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المؤلفون: Joseph F. Shepard, Henrik Johanson, Vandana Venkatasubramanian, Jay Mody, Takmeel Qanit, Ashwini Chandrasekar, Eswar Ramanathan, Craig Child, AnbuSelvam Km Mahalingam, Lei Jiang, Brett T. Cucci, Alycia Roux, O'brien Brendan, Christa Montgomery, Bradley Morganfeld, Keith Donegan, Colin Bombardier, Sang-Kee Eah, Vijaya Rana, Ghosh Somnath, Daniel Damjanovic, Anirvan Sircar, Zhiguo Sun, Singh Sunil K, Rebekah Sheraw, Ordonio Christopher, Silvestre MaryClaire, Adam DaSilva
المصدر: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, Etching (microfabrication), Chemical-mechanical planarization, Technology scaling, Nanotechnology, Thin film, Hard mask
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3b80f0efb35ac3f6be7ae230059a989a
https://doi.org/10.1109/asmc.2019.8791788