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المؤلفون: Claire Lu, Vikram Tolani, Harper Yu, Jason Fang, Yanghui Liu, Andy Lan, Catherine Li, Zeyu Lei, Asei Chou, Wenhao Hsu
المصدر: Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
مصطلحات موضوعية: Spectrum analyzer, Materials science, business.industry, Reticle, business, Computer hardware, Dram
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9b68b48fb0db2c86ac95feeecb3216be
https://doi.org/10.1117/12.2598020 -
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المؤلفون: Wallace He, Jimmy Chang, Richer Yang, Leslie Zhang, YunSheng Xia, Jie Du, Kunyuan Chen, Junjun Zhang, CongCong Fan, Asei Chou, Sheng-Tsung Tsao, Chia-Hung Chen
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Computer science, High transmission, Electronic engineering, Phase-shift mask, Wafer, Overlay, Lithography process, Critical dimension, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::313d36e0ba638fda48a5c00d99ece7f5
https://doi.org/10.1117/12.2552025