المؤلفون: Oleg Gluschenkov, Zuoguang Liu, Chengyu Niu, Andreas Knorr, Tenko Yamashita, Jay W. Strane, Mukesh Khare, Gen Tsutsui, Chris M. Prindle, Abraham Arceo, Indira Seshadri, Bruce Miao, A. Petrescu, Stan D. Tsai, Curtis Durfee, Soon-Cheon Seo, Adra Carr, Jie Yang, Walter Kleemeier, Kisik Choi, F. Lie, W. Wang, Rama Divakaruni, Chanro Park, Mark Raymond, Heng Wu, Huiming Bu, Dechao Guo, Anuja DeSilva, George Yang, Dinesh Gupta, Muthumanickam Sankarapandian, Praneet Adusumilli, Sam Choi, Kerem Akarvardar

المصدر: 2017 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, Very-large-scale integration, Materials science, business.industry, Doping, Phase (waves), 02 engineering and technology, Ring oscillator, 021001 nanoscience & nanotechnology, Epitaxy, 01 natural sciences, Reduction (complexity), CMOS, Electrical resistivity and conductivity, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fafc4c9a45bd4b7e938db8bc086dead4
https://doi.org/10.1109/iedm.2017.8268440

المؤلفون: Thamarai S. Devarajan, Praneet Adusumilli, Derrick Liu, Hoon Kim, Vijay Narayanan, Christopher Prindle, Jeffrey C. Shearer, Terence B. Hook, Jie Yang, Miaomiao Wang, Mark Raymond, Andreas Knorr, Steven Bentley, Bruce Miao, Shogo Mochizuki, Oleg Gluschenkov, Kwan-Yong Lim, Philip J. Oldiges, Chengyu Niu, Bei Liu, Dinesh Gupta, Koji Watanabe, Gen Tsutsui, Mukesh Khare, Rama Divakaruni, Rohit Galatage, Huimei Zhou, Pietro Montanini, Gauri Karve, Jay W. Strane, Jody A. Fronheiser, Rajasekhar Venigalla, Chun Wing Yeung, Hiroaki Niimi, Dechao Guo, Fee Li Lie, Kisup Chung, Reinaldo A. Vega, James J. Kelly, Ruqiang Bao, Eric R. Miller, Huiming Bu, Zuoguang Liu, Robert R. Robison, Shariq Siddiqui, Sivananda K. Kanakasabapathy, Hemanth Jagannathan, Andrew M. Greene

المصدر: 2016 IEEE International Electron Devices Meeting (IEDM).

مصطلحات موضوعية: 010302 applied physics, 0209 industrial biotechnology, Materials science, business.industry, Contact resistance, Doping, Gate stack, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 01 natural sciences, Power (physics), Silicon-germanium, chemistry.chemical_compound, 020901 industrial engineering & automation, CMOS, chemistry, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, business, Performance enhancement, Communication channel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a314387759ff753d305942894281270a
https://doi.org/10.1109/iedm.2016.7838439