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المؤلفون: Brummer, Amy C., Kurup, Siddharth, Aziz, Daniel, Filler, Michael A., Vogel, Eric M.

المصدر: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Sep2023, Vol. 41 Issue 5, p1-9, 9p

مصطلحات موضوعية: METAL oxide semiconductor capacitors, HYDROFLUORIC acid, ATOMIC layer deposition, X-ray photoelectron spectroscopy, INDIUM gallium zinc oxide, METHYL methacrylate, HAFNIUM oxide, PERMITTIVITY

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المؤلفون: Mohabir AT; Georgia Institute of Technology, School of Chemical & Biomolecular Engineering, 30332, GA, United States of America., Aziz D; Georgia Institute of Technology, School of Chemical & Biomolecular Engineering, 30332, GA, United States of America., Brummer AC; School of Materials Science & Engineering 30332, GA, United States of America., Taylor KE; Georgia Institute of Technology, School of Chemical & Biomolecular Engineering, 30332, GA, United States of America., Vogel EM; School of Materials Science & Engineering 30332, GA, United States of America., Filler MA; Georgia Institute of Technology, School of Chemical & Biomolecular Engineering, 30332, GA, United States of America.; School of Materials Science & Engineering 30332, GA, United States of America.

المصدر: Nanotechnology [Nanotechnology] 2021 Dec 13; Vol. 33 (10). Date of Electronic Publication: 2021 Dec 13.

نوع المنشور: Journal Article

بيانات الدورية: Publisher: IOP Pub Country of Publication: England NLM ID: 101241272 Publication Model: Electronic Cited Medium: Internet ISSN: 1361-6528 (Electronic) Linking ISSN: 09574484 NLM ISO Abbreviation: Nanotechnology Subsets: PubMed not MEDLINE; MEDLINE