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1
المؤلفون: Alpana N. Ranade, Kjersta Larson-Smith, Krystelle Lionti, Geraud Dubois, Linying Cui, Reinhold H. Dauskardt
المصدر: ACS Nano. 8:7186-7191
مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Bilayer, General Engineering, General Physics and Astronomy, Atmospheric-pressure plasma, Polymer, chemistry.chemical_compound, chemistry, Transmittance, General Materials Science, Adhesive, Composite material, Methyl methacrylate, Thin film, Layer (electronics)
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2
المصدر: ACS Applied Materials & Interfaces. 5:8495-8504
مصطلحات موضوعية: chemistry.chemical_classification, Materials science, Substrate (chemistry), Atmospheric-pressure plasma, Polymer, Adhesion, engineering.material, chemistry.chemical_compound, chemistry, Coating, Chemical engineering, visual_art, Polymer chemistry, visual_art.visual_art_medium, engineering, General Materials Science, Polycarbonate, Methyl methacrylate, Layer (electronics)
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3
المؤلفون: Geraud Dubois, Marvi A. Matos, Liam S. Cavanaugh Pingree, Alpana N. Ranade, Reinhold H. Dauskardt, Theo J. Frot, Linying Cui
المصدر: ACS Applied Materials & Interfaces. 4:6587-6598
مصطلحات موضوعية: Materials science, Silicon, chemistry.chemical_element, Atmospheric-pressure plasma, Substrate (electronics), Adhesion, engineering.material, Boiling point, chemistry.chemical_compound, Coating, chemistry, Chemical engineering, visual_art, engineering, visual_art.visual_art_medium, Organic chemistry, General Materials Science, Methyl methacrylate, Polycarbonate
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4
المؤلفون: L. Rama Krishna, Alpana N. Ranade, Jane Wang, Yip-Wah Chung, Chad S. Korach, Zhe Li
المصدر: Surface and Coatings Technology. 213:26-32
مصطلحات موضوعية: Toughness, Materials science, Nanocomposite, Surfaces and Interfaces, General Chemistry, Nanoindentation, engineering.material, Sputter deposition, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, Fracture toughness, chemistry, Coating, Volume fraction, Materials Chemistry, engineering, Composite material, Titanium diboride
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5
المؤلفون: Christopher Fulton, Jeffrey Thomas Remillard, Yip-Wah Chung, Alpana N. Ranade, Jill E. Seebergh, Michael J. Graham, Mark Edward Nichols
المصدر: Thin Solid Films. 519:1490-1494
مصطلحات موضوعية: Materials science, business.industry, Metals and Alloys, Pulsed DC, Analytical chemistry, Surfaces and Interfaces, Sputter deposition, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Optics, chemistry, Rutile, Physical vapor deposition, Titanium dioxide, Volume fraction, Materials Chemistry, Particle size, Thin film, business