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1
المؤلفون: Abhishek Shendre, Yohan Choi, Linyong Pang, Aki Fujimura
المصدر: Photomask Technology 2021.
مصطلحات موضوعية: Leading edge, Curvilinear coordinates, Computer science, Extreme ultraviolet lithography, Computer graphics (images), Process (computing), Wafer, Session (computer science), Photomask, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e4204c92dc8fda9c6e11f1d337c714d7
https://doi.org/10.1117/12.2601916 -
2
المؤلفون: Abhishek Shendre, Linyong Pang, Suhas Pillai, Aki Fujimura, Ajay Baranwal, Mike Meyer, Ryan Pearman, Mariusz Niewczas, Henry Yu, Thang Nguyen
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Artificial neural network, Computer engineering, Computer science, business.industry, Semiconductor device fabrication, Deep learning, Process (computing), Volume (computing), Artificial intelligence, Photomask, business, Lithography, Automation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e9f1d78306f79982323f6cc70cab9e40
https://doi.org/10.1117/12.2538508 -
3
المؤلفون: Abhishek Shendre, Leo Pang, P. Jeffrey Ungar, Aki Fujimura, Nagesh Shirali, Mariusz Niewczas, Ryan Pearman
المصدر: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
مصطلحات موضوعية: Wavelength, Curvilinear coordinates, Optics, Computer science, business.industry, Extreme ultraviolet lithography, Wafer, Process window, business, Design for manufacturability, Dual (category theory)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::53a51225060f857481f246c013e41833
https://doi.org/10.1117/12.2536632 -
4
المؤلفون: Ryan Pearman, Linyong Pang, Mariusz Niewczas, Aki Fujimura, Abhishek Shendre, Mike Meyer
المصدر: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.
مصطلحات موضوعية: CUDA, Artificial neural network, Computer architecture, business.industry, Computer science, Semiconductor device fabrication, Deep learning, Key (cryptography), Wafer, Artificial intelligence, Photomask, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fb05d04f171d7e3ff337ee30dd499b39
https://doi.org/10.1117/12.2538244 -
5
المؤلفون: Ryan Pearman, Aki Fujimura, Leo Pang, Ali Bouaricha, Mariusz Niewczas, Oleg Syrel, Bo Su, Harold Robert Zable, Abhishek Shendre
المصدر: Photomask Technology.
مصطلحات موضوعية: Curvilinear coordinates, Optics, Computer science, Inflection point, business.industry, Extreme ultraviolet lithography, Multiple patterning, Wafer, Mask data preparation, business, Lithography, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7499f8158ba9d109b745ceafb0182e32
https://doi.org/10.1117/12.2281686