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المؤلفون: Jea-Gun Park, Tae-Hun Shim, Jihun Kim, Byongseog Lee, Min-Won Kim, Sang-Dong Yoo
المصدر: ECS Meeting Abstracts. :1356-1356
مصطلحات موضوعية: Materials science, business.industry, Doping, Optoelectronics, Thyristor, Charge (physics), Plasma, business, Volatile memory
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المؤلفون: Sang-Dong Yoo, Jihun Kim, Tae-Hun Shim, Min-Won Kim, Byongseog Lee, Jin-Pyo Hong, Jea-Gun Park
المصدر: ECS Meeting Abstracts. :1352-1352
مصطلحات موضوعية: Materials science, business.industry, Doping, Optoelectronics, Channel (broadcasting), Tunnel field-effect transistor, business
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المؤلفون: Sarohan Park, Byounghoon Lee, Inwhan Lee, Chang-Moon Lim, Byongseog Lee
المصدر: Extreme Ultraviolet (EUV) Lithography VII.
مصطلحات موضوعية: 010309 optics, Computer science, Extreme ultraviolet lithography, 0103 physical sciences, Multiple patterning, 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 0210 nano-technology, 01 natural sciences, Lithography, Simulation, Reliability engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e705900e57aa4c542b1f18c81740f7ac
https://doi.org/10.1117/12.2219169 -
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المؤلفون: Dongsub Choi, Dohwa Lee, Sanghuck Jeon, Won-Taik Kwon, Myoung-Soo Kim, Kangsan Lee, Eitan Herzel, Mohamed Elkodadi, Tal Itzkovich, Roie Volkovich, Byongseog Lee, Sangjun Han, Honggoo Lee, Sungki Park, Mark Wagner
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, business.industry, Computer science, ComputerSystemsOrganization_COMPUTER-COMMUNICATIONNETWORKS, Computer data storage, Real-time computing, Overlay, business, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::af68038992b9723cafb058e0af844f94
https://doi.org/10.1117/12.2085270