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المؤلفون: Yu Zhang, Yuyang Bian, Yaniv Abramovitz, Yifei Zhu, Omri Baum, Alexander Vipolzov, Qiang Zhou, Biqiu Liu, Song Gao, Shmuel Ben Nissim, Cong Zhang, Uri Smolyan, Jun Huang, Xiaobo Guo
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Accuracy and precision, Sampling (signal processing), Computer science, Line (geometry), Electronic engineering, Process (computing), Node (circuits), Overlay, Critical dimension, Die (integrated circuit)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d7038abbb89ac80e8855e45f742b2d35
https://doi.org/10.1117/12.2585391