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1
المؤلفون: Thomas Thamm, Yael Sufrin, Avi Cohen, Ofir Sharoni, Aravind Narayana Samy, Rolf Seltmann, Thomas Scheruebl
المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Reliability (semiconductor), Resist, Computer science, Electronic engineering, Process control, Process window, Wafer, Photomask, Advanced process control, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9e0eae24b6ba1ad6dc69d66f06877ee8
https://doi.org/10.1109/asmc49169.2020.9185321 -
2
المؤلفون: Avi Cohen, Yael Sufrin, Thomas Thamm, Aravind Narayana Samy, Ofir Sharoni, Rolf Seltmann, Thomas Scheruebl
المصدر: Photomask Technology 2019.
مصطلحات موضوعية: Leading edge, Offset (computer science), Resist, Computer science, Control theory, Excursion, Wafer, Process window, Photomask, Chip
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::509aa96119ded60c6970f0ba92875795
https://doi.org/10.1117/12.2536896 -
3
المؤلفون: Aravind Narayana Samy, Bernd Geh, Alla Bitensky, Marija Djordjevic Kaufmann, Thomas Thamm, Martin Sczyrba, Rolf Seltmann
المصدر: Optical Microlithography XXXI.
مصطلحات موضوعية: Scanner, Optics, Pixel, business.industry, Computer science, Reticle, Process window, Wafer, Integrated circuit design, business, Chip, Image resolution
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a4c9a1f9afa8d5533374c6973abfad49
https://doi.org/10.1117/12.2297382 -
4
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, business.industry, Real-time computing, Flow (psychology), Process (computing), Hardware_PERFORMANCEANDRELIABILITY, Reliability engineering, Optical proximity correction, Limit (music), Hardware_INTEGRATEDCIRCUITS, Process window, Wafer, Focus (optics), business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4906c52961bef83f2f613bb23c678e06
https://doi.org/10.1117/12.2196646 -
5
المؤلفون: Roberto Schiwon, Ushasree Katakamsetty, Aravind Narayana Samy, Rolf Seltmann, Frank Kahlenberg
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Engineering, Bridging (networking), Resist, business.industry, Margin (machine learning), Process (computing), Node (circuits), Process window, Operations management, Work in process, business, Lithography, Reliability engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::904956f4449fdf716e1f0211f9342b58
https://doi.org/10.1117/12.2047086 -
6
المؤلفون: Frank Kahlenberg, Jessy Schramm, Aravind Narayana Samy, Rolf Seltmann, Bernd Küchler, Ulrich Klostermann
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resist, Computational lithography, Atomic force microscopy, Computer science, Calibration, Wafer, Photoresist, Simulation, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b2331db7c5c1907f179c5b560e32aaba
https://doi.org/10.1117/12.2011427 -
7
المؤلفون: Dirk Rudloff, Michael Wagner, Peter Dürr, Mathias Krellmann, Ulrike Dauderstädt, Detlef Kunze, Klaus Lukat, Ingo Wullinger, Aravind Narayana Samy
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Microelectromechanical systems, Wavefront, Materials science, Physics::Instrumentation and Detectors, business.industry, Laser, Pulse shaping, Temperature measurement, law.invention, Optics, law, Resistor, Photonics, Air gap (plumbing), business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a5108ffac8fc57861e96fc5f73f12042
https://doi.org/10.1117/12.842066 -
8دورية
المؤلفون: Sturtevant, John L., Capodieci, Luigi, Katakamsetty, Ushasree, Colin, Hui, Yeo, Sky, Valerio, Perez, Qing, Yang, Fong, Quek Shyue, Aravind, Narayana Samy, Matthias, Ruhm, Roberto, Schiwon
المصدر: Proceedings of SPIE; March 2014, Vol. 9053 Issue: 1 p905312-905312-7