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1دورية أكاديمية
المؤلفون: Wook Jung, Byung-Jun Lee, Sin Sung Kim, Young Jin Lee
المصدر: Korean Journal of Anesthesiology, Vol 58, Iss 3, Pp 311-317 (2010)
مصطلحات موضوعية: gunn's ims, neuropathic pain, postherpetic neuralgia, Anesthesiology, RD78.3-87.3
وصف الملف: electronic resource
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2مؤتمر
المؤلفون: Byung-jun Lee, Dae-hyun Koo, Yun-hyun Cho
المصدر: 2008 18th International Conference on Electrical Machines Electrical Machines, 2008. ICEM 2008. 18th International Conference on. :1-5 Sep, 2008
Relation: 2008 International Conference on Electrical Machines (ICEM)
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3
المؤلفون: Byung-Jun Lee
المصدر: The Justice. 194:97-124
مصطلحات موضوعية: Strategy and Management, Mechanical Engineering, Metals and Alloys, Industrial and Manufacturing Engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ec4060c3981a08bcbee1749c2d59c01f
https://doi.org/10.29305/tj.2023.2.194.97 -
4
المؤلفون: Simon Zabrocki, Pil Sung Jo, Chan Park, Dongkyun Yim, Sunghee Yun, Byung-Jun Lee
المصدر: 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f0f658e18bf3f88782ab4c63c2067f15
https://doi.org/10.1109/asmc57536.2023.10121099 -
5دورية أكاديمية
المؤلفون: Alexander Efremov, Byung Jun Lee, Kwang-Ho Kwon
المصدر: Materials, Vol 14, Iss 6, p 1432 (2021)
مصطلحات موضوعية: fluorocarbon gas plasma, etching kinetics, etching mechanism, plasma parameters, active species, polymerization, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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6دورية أكاديمية
المؤلفون: Yunho Nam, Alexander Efremov, Byung Jun Lee, Kwang-Ho Kwon
المصدر: Materials, Vol 13, Iss 23, p 5476 (2020)
مصطلحات موضوعية: global warming potential, SiOxNy etching rate, plasma diagnostics, reaction kinetics, polymerization, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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7
المؤلفون: Yeon Sik Choi, Junmyung Lee, Yunho Nam, Byung Jun Lee, Hyun Woo Lee, Kwang-Ho Kwon
المصدر: Journal of Nanoscience and Nanotechnology. 21:5157-5164
مصطلحات موضوعية: 010302 applied physics, Materials science, Plasma etching, Residual gas analyzer, Biomedical Engineering, Analytical chemistry, Bioengineering, 02 engineering and technology, General Chemistry, Plasma, Dielectric, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, symbols.namesake, Ellipsometry, 0103 physical sciences, symbols, Langmuir probe, General Materials Science, Thin film, Inductively coupled plasma, 0210 nano-technology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::52b35f0b622479aed4500057c7976b76
https://doi.org/10.1166/jnn.2021.19337 -
8
المؤلفون: JinHun Choo, Kyoung Won Na, Byung Jun Lee
المصدر: New & Renewable Energy. 17:16-23
مصطلحات موضوعية: Field (physics), Photovoltaic system, Environmental science, Submarine pipeline, Platform development, Unit (housing), Test (assessment), Marine engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e98088af9d8435e67e0a7f51a0fbc940
https://doi.org/10.7849/ksnre.2021.0012 -
9
المؤلفون: Yunho Nam, Kwang-Ho Kwon, Alexander Efremov, Byung Jun Lee
المصدر: Plasma Chemistry and Plasma Processing. 40:1365-1380
مصطلحات موضوعية: 010302 applied physics, Materials science, Plasma parameters, General Chemical Engineering, Kinetics, Analytical chemistry, chemistry.chemical_element, General Chemistry, Plasma, Condensed Matter Physics, 01 natural sciences, Dissociation (chemistry), 010305 fluids & plasmas, Surfaces, Coatings and Films, chemistry, 0103 physical sciences, Fluorine, Plasma diagnostics, Fluorocarbon, Inductively coupled plasma
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10
المؤلفون: Kwang-Ho Kwon, Alexander Efremov, Byung Jun Lee, Yunho Nam
المصدر: Science of Advanced Materials. 12:628-640
مصطلحات موضوعية: Materials science, Chemical engineering, Kinetics, Plasma chemistry, System effects, General Materials Science, Ternary operation, Silicon etching, Mixing (physics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::61e91cfe62edabebdb956014c6656c1d
https://doi.org/10.1166/sam.2020.3676