Medicine, Erbium, chemistry.chemical_compound, chemistry, Sputtering, Transmission electron microscopy, 0103 physical sciences, Silicide, Thermal, Optoelectronics, 0210 nano-technology, business
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المؤلفون: Guilhem Larrieu, Dmytro A. Yarekha, Emmanuel Dubois, Dominique Deresmes, Nicolas Breil, Nicolas Reckinger, Xiaohui Tang, Aomar Halimaoui
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: ECS Transactions
ECS Transactions, Electrochemical Society, Inc., 2009, 19, pp.201-207. ⟨10.1149/1.3117410⟩
ECS Transactions, 2009, 19, pp.201-207. ⟨10.1149/1.3117410⟩مصطلحات موضوعية: 010302 applied physics, Ytterbium, Materials science, business.industry, Schottky barrier, Rare earth, chemistry.chemical_element, Silicon on insulator, 02 engineering and technology, Substrate (electronics), Dielectric, 021001 nanoscience & nanotechnology, 01 natural sciences, Erbium, chemistry.chemical_compound, chemistry, 0103 physical sciences, Silicide, Electronic engineering, Optoelectronics, 0210 nano-technology, business
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المؤلفون: Nicolas Breil, Jacek Ratajczak, A. Laszcz, D.A. Yarekha, Xiaohui Tang, Emmanuel Dubois, Nicolas Reckinger, Guilhem Larrieu
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: Materials Science and Engineering: B
Materials Science and Engineering: B, Elsevier, 2008, 154-155, pp.159-162. ⟨10.1016/j.mseb.2008.10.014⟩
European Materials Research Society Spring Meeting, E-MRS Spring 2008, Symposium I : Front-end junction and contact formation in future Silicon/Germanium based devices
European Materials Research Society Spring Meeting, E-MRS Spring 2008, Symposium I : Front-end junction and contact formation in future Silicon/Germanium based devices, 2008, _, France
Materials Science and Engineering: B, 2008, 154-155, pp.159-162. ⟨10.1016/j.mseb.2008.10.014⟩مصطلحات موضوعية: 010302 applied physics, Electron mobility, Materials science, Dopant, business.industry, Mechanical Engineering, Schottky barrier, Doping, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Platinum silicide, chemistry.chemical_compound, Band bending, chemistry, Mechanics of Materials, 0103 physical sciences, MOSFET, Optoelectronics, General Materials Science, Field-effect transistor, 0210 nano-technology, business
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المؤلفون: Alexandru Vlad, Jacek Ratajczak, Jean-Pierre Raskin, A. Laszcz, Emmanuel Dubois, Constantin Augustin Dutu, Sylvie Godey, Xiaohui Tang, Nicolas Reckinger
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Institute of Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), Université Catholique de Louvain = Catholic University of Louvain (UCL)
المصدر: Journal of The Electrochemical Society
Journal of The Electrochemical Society, Electrochemical Society, 2011, 158, pp.H715-H723. ⟨10.1149/1.3585777⟩مصطلحات موضوعية: Materials science, Annealing (metallurgy), Schottky barrier, Ultra-high vacuum, Analytical chemistry, chemistry.chemical_element, FOS: Physical sciences, 02 engineering and technology, 01 natural sciences, Oxygen, Erbium, chemistry.chemical_compound, X-ray photoelectron spectroscopy, 0103 physical sciences, Silicide, Materials Chemistry, Electrochemistry, 010302 applied physics, [PHYS]Physics [physics], Condensed Matter - Materials Science, Renewable Energy, Sustainability and the Environment, Materials Science (cond-mat.mtrl-sci), 021001 nanoscience & nanotechnology, Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, chemistry, 0210 nano-technology
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المؤلفون: Nicolas Reckinger, Guilhem Larrieu, Jean-Pierre Raskin, Aryan Afzalian, Emmanuel Dubois, Xiaohui Tang, Denis Flandre
المساهمون: IEMN - ISEN, LAAS - CNRS, UCL - SST/ICTM - Institute of Information and Communication Technologies, Electronics and Applied Mathematics, UCL - SST/ICTM/ELEN - Pôle en ingénierie électrique, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Université Catholique de Louvain = Catholic University of Louvain (UCL)
المصدر: Applied Physics Letters, Vol. 98, no. 11, p. 112102 (16 March 2011)
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2011, 98, pp.112102-1-3. ⟨10.1063/1.3567546⟩
Applied Physics Letters, 2011, 98 (11), pp.1121021. ⟨10.1063/1.3567546⟩مصطلحات موضوعية: Condensed Matter - Materials Science, Materials science, Physics and Astronomy (miscellaneous), Dopant, business.industry, Schottky barrier, Materials Science (cond-mat.mtrl-sci), FOS: Physical sciences, Schottky diode, Field emission, chemistry.chemical_compound, chemistry, Silicide, Optoelectronics, Tunneling current, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Current (fluid), business, Nanoscopic scale, Voltage
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المؤلفون: Constantin Augustin Dutu, Jean-Pierre Raskin, Claude Poleunis, Xiaohui Tang, Emmanuel Dubois, Nicolas Reckinger, Arnaud Delcorte
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Université Catholique de Louvain = Catholic University of Louvain (UCL)
المصدر: Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2011, 99, pp.012110-1-3. ⟨10.1063/1.3608159⟩
Applied Physics Letters, 2011, 99 (1), pp.012110. ⟨10.1063/1.3608159⟩مصطلحات موضوعية: 010302 applied physics, Condensed Matter - Materials Science, Materials science, Physics and Astronomy (miscellaneous), Dopant, Annealing (metallurgy), Schottky barrier, Analytical chemistry, Materials Science (cond-mat.mtrl-sci), FOS: Physical sciences, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, [SPI.TRON]Engineering Sciences [physics]/Electronics, Ion, Erbium, chemistry, 0103 physical sciences, Redistribution (chemistry), 0210 nano-technology, Arsenic
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المؤلفون: Jacek Ratajczak, Aomar Halimaoui, D.A. Yarekha, Sylvie Godey, Xiaohui Tang, A. Laszcz, Nicolas Breil, Xavier Wallart, Denis Remiens, Caroline Soyer, Guilhem Larrieu, Nicolas Reckinger, Emmanuel Dubois
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: ECS Transactions
ECS Transactions, Electrochemical Society, Inc., 2009, 19, pp.339-344. ⟨10.1149/1.3118961⟩
ECS Transactions, 2009, 19, pp.339-344. ⟨10.1149/1.3118961⟩مصطلحات موضوعية: 010302 applied physics, Ytterbium, Ultra thin body, Fabrication, Materials science, Silicon, business.industry, Schottky barrier, chemistry.chemical_element, 02 engineering and technology, Electron, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry.chemical_compound, chemistry, 0103 physical sciences, Silicide, MOSFET, Electronic engineering, Optoelectronics, 0210 nano-technology, business
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المؤلفون: Vincent Bayot, Nicolas Reckinger, Emmanuel Dubois, Raúl Rengel, María J. Martín, Xiaohui Tang, Elena Pascual
المساهمون: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: physica status solidi (c)
physica status solidi (c), 2008, 5, pp.119-122. ⟨10.1002/pssc.200776519⟩
physica status solidi (c), Wiley, 2008, 5, pp.119-122. ⟨10.1002/pssc.200776519⟩مصطلحات موضوعية: 010302 applied physics, Condensed matter physics, Chemistry, Scattering, Schottky barrier, Monte Carlo method, Schottky diode, Nanotechnology, 02 engineering and technology, Condensed Matter::Mesoscopic Systems and Quantum Hall Effect, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Depletion region, Electric field, 0103 physical sciences, 0210 nano-technology, Current density, Quantum tunnelling
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المؤلفون: A. Łaszcz, Emmanuel Dubois, Nicolas Reckinger, Dmitri A. Yarekha, Jean-Pierre Raskin, Guilhem Larrieu, Pascal Jacques, Xiaohui Tang, Jacek Ratajczak, Xavier Wallart, Sylvie Godey, Vincent Bayot
المساهمون: UCL - FSA/ELEC - Département d'électricité, Université Catholique de Louvain = Catholic University of Louvain (UCL), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
المصدر: Journal of Applied Physics, Vol. 104, no. 10, p. 103523 (2008)
Journal of Applied Physics
Journal of Applied Physics, 2008, 104 (10), pp.103523. ⟨10.1063/1.3010305⟩
Journal of Applied Physics, American Institute of Physics, 2008, 104, pp.103523-1-9. ⟨10.1063/1.3010305⟩مصطلحات موضوعية: semiconductor-insulator boundaries, Materials science, Annealing (metallurgy), oxidation, Schottky barrier, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, 02 engineering and technology, chemical interdiffusion, 01 natural sciences, rapid thermal annealing, Vacuum deposition, erbium compounds, 0103 physical sciences, Thin film, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 010302 applied physics, Doping, semiconductor-metal boundaries, 021001 nanoscience & nanotechnology, Schottky barriers, chemistry, X-ray crystallography, 0210 nano-technology, Forming gas, Titanium
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