لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

المؤلفون: Philip J. Oldiges, Hemanth Jagannathan, Kangguo Cheng, Christopher Prindle, C.-C. Yeh, R. Divakaruni, S. Kanakasabaphthy, Derrick Liu, Sean D. Burns, P. Montanini, T. Gow, Huiming Bu, Abhijeet Paul, Terry A. Spooner, Richard G. Southwick, Jin Cho, M. Celik, Mukesh Khare, Donald F. Canaperi, Young-Kwan Park, H. Mallela, Ravikumar Ramachandran, Bomsoo Kim, Dinesh Gupta, Balasubramanian S. Pranatharthi Haran, R. Kambhampati, M. Weybright, W. Yang, Vamsi Paruchuri, Tae-Chan Kim, R. Sampson, K. Kim, D. Chanemougame, John Iacoponi, Jay W. Strane, Ruilong Xie, D.I. Bae, Injo Ok, Matthew E. Colburn, T. Hook, Kang-ill Seo, Lars W. Liebmann, V. Sardesai, Hoon Kim, Neeraj Tripathi, H. Shang, M. Mottura, Reinaldo A. Vega, B. Hamieh, D. McHerron, Theodorus E. Standaert, Ju-Hwan Jung, S. Nam, E. Alptekin, Soon-Cheon Seo, Dechao Guo, J. G. Hong, Gen Tsutsui, Andreas Scholze, J. Jenq, Xiao Sun, Walter Kleemeier, James H. Stathis, Geum-Jong Bae

المصدر: 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT).

مصطلحات موضوعية: Materials science, CMOS, Dopant, business.industry, Electronic engineering, Optoelectronics, Silicon on insulator, Static random-access memory, business, Lithography, Random dopant fluctuation, Communication channel, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2fdd9e37b1ad7ef1b69d8d55e103e9fa
https://doi.org/10.1109/icsict.2014.7021207

المؤلفون: H. Oguma, T. Bolom, Y. Oda, S. O. Kim, C. Child, S. Allen, G. Bonilla, R. Schiwon, B. Kim, G. Osborne, B. Sundlof, T. Takewaki, E. Kaltalioglu, A. Grill, Q. Fang, D. Edelstein, H. Aizawa, T. Oki, B. Engel, A. Thomas, G. Ribes, S. Hirooka, G. Biery, K. Fujii, S. Molis, H. Sheng, R. Augur, M. Pallachalil, H. Shobha, D. Restaino, H. Masuda, J. H. Ahn, D. Kioussis, Terry A. Spooner, G. Zhang, L. Clevenger, Chao-Kun Hu, R. Quon, Stephen M. Gates, A. Simon, B. Hamieh, Paulo Ferreira, S. M. Singh, E. T. Ryan, R. Sampson, T. Fryxell, A. Ogino, H. Minda, B. Sapp, Richa Gupta, C. Labelle, T. Nogami, E. Wornyo, E. Shimada, T. Daubenspeck, T. J. Tang, T. Shaw, D. Permana, R. Srivastava

المصدر: Microelectronic Engineering. 92:42-44

مصطلحات موضوعية: Interconnection, Materials science, business.industry, chemistry.chemical_element, Interconnect technology, Hardware_PERFORMANCEANDRELIABILITY, Dielectric, Condensed Matter Physics, Copper, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Power (physics), Reliability (semiconductor), CMOS, chemistry, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Node (circuits), Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85a19d814c3913f082f32eedd63e0480
https://doi.org/10.1016/j.mee.2011.04.056

المؤلفون: Jeffrey C. Shearer, Philip J. Oldiges, Soon-Cheon Seo, Terry A. Spooner, Matthew E. Colburn, Ravikumar Ramachandran, V. Sardesai, Kang-ill Seo, Dinesh Gupta, Richard G. Southwick, Xiao Sun, S. Stieg, H. Cai, S. Kanakasabaphthy, Vamsi Paruchuri, R. Sampson, Lars W. Liebmann, Walter Kleemeier, Kisik Choi, Deok-Hyung Lee, Christopher Prindle, R. Divakaruni, H. Shang, Abhijeet Paul, T. Gow, D. McHerron, Dechao Guo, Fee Li Lie, J. Nam, Neeraj Tripathi, Ruilong Xie, R. Kambhampati, Muthumanickam Sankarapandian, Balasubramanian S. Pranatharthi Haran, Carol Boye, James H. Stathis, B. Hamieh, John Iacoponi, Christopher J. Waskiewicz, Geum-Jong Bae, Derrick Liu, Sanjay Mehta, Reinaldo A. Vega, Terence B. Hook, Min Gyu Sung, Jay W. Strane, D.I. Bae, Robin Chao, Hoon Kim, F. Nelson, Theodorus E. Standaert, L. Jang, Erin Mclellan, M. Celik, S. Nam, Tae-Chan Kim, C.-C. Yeh, Sean D. Burns, P. Montanini, Charan V. V. S. Surisetty, Raghavasimhan Sreenivasan, Ju-Hwan Jung, B. Lherron, S.-B. Ko, E. Alptekin, Huiming Bu, Injo Ok, Jin Cho, Mukesh Khare, J. G. Hong, Gen Tsutsui, Andreas Scholze, Bomsoo Kim, D. Chanemougame, M. Mottura, M. Weybright, H. Mallela, K. Kim, Hemanth Jagannathan, Chanro Park, J. Jenq, Donald F. Canaperi, Young-Kwan Park, R. Jung, Kangguo Cheng

المصدر: 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers.

مصطلحات موضوعية: Materials science, Dopant, business.industry, Limit (music), Gate stack, Electrical engineering, Silicon on insulator, Optoelectronics, Static random-access memory, business, Lithography, Communication channel, Power (physics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d4d82166b734af3db83f196d83853ba5
https://doi.org/10.1109/vlsit.2014.6894342

المؤلفون: Eduard A. Cartier, X. Chen, Pierre Malinge, L. Kang, T. Watanabe, Michael P. Belyansky, L. Economikos, O. Menut, Vijay Narayanan, C. Reddy, R. Divakaruni, Y.H. Park, Ravi Prakash Srivastava, M. Pallachalil, R. Koshy, Dominic J. Schepis, P. Montanini, Keith Kwong Hon Wong, M. Eller, Park Sejun, A. Ogino, H. Mallela, U. Kwon, T. Shimizu, W. Cote, Jay W. Strane, Srikanth Samavedam, M. Chae, Anurag Mittal, R. Sampson, J. Meiring, R. Joy, Huiling Shang, S. Soss, X. Yang, Keith H. Tabakman, M. Oh, W. Lai, C. Tran, S. Jain, E. Josse, D. Codi, H.V. Meer, B.Y. Kim, Jung-Geun Kim, Jin Bum Kim, C. Goldberg, Henry K. Utomo, J. Ciavatti, Barry Linder, R. Vega, W. Neumueller, J. Muncy, Kyung-hwan Cho, Scott J. Bukofsky, Alvin G. Thomas, Dinesh Koli, Katherina Babich, Bomi Kim, S. Lian, E. Alptekin, Y. Liu, S. H. Rhee, X. Wu, R. Arndt, W.L. Tan, Frederic Lalanne, Nam-Sung Kim, Ravikumar Ramachandran, K.Y. Lee, M.H. Nam, Randy W. Mann, Il-Ryong Kim, Yujun Li, V. Sardesai, Siddarth A. Krishnan, C. Tian, D. Levedakis, Seung-Kwon Kim, Jedon Kim, M. Celik, F. Matsuoka, M. Weybright, J. Sudijono, M. Aminpur, B. Hamieh, Greg Northrop, J.W. Lee

المصدر: 2012 Symposium on VLSI Technology (VLSIT).

مصطلحات موضوعية: Engineering, business.industry, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, Planar, Strain engineering, CMOS, Logic gate, Hardware_INTEGRATEDCIRCUITS, Static random-access memory, business, Metal gate, Standby power, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0ec874734f9fcf487e547466890b1297
https://doi.org/10.1109/vlsit.2012.6242495

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.

لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.