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المؤلفون: Eric Kwon, Bill Kalsbeck, Paul Chung, Wonil Cho, Suein Son, Gregg Inderhees, Il-Yong Jang, Chan-Uk Jeon, Jiuk Hur, JeongHun Seo, Min Choo, Alexander Tan, In-Yong Kang
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: Flexibility (engineering), business.industry, Computer science, Extreme ultraviolet lithography, Reticle, Process (computing), Wafer, Node (circuits), business, Throughput (business), Blank, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fca639f9b742a35121801bb0aeeaf95
https://doi.org/10.1117/12.2511160 -
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المؤلفون: Alexander Tan, Qiang Zhang, David Aupperle, Gregg Inderhees, Qiuping Nie, Bill Kalsbeck
المصدر: Photomask Technology.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, engineering.material, Blank, Dark field microscopy, Optics, Resist, Coating, Reticle, engineering, Optoelectronics, Wafer, Photomask, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a660b61fbe919838c386b7e6b175fd2b
https://doi.org/10.1117/12.2281057