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المؤلفون: Rui Chen, Bradley Morgenfeld, Aleksandra Clancy, Granger Lobb, Shyam Pal
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Process (computing), Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Line (electrical engineering), 010309 optics, Back end of line, Atomic layer deposition, 0103 physical sciences, Multiple patterning, Optoelectronics, 0210 nano-technology, business, Scaling, Critical dimension, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::35474b5b771a3d590c4e4f707beb1d77
https://doi.org/10.1117/12.2260450 -
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المؤلفون: Aleksandra Clancy, Ayman Hamouda, Ashwini Chandrasekhar, Shyam Pal, Jeff Shu, Christopher Ordonio, Jason Eugene Stephens, Chun Hui Low, Ming He, Prakash Periasamy, Mary Claire Silvestre, Anbu Selvam Km Mahalingam, Peter Welti, Craig Child, Granger Lobb, Ketan Shah
المصدر: 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC).
مصطلحات موضوعية: Standard cell, Interconnection, Atomic layer deposition, Materials science, Technology scaling, Process (computing), Nanotechnology, Dry etching, Engineering physics, Scaling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f7a2ece826e66bfdf116c6484b2c2ed5
https://doi.org/10.1109/iitc-amc.2016.7507642 -
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المؤلفون: Karen Petrillo, David R. Medeiros, Dirk Pfeiffer, Anthony D. Lisi, John C. Arnold, Seiichiro Tachibana, Sean D. Burns, Libor Vyklicky, Shozo Shirai, Dario L. Goldfarb, Robert Lang, Daniel P. Sanders, Aleksandra Clancy, Robert D. Allen, Kazumi Noda, Dah Chung Owe-Yang
المصدر: Advances in Resist Materials and Processing Technology XXV.
مصطلحات موضوعية: Materials science, business.industry, engineering.material, law.invention, Numerical aperture, Secondary ion mass spectrometry, Optics, Anti-reflective coating, Coating, Resist, law, engineering, Photolithography, business, Lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::70bcf63cf811df1de1f882bdf152e34d
https://doi.org/10.1117/12.772268 -
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المؤلفون: Kuang-Jung Chen, Dakshi Murthy, Ratnam Sooriyakumaran, Stacy Rasgon, Aleksandra Clancy, Arpan P. Mahorowala
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Plasma etching, Materials science, business.industry, Analytical chemistry, Surface finish, Photoresist, Engraving, law.invention, law, visual_art, visual_art.visual_art_medium, Surface roughness, Optoelectronics, Process window, Wafer, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b2324b2ad09b662b91b98047c553b951
https://doi.org/10.1117/12.600043