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المؤلفون: Sang-chul Shin, Jinju Kim, Hyunchul Sagong, Minhyuck Choi, Ukjin Jung, Sangwoo Pae, Hyun-Jin Kim, Minjung Jin, Junekyun Park
المصدر: IRPS
مصطلحات موضوعية: 010302 applied physics, Materials science, Gate oxide, business.industry, 0103 physical sciences, Gate dielectric, Optoelectronics, Time-dependent gate oxide breakdown, SILC, business, 01 natural sciences
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2e9ad79cf416735443e8d350cacd726e
https://doi.org/10.1109/irps.2018.8353577