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المؤلفون: Ujwol Palanchoke, Gaby Bélot, Sébastien Bérard-Bergery, Juline Saugnier, Elodie Sungauer, Charlotte Beylier, Florian Tomaso, Marie-line Pourteau, Ivanie Mendes, Rémi Coquand, Arthur Bernadac
المصدر: Novel Patterning Technologies 2023.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::35c6c9f32f097d0c3ef841c553a145b8
https://doi.org/10.1117/12.2657600 -
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المؤلفون: Patrick Quéméré, Jérôme Vaillant, Sébastien Bérard-Bergery, Pierre Chevalier, Charlotte Beylier, Jean-Baptist Henry
المصدر: Journal of Microelectromechanical Systems. 30:442-455
مصطلحات موضوعية: Materials science, Mechanical Engineering, Process (computing), Ranging, 02 engineering and technology, Mask data preparation, Photoresist, 021001 nanoscience & nanotechnology, 01 natural sciences, Grayscale, 010309 optics, Resist, Position (vector), 0103 physical sciences, Electrical and Electronic Engineering, 0210 nano-technology, Lithography, Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::769d3d7799aebc5d6f3a14d5f006a131
https://doi.org/10.1109/jmems.2021.3067475
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المؤلفون: R. Bouyssou, J. Ducote, B. Le-Gratiet, Alain Ostrovsky, Paolo Petroni, Charlotte Beylier, Vincent Annezo, Matthieu Milléquant, C. Gardin, L. Schneider, Thiago Figueiro, Patrick Schiavone, Nivea Schuch
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Aselta-nanographics [Grenoble], Minatec, Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)
المصدر: Proceedings SPIE Volume 11325
Metrology, Inspection, and Process Control for Microlithography XXXIV
Metrology, Inspection, and Process Control for Microlithography XXXIV, Feb 2020, San Jose, United States. pp.3, ⟨10.1117/12.2551907⟩مصطلحات موضوعية: Coupling, Computer science, Rounding, Process (computing), 02 engineering and technology, Measure (mathematics), 030218 nuclear medicine & medical imaging, Image (mathematics), Metrology, 03 medical and health sciences, 020210 optoelectronics & photonics, 0302 clinical medicine, 0202 electrical engineering, electronic engineering, information engineering, Key (cryptography), Standard algorithms, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Algorithm, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::13ae227f5f46b56000f77b09b27ff4f9
https://hal.archives-ouvertes.fr/hal-03093860 -
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المؤلفون: Marion Paris, Nacima Allouti, Sébastien Bérard-Bergery, Patrick Quéméré, Vincent Farys, Pierre Chevalier, Jérôme Vaillant, Charlotte Beylier
المصدر: Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
مصطلحات موضوعية: Microlens, Pixel, Computer science, business.industry, Mask data preparation, Grayscale, Photodiode, law.invention, Optics, Resist, law, Photomask, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e54470d25c7169b78a44d515ca1db0a2
https://doi.org/10.1117/12.2514234 -
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المؤلفون: Sébastien Bérard-Bergery, Jean-Baptiste Henry, Alain Ostrovsky, Maryline Cordeau, Charlotte Beylier, Patrick Quéméré, Nacima Allouti, Raphael Eleouet, Florian Tomaso, Valérie Rousset, Jérôme Hazart
المصدر: Design-Process-Technology Co-optimization for Manufacturability XIII.
مصطلحات موضوعية: Microlens, Resist, Computer science, Electronic engineering, Design process, Shape optimization, Photoresist, Photomask, computer.software_genre, computer, Lithography, Simulation software
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fee87627a22946a904accc12c0f572ec
https://doi.org/10.1117/12.2514922 -
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المؤلفون: Charlotte Beylier, Christian Gardin, B. Le Gratiet, Alexandre Chagoya-Garzon, R. Bouyssou, J. Ducote, Matthieu Milléquant, Christophe Dezauzier, Alain Ostrovsky, Patrick Schiavone, Paolo Petroni
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Aselta Nanographics
المصدر: Proc.SPIE
Metrology, Inspection, and Process Control for Microlithography XXXIII
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.109591M, ⟨10.1117/12.2511626⟩مصطلحات موضوعية: Image quality, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Toolbox, Image (mathematics), Metrology, law.invention, 010309 optics, Wafer fabrication, law, 0103 physical sciences, Key (cryptography), Process control, Computer vision, Artificial intelligence, Radar, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fcb8a6dfcee1ab055cfbacd2635fa899
https://hal.archives-ouvertes.fr/hal-02326560 -
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المؤلفون: Guy Vitrant, Romain Girard-Desprolet, Salim Boutami, Vincent Farys, Sandrine Lhostis, Charlotte Beylier
المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), STMicroelectronics [Crolles] (ST-CROLLES), Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS), Vitrant, Guy, Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
المصدر: Applied physics. A, Materials science & processing
Applied physics. A, Materials science & processing, 2014, 117 (2), pp.485-490
Applied physics. A, Materials science & processing, Springer Verlag, 2014, 117 (2), pp.485-490مصطلحات موضوعية: Materials science, Fabrication, business.industry, [SPI] Engineering Sciences [physics], Rounding, Physics::Optics, 02 engineering and technology, General Chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 010309 optics, Wavelength, [SPI]Engineering Sciences [physics], Optics, Transmission (telecommunications), Etching (microfabrication), 0103 physical sciences, Multiple patterning, General Materials Science, Wafer, 0210 nano-technology, business, Plasmon, ComputingMilieux_MISCELLANEOUS
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المؤلفون: Yorick Trouiller, Emek Yesilada, Jean-Claude Marin, Frederic Robert, Charlotte Beylier, Clement Moyroud, Fabrice Bernard Granger
المصدر: Design for Manufacturability through Design-Process Integration VI.
مصطلحات موضوعية: Computer science, business.industry, Embedded system, Hardware_INTEGRATEDCIRCUITS, Hardware_PERFORMANCEANDRELIABILITY, Place and route, business, Lithography, Design for manufacturability
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e17f3aead65de5db3385d683e192f927
https://doi.org/10.1117/12.916138 -
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المؤلفون: Hua-yu Liu, Nicolas Martin, Vincent Farys, Franck Foussadier, Emek Yesilada, Russell Dover, Stanislas Baron, Charlotte Beylier, Frederic Robert
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resolution enhancement technologies, Computer engineering, Computational lithography, Computer science, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::92c918fa6ce6f2ac51e9049f6ee8916b
https://doi.org/10.1117/12.916168 -
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المؤلفون: Clement Moyroud, Alexandre Villaret, S. Postnikov, J. N. Pena, Vincent Farys, Charlotte Beylier, F. Bernard Granger, Olivier Toublan, Jorge Entradas, Frederic Robert, F. Chaoui, C. Gardin, Ana-Maria Armeanu, Emek Yesilada
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computational lithography, business.industry, Computer science, Extreme ultraviolet lithography, Hardware_PERFORMANCEANDRELIABILITY, Design for manufacturability, Numerical aperture, Optical proximity correction, Embedded system, Hardware_INTEGRATEDCIRCUITS, Multiple patterning, Node (circuits), Electronic design automation, business, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4e00154aa1cce6b42548a7049349f41a
https://doi.org/10.1117/12.915825
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