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المؤلفون: Bengt Gunnar Malm, M. Jargelius, Gunnar Landgren, H. Fosshaug, Pär Jönsson, J. Pejnefors, B. Mohadjeri, Mikael Östling, J.V. Grahn, Henry H. Radamson, M. Sanden, Yong-Bin Wang, M. Linder
المصدر: Solid-State Electronics. 44:549-554
مصطلحات موضوعية: In situ, Materials science, Heterostructure-emitter bipolar transistor, business.industry, Heterojunction bipolar transistor, Condensed Matter Physics, Epitaxy, Silane, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Scientific method, Thermal, Materials Chemistry, Optoelectronics, Electrical and Electronic Engineering, business, Common emitter
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2
المؤلفون: Mladen Petravic, B. Mohadjeri, B. G. Svensson
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:2192-2201
مصطلحات موضوعية: Materials science, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Surface finish, Condensed Matter Physics, Rutherford backscattering spectrometry, Surfaces, Coatings and Films, Ion, Impact crater, chemistry, Sputtering, Crystallite, Thin film, Cobalt
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3
المؤلفون: B. Mohadjeri, Mladen Petravic, B. G. Svensson
المصدر: Journal of Applied Physics. 76:3831-3834
مصطلحات موضوعية: Materials science, Silicon, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, surface expansion, ion bombardment, oxidation, Isotropic etching, Oxygen, Ion, chemistry, Sputtering, Etching (microfabrication), Limiting oxygen concentration, Surface layer
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4
المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 85:363-369
مصطلحات موضوعية: Nuclear and High Energy Physics, Static secondary-ion mass spectrometry, Dopant, Silicon, Superlattice, Analytical chemistry, SIMS, isotope shifts, implantation profiles, chemistry.chemical_element, Secondary ion mass spectrometry, Condensed Matter::Materials Science, Ion implantation, chemistry, Sputtering, Surface roughness, Instrumentation
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المؤلفون: B. G. Svensson, B. Mohadjeri
المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 64:654-658
مصطلحات موضوعية: Amorphous silicon, Nuclear and High Energy Physics, Static secondary-ion mass spectrometry, Materials science, Analytical chemistry, chemistry.chemical_element, Ion, Secondary ion mass spectrometry, chemistry.chemical_compound, chemistry, Sputtering, Surface roughness, Thin film, Boron, Instrumentation
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المؤلفون: B. Mohadjeri, B. G. Svensson
المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 55:650-654
مصطلحات موضوعية: Nuclear and High Energy Physics, Range (particle radiation), Isotope, Silicon, Chemistry, Monte Carlo method, chemistry.chemical_element, Mass spectrometry, Ion, Ion implantation, Kinetic isotope effect, Atomic physics, Nuclear Experiment, Instrumentation
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المؤلفون: François M. d'Heurle, Juhani Keinonen, C. S. Petersson, B. Mohadjeri, Th. Eriksson, Mikael Östling, Jens Carlsson
المصدر: Journal of Applied Physics. 68:2112-2120
مصطلحات موضوعية: Silicon, Inorganic chemistry, General Physics and Astronomy, chemistry.chemical_element, Tungsten hexafluoride, Chemical vapor deposition, engineering.material, Tungsten, chemistry.chemical_compound, Tungsten disilicide, Polycrystalline silicon, Hydrofluoric acid, chemistry, Etching (microfabrication), engineering
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8
المؤلفون: B. G. Svensson, Sören Berg, Herman Norde, U Magnusson, B Mohadjeri, J Tirén, Anders Söderbärg, Ö Grelsson
المصدر: Journal of Applied Physics. 67:2148-2152
مصطلحات موضوعية: Ion implantation, Materials science, Silicon, chemistry, Doping, Analytical chemistry, General Physics and Astronomy, chemistry.chemical_element, Field-effect transistor, Crystalline silicon, p–n junction, Vacuum evaporation, Diode
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9
المؤلفون: James Williams, B. Mohadjeri, Jennifer Wong-Leung
المصدر: Applied Physics Letters. 66:1889-1891
مصطلحات موضوعية: Amorphous silicon, Materials science, Physics and Astronomy (miscellaneous), Silicon, Hydrogen, Annealing (metallurgy), Metallurgy, Analytical chemistry, chemistry.chemical_element, chemistry.chemical_compound, Nickel, Ion implantation, chemistry, Getter, Transmission electron microscopy
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المؤلفون: F. Vleugels, Stefaan Decoutere, B. Mohadjeri, G. Vancuyck, L. Deferm, R. Kuhn, Matty Caymax
المصدر: Proceedings of the 1998 Bipolar/BiCMOS Circuits and Technology Meeting (Cat. No.98CH36198).
مصطلحات موضوعية: Engineering, business.industry, Transistor, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, BiCMOS, Epitaxy, Bicmos technology, law.invention, Capacitor, Hardware_GENERAL, law, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Resistor, business, Base (exponentiation), Voltage
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8070155e98663630f80bc471a497ae1e
https://doi.org/10.1109/bipol.1998.741897