المؤلفون: Tamar van Gardingen-Cromwijk, Sander Konijnenberg, Wim Coene, Manashee Adhikary, Teus Tukker, Stefan Witte, Johannes F. de Boer, Arie den Boef

المصدر: Light: Advanced Manufacturing, Vol 4, Iss 4, Pp 453-465 (2024)

مصطلحات موضوعية: lens aberrations, non-isoplanatism, digital holographic microscopy, metrology, computational imaging, Manufactures, TS1-2301, Applied optics. Photonics, TA1501-1820

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2689-9620

URL الوصول: https://doaj.org/article/7e2b9089b27342a49dfd7bd5699750c0

المؤلفون: Victor M. Blanco Carballo, Eren Canga, Christiane Jehoul, Alain Moussa, Amir-Hossein Tamaddon, Cyrus Tabery, Gautam Gunjala, Boris Menchtchikov, Gabriel Zacca, Sanjay Lalbahadoersing, Arie den Boef, Ron Synowicki

المصدر: Metrology, Inspection, and Process Control XXXVII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a8d2bbff5fb0e41bb3880444df2770b3
https://doi.org/10.1117/12.2658084

المؤلفون: Tamar van Gardingen-Cromwijk, Manashee Adhikary, Christos Messinis, Sander Konijnenberg, Wim Coene, Stefan Witte, Johannes F. de Boer, Arie den Boef

المساهمون: LaserLaB - Physics of Light, Atoms, Molecules, Lasers, LaserLaB - Biophotonics and Microscopy, Biophotonics and Medical Imaging

المصدر: van Gardingen-Cromwijk, T, Adhikary, M, Messinis, C, Konijnenberg, S, Coene, W, Witte, S, de Boer, J F & Den Boef, A 2023, ' Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology ', Optics Express, vol. 31, no. 1, pp. 411-425 . https://doi.org/10.1364/OE.476157
van Gardingen-Cromwijk, T, Adhikary, M, Messinis, C, Konijnenberg, S, Coene, W, Witte, S, de Boer, J F & den Boef, A 2023, ' Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology ', Optics Express, vol. 31, no. 1, pp. 411-425 . https://doi.org/10.1364/OE.476157
Optics Express, 31(1), 411-425. The Optical Society

مصطلحات موضوعية: Atomic and Molecular Physics, and Optics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ddc652e57da043bec7ad573ac9173c2
https://hdl.handle.net/1871.1/eeecf63e-25a0-4df9-9e45-ecc09009340a

المؤلفون: Theodorus T. M. van Schaijk, Christos Messinis, Nitesh Pandey, Armand Koolen, Stefan Witte, Johannes F. de Boer, Arie den Boef

المساهمون: ARCNL, Atoms, Molecules, Lasers, Amsterdam Neuroscience - Brain Imaging, LaserLaB - Biophotonics and Microscopy, LaserLaB - Physics of Light, Physics and Astronomy, Amsterdam Neuroscience - Systems & Network Neuroscience, VU University medical center

المصدر: Journal of Micro/Nanopatterning, Materials and Metrology, 21(1):014001, 1-10. SPIE
van Schaijk, T T M, Messinis, C, Pandey, N, Koolen, A, Witte, S, de Boer, J F & den Boef, A 2022, ' Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor ', Journal of Micro/Nanopatterning, Materials and Metrology, vol. 21, no. 1, 014001 . https://doi.org/10.1117/1.JMM.21.1.014001
Journal of Micro/Nanopatterning, Materials and Metrology, 21(1):014001. SPIE
Van Schaijk, T T M, Messinis, C, Pandey, N, Koolen, A, Witte, S, De Boer, J F & Den Boef, A 2022, ' Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor ', Journal of Micro/Nanopatterning, Materials and Metrology, vol. 21, no. 1, 014001, pp. 1-10 . https://doi.org/10.1117/1.JMM.21.1.014001

مصطلحات موضوعية: broadband imaging, dark-field microscopy, infrared, digital holographic microscopy, overlay metrology

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6774539dcc317227ec88b660fe435374
https://doi.org/10.1117/1.jmm.21.1.014001

المؤلفون: Christos Messinis, Manashee Adhikary, Tamar Cromwijk, Theodorus T. M. van Schaijk, Stefan Witte, Johannes F. de Boer, Arie den Boef

المصدر: Optics Continuum. 1:1202

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fcb9fe8b22d65ecba712110d05272a01
https://doi.org/10.1364/optcon.460029

المؤلفون: Kaustuve Bhattacharyya, Noelle Wright, Maurits van der Schaar, Arie den Boef, Paul Hinnen, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Cathy Wang, Chih-Ming Ke, Jacky Huang, Willie Wang

المصدر: Journal of Micro/Nanolithography, MEMS & MOEMS; Jan-Mar2011, Vol. 10 Issue 1, p013013-013013-8, 1p

مصطلحات موضوعية: LITHOGRAPHY, METROLOGY, PROCESS control systems, MATHEMATICAL models, THIN films, ANISOTROPY