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1Arsenic Dimer (As2 +) Lightly Doped Drain (LDD) Implantation Study for 20nm Logic Device Development
المؤلفون: Xinyun Xie, Weimin Shi, Yu Shaofeng, Hao Sun, Zhang Shuai, Gorge Cai, Yong Li, Xuejie Shi, Jianhua Ju, Larry Chen, Yonggen He, Zuyuan Zhou
المصدر: ECS Transactions. 60:51-55
مصطلحات موضوعية: chemistry.chemical_compound, Materials science, chemistry, business.industry, Dimer, Doping, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Optoelectronics, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, business, Arsenic
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2
المؤلفون: Zuyuan Zhou, Fanxiu Lv, Weizhong Tang, Bin Li, Guangchao Chen
المصدر: Journal of University of Science and Technology Beijing, Mineral, Metallurgy, Material. 14:365-368
مصطلحات موضوعية: Hybrid physical-chemical vapor deposition, Chemistry, Mechanical Engineering, Ion plating, Metals and Alloys, Analytical chemistry, Diamond, Plasma, Chemical vapor deposition, engineering.material, Geotechnical Engineering and Engineering Geology, Methane, chemistry.chemical_compound, Mechanics of Materials, Plasma-enhanced chemical vapor deposition, Materials Chemistry, engineering, General Materials Science, Physical and Theoretical Chemistry, Plasma processing
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3
المؤلفون: S.J. Askari, Qi He, Akhtar Farid, Fengying Wang, Fanxiu Lv, Zuyuan Zhou
المصدر: Journal of University of Science and Technology Beijing, Mineral, Metallurgy, Material. 13:542-545
مصطلحات موضوعية: Materials science, Mechanical Engineering, Metallurgy, Metals and Alloys, Nucleation, chemistry.chemical_element, Diamond, Substrate (electronics), engineering.material, Geotechnical Engineering and Engineering Geology, Grain size, chemistry, Mechanics of Materials, Materials Chemistry, engineering, Deposition (phase transition), General Materials Science, Physical and Theoretical Chemistry, Composite material, Nanodiamond, Carbon, Titanium
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4
المؤلفون: Weiji Song, Guohui Cai, Jie Zhao, Youfeng He, Zuyuan Zhou, Jingang Wu, Junfeng Lu, Shaofeng Yu, Yonggen He, Ganming Zhao
المصدر: 2014 International Workshop on Junction Technology (IWJT).
مصطلحات موضوعية: chemistry.chemical_compound, Ion implantation, Materials science, chemistry, fungi, Rate change, Oxide, Analytical chemistry, Wafer, Plasma, Dielectric, Post implantation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::acad67dca0a4d1295d64e395cda94798
https://doi.org/10.1109/iwjt.2014.6842042