يعرض 1 - 10 نتائج من 17 نتيجة بحث عن '"Ahmad Chaker"', وقت الاستعلام: 1.17s تنقيح النتائج
  1. 1
    دورية أكاديمية
    Critical Care Nurses’ Knowledge of Correct Line Types for Administration of Common Intravenous Medications: Assessment and Intervention Study

    المؤلفون: Rania Al-Jaber, Natalie Samuda, Ahmad Chaker, James Waterson

    المصدر: JMIR Formative Research, Vol 6, Iss 4, p e36710 (2022)

    مصطلحات موضوعية: Medicine

    وصف الملف: electronic resource

    Relation: https://formative.jmir.org/2022/4/e36710; https://doaj.org/toc/2561-326X

    URL الوصول: https://doaj.org/article/cd98b5499c3a41418d41d7fc024a72b0

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  2. 2
    Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production

    المؤلفون: Ahmad Chaker, Hayden A. Alty, Paul Winpenny, George F. S. Whitehead, Grigore A. Timco, Scott M. Lewis, Richard E. P. Winpenny

    المصدر: ACS Applied Nano Materials. 5:17538-17543

    مصطلحات موضوعية: General Materials Science

    وصف الملف: application/pdf

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fb1d68bb3d967d9e58c8d50d94657c0b
    https://doi.org/10.1021/acsanm.2c02986

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  3. 3
    Critical Care Nurses’ Knowledge of Correct Line Types for Administration of Common Intravenous Medications: Assessment and Intervention Study (Preprint)

    المؤلفون: James Waterson, Rania Aljaber, NATALIE SAMUDA, Ahmad Chaker

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b0503190ba4e42d7a99f1e2b79e93581
    https://doi.org/10.2196/preprints.36710

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  4. 4
    Critical Care Nurses’ Knowledge of Correct Line Types for Administration of Common Intravenous Medications: Assessment and Intervention Study

    المؤلفون: James Waterson, Rania Aljaber, NATALIE SAMUDA, Ahmad Chaker

    المصدر: JMIR Formative Research. 6:e36710

    مصطلحات موضوعية: Medicine (miscellaneous), Health Informatics, Computer Science Applications

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::01f8e32c74ba6e6a1341c8afa60a3131
    https://doi.org/10.2196/36710

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  5. 5
    Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO 2

    المؤلفون: M. Bonvalot, Taguhi Yeghoyan, Christophe Vallée, Ahmad Chaker, Moustapha Jaffal, Ahmad Bsiesy, Samia Belahcen

    المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)

    المصدر: Journal of Vacuum Science & Technology A
    Journal of Vacuum Science & Technology A, 2021, 39 (1), pp.012410. ⟨10.1116/6.0000655⟩
    Journal of Vacuum Science and Technology A
    Journal of Vacuum Science and Technology A, American Vacuum Society, 2021, 39 (1), pp.012410. ⟨10.1116/6.0000655⟩

    مصطلحات موضوعية: 010302 applied physics, [PHYS]Physics [physics], Materials science, Hydrogen, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, Surfaces and Interfaces, Substrate (electronics), Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Titanium nitride, Surfaces, Coatings and Films, chemistry.chemical_compound, Atomic layer deposition, chemistry, 0103 physical sciences, Thin film, Inductively coupled plasma, 0210 nano-technology, Tin, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2b4979d4818b721a0194cde869d207ce
    https://hal.univ-grenoble-alpes.fr/hal-03449120

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  6. 6
    Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks

    المؤلفون: Christopher A. Muryn, Peng Tian, Grigore A. Timco, Scott M. Lewis, Richard E. P. Winpenny, Anastasios Kotsovinos, Hayden R. Alty, Ahmad Chaker

    المصدر: ACS Applied Nano Materials

    مصطلحات موضوعية: Materials science, chemistry, 13. Climate action, Cathode ray, chemistry.chemical_element, General Materials Science, Nanotechnology, Zinc, Lithography, Nanoscopic scale, Electron-beam lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ded4fbc6582a6b018f5c7084a385005

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  7. 7
    Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

    المؤلفون: Taguhi Yeghoyan, Samia Belahcen, Moustapha Jaffal, Ahmad Bsiesy, Agnès Granier, Nicolas Posseme, Rémi Vallat, R. Gassilloud, M. Bonvalot, Christophe Vallée, Gautier Lefèvre, Sylvain David, Ahmad Chaker

    المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA), Université de Tsukuba = University of Tsukuba, University of Manchester [Manchester], Photon Science Institute [Manchester] (PSI), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)

    المصدر: Journal of Vacuum Science and Technology A
    Journal of Vacuum Science and Technology A, American Vacuum Society, 2020, 38 (3), pp.033007. ⟨10.1116/1.5140841⟩
    Journal of Vacuum Science & Technology A
    Journal of Vacuum Science & Technology A, 2020, 38 (3), pp.033007. ⟨10.1116/1.5140841⟩

    مصطلحات موضوعية: Materials science, Plasma etching, 02 engineering and technology, Surfaces and Interfaces, Plasma, 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, 0104 chemical sciences, Surfaces, Coatings and Films, Ion, Atomic layer deposition, Plasma-enhanced chemical vapor deposition, Chemical physics, Sputtering, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Thin film, 0210 nano-technology, Plasma processing, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::432e4b176ef98039ba115c491e2d3c1e
    https://hal.archives-ouvertes.fr/hal-02586207

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  8. 8
    Controlling the Current Conduction Asymmetry of HfO 2 Metal–Insulator–Metal Diodes by Interposing Al 2 O 3 Layer

    المؤلفون: Patrice Gonon, Woojin Jeon, Ahmad Chaker, Olivier Salicio, Christophe Vallée

    المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

    المصدر: IEEE Transactions on Electron Devices
    IEEE Transactions on Electron Devices, Institute of Electrical and Electronics Engineers, 2019, 66 (1), pp.402-406. ⟨10.1109/TED.2018.2881220⟩
    IEEE Transactions on Electron Devices, 2019, 66 (1), pp.402-406. ⟨10.1109/TED.2018.2881220⟩

    مصطلحات موضوعية: 010302 applied physics, [PHYS]Physics [physics], Materials science, business.industry, Metal-insulator-metal, 01 natural sciences, Cathode, Electronic, Optical and Magnetic Materials, law.invention, law, 0103 physical sciences, Electrode, Optoelectronics, Work function, Electrical and Electronic Engineering, Current (fluid), business, Layer (electronics), Current density, ComputingMilieux_MISCELLANEOUS, Diode

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::74ca06da97b9d432ee1bdc87f6f5bc10
    https://hal.univ-grenoble-alpes.fr/hal-02325464

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  9. 9
    Topographically selective deposition

    المؤلفون: Rémi Vallat, Nicolas Posseme, Ahmad Bsiesy, V. Pesce, M. Bonvalot, Samia Belahcen, R. Gassilloud, Ahmad Chaker, Christophe Vallée

    المساهمون: Clot, Marielle, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)

    المصدر: Applied Physics Letters
    Applied Physics Letters, American Institute of Physics, 2019, 114 (4), pp.043101
    Applied Physics Letters, 2019, 114 (4), pp.043101

    مصطلحات موضوعية: 010302 applied physics, [PHYS]Physics [physics], Materials science, Fabrication, Physics and Astronomy (miscellaneous), business.industry, Biasing, 02 engineering and technology, Substrate (electronics), Sputter deposition, engineering.material, 021001 nanoscience & nanotechnology, 01 natural sciences, [PHYS] Physics [physics], Atomic layer deposition, Coating, Sputtering, 0103 physical sciences, engineering, Deposition (phase transition), Optoelectronics, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1f5e3480f9e2410fc2beea9a3a296dc6
    https://hal.univ-grenoble-alpes.fr/hal-01997456

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  10. 10
    Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition

    المؤلفون: Ahmad Chaker, Jean-Luc Deschanvres, V. Cantelli, Liang Tian, Hubert Renevier, T. Ouled, Marie-Ingrid Richard, Dillon D. Fong, Olivier Thomas, Alexandre Crisci, Evgenii Skopin, Sabine Lay, M. H. Chu, Raphaël Boichot, G. Ciatto

    المساهمون: European Synchrotron Radiation Facility (ESRF), Laboratoire des matériaux et du génie physique (LMGP ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Science et Ingénierie des Matériaux et Procédés (SIMaP ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Synchrotron SOLEIL (SSOLEIL), Centre National de la Recherche Scientifique (CNRS), Institut National Polytechnique de Grenoble (INPG)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU)

    المصدر: Journal of Electronic Materials
    Journal of Electronic Materials, 2017, 46 (6), pp.3512-3517. ⟨10.1007/s11664-017-5448-2⟩
    Journal of Electronic Materials, Institute of Electrical and Electronics Engineers, 2017, 46 (6), pp.3512-3517. ⟨10.1007/s11664-017-5448-2⟩

    مصطلحات موضوعية: Materials science, Nucleation, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Microstructure, 01 natural sciences, Aspect ratio (image), Electronic, Optical and Magnetic Materials, Atomic layer deposition, 0103 physical sciences, Materials Chemistry, Nanometre, Electrical and Electronic Engineering, Thin film, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 010306 general physics, 0210 nano-technology, Nanoscopic scale, Nanodevice, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ed0f2a168e1a76020f46511792a3456e
    https://amu.hal.science/hal-01705058

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