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المؤلفون: Howard A. Padmore, Arnaud P. Allezy, Diane Bryant, Albert Sheng, Alastair A. MacDowell, Simon A. Morton, Maxime Bergeret, Grand D. Cutler, Antoine Wojdyla, Manuel Sanchez del Rio, Elaine DiMasi, Kenneth A. Goldberg, Henry P. Alvarez, Valeriy V. Yashchuk
المصدر: Advances in Computational Methods for X-Ray Optics V.
مصطلحات موضوعية: Wavefront, Upgrade, Beamline, Computer science, law, Electronic engineering, X-ray optics, Storage ring, Monochromator, law.invention, Coherence (physics), Insertion device
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::caa1dd78d3dd6105a49bb5526885b9a5
https://doi.org/10.1117/12.2569298 -
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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
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المؤلفون: Jason DePonte, Christopher N. Anderson, Will Cork, Rene Delano, Jeff Gamsby, Eric M. Gullikson, Senajith Rekawa, Weilun Chao, Patrick P. Naulleau, Farhad Salmassi, Ryan Miyakawa, Brandon Vollmer, Geoff Gaines, Carl Cork, Stephen Meyers, Wenhua Zhu, Gideon Jones, M.R. Dickinson, Arnaud P. Allezy, Daniel Zehm
المساهمون: Goldberg, Kenneth A
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Field of view, Synchrotron, law.invention, Optics, Beamline, law, Extreme ultraviolet, Wafer, business, Lithography, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b94d6e57f0b524b507cc028fe56d679
https://escholarship.org/uc/item/4m8939b8 -
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المؤلفون: Per-Anders Glans, Kevin Armitage, Ruimin Qiao, Jason Borsos, John Pepper, Weilun Chao, James Macdougall, Yi-Sheng Liu, Jinghua Guo, Arnaud P. Allezy, Xuefei Feng, Xuhui Sun, Alastair A. MacDowell, Benjamin Gilbert, Namhey Lee, Kevin G. Knauss, Yujian Xia
المصدر: The Review of scientific instruments. 89(1)
مصطلحات موضوعية: X-ray spectroscopy, Materials science, Absorption spectroscopy, 02 engineering and technology, Edge (geometry), 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Spectral line, 0104 chemical sciences, Membrane, Wafer, Deformation (engineering), Composite material, 0210 nano-technology, Spectroscopy, Instrumentation
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المؤلفون: Patrick P. Naulleau, William Cork, Iacopo Mochi, Jason DePonte, Jeffrey F. Gamsby, Arnaud P. Allezy, Eric M. Gullikson, Veljko Milanovic, M.R. Dickinson, Eric Van Every, Douglas Van Camp, Markus P. Benk, W. Chao, Senajith Rekawa, Erik H. Anderson, James Macdougall, Elizabeth Martin, Kenneth A. Goldberg, Rene Delano, Daniel Zehm, Eric Acome, Vamsi Vytla, Carl Cork, M. S. Gideon Jones, Farhad Salmassi, Hanjing Huang, William B. Ghiorso
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Physics, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Reticle, Photomask, business, Lithography, Image resolution
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85cef16beed56b5de8e814af8350f7b6
https://doi.org/10.1117/12.2011688