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المؤلفون: Kevin Houchens, Tal Itzkovich, Omri Baum, Noam Amit, Aner Avakrat, Shimon Levi
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Optics, Materials science, Margin (machine learning), business.industry, Distortion, Extreme ultraviolet lithography, Outlier, Surface finish, Edge (geometry), business, Lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bf953e8414063b23319b692f9ce3d5c9
https://doi.org/10.1117/12.2514877