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المؤلفون: Zac Levinson, Bruce W. Smith, Andrew Burbine, Anthony Schepis
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Physics, Optics, business.industry, Extreme ultraviolet, Attenuation coefficient, Oblique illumination, Extreme ultraviolet lithography, Node (physics), Optoelectronics, business, Absorption (electromagnetic radiation), Scaling, Ray
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8db631b24e6b02cefd231b17079751c5
https://doi.org/10.1117/12.2046488 -
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المؤلفون: Anthony Schepis, Andrew Burbine, Germain Fenger, Zac Levinson, Bruce W. Smith
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, Optics, Computer science, business.industry, Extreme ultraviolet lithography, Pupil function, Condenser (optics), ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Sensitivity (control systems), Photoresist, business, Pupil, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::573108c7c19539da9a56f98ee03905cc
https://doi.org/10.1117/12.2046483 -
3
المؤلفون: Jassem Abdallah, Moutaz Fakhry, Melih Ozlem, Neal Lafferty, Joy Cheng, Daniel Brue, Topalogu Rasit Onur, Jed W. Pitera, Chi-Chun Liu, Daniel J. Dechene, Azalia A. Krasnoperova, Kafai Lai, Melia Tjio, Gregory S. Doerk, M. Guillorn, Hsinyu Tsai, Anthony Schepis
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optical proximity correction, Computational lithography, Computer science, law, Component (UML), Wafer, Photolithography, Lithography process, Lithography, Simulation, law.invention, Computational science, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db451891b7c3cbcacdb57fe8791e4918
https://doi.org/10.1117/12.2046920 -
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المؤلفون: Andrew Burbine, Anthony Schepis, Zac Levinson, Bruce W. Smith
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computer science, business.industry, Semiconductor device, Integrated circuit, Aspect ratio (image), law.invention, Optics, Semiconductor, Resist, law, Phase-shift mask, business, Contact area, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3cd7d86e277f0f162fe59067db6d17c6
https://doi.org/10.1117/12.2046495 -
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المؤلفون: Ryoung-han Kim, Mark Somervell, Joy Cheng, Matthew E. Colburn, Chi-Chun Liu, Michael A. Guillorn, H. He, Derrick Liu, Nihar Mohanty, Michael Cicoria, David Hetzer, Anthony Schepis, Akiteru Ko, Cristina Estrada-Raygoza, Kafai Lai, Jason Cantone, Melia Tjio, Sylvie Mignot, Vinayak Rastogi, Robin Chao, Hsinyu Tsai
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Fin, Materials science, business.industry, Thermodynamic equilibrium, Process (computing), Silicon on insulator, Degradation (geology), Optoelectronics, Process optimization, business, Line (electrical engineering), Communication channel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9db10e0ae98deb5b6a797e5f185cedae
https://doi.org/10.1117/12.2046462 -
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المؤلفون: Olalekan Odesanya, Chi-Chun Liu, Hsinyu Tsai, Daniel J. Dechene, Joy Cheng, Kafai Lai, Charles T. Rettner, Jassem Abdallah, Anthony Schepis, M. Guillorn, Melih Ozlem, Melia Tjio, Gregory S. Doerk, Jed W. Pitera, Neal Lafferty
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computational lithography, Computer science, Extreme ultraviolet lithography, Nanotechnology, Design for manufacturability, law.invention, Computer architecture, Optical proximity correction, law, Hardware_INTEGRATEDCIRCUITS, Multiple patterning, Wafer, Node (circuits), Photolithography, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::deeb3e8956ea0a750467424661d02560
https://doi.org/10.1117/12.2012440 -
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المؤلفون: Matthew E. Colburn, Steven J. Holmes, Hsinyu Tsai, Mark Somervell, Joy Cheng, Michael Cicoria, Michael A. Guillorn, I. Cristina Estrada-Raygoza, Melia Tjio, David Hetzer, Jassem Abdallah, Anthony Schepis, Yunpeng Yin, Chi-Chun Liu
المصدر: Alternative Lithographic Technologies V.
مصطلحات موضوعية: Materials science, Resist, Rectification, business.industry, Process (computing), Optoelectronics, Process window, Surface finish, business, Failure mode and effects analysis, Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8e7d932f495b35aa68d15e47f779b445
https://doi.org/10.1117/12.2011610