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1مؤتمر
المؤلفون: Chun-Min Cheng, Chi-Mao Hsu, Lin, W. C., Hsin-Fu Huang, Yan-Chun Liu, Kun-Hsien Lin, Jin-Fu Lin, Huang, C. C., Wu, JY
المصدر: 2011 International Reliability Physics Symposium Reliability Physics Symposium (IRPS), 2011 IEEE International. :BD.1.1-BD.1.4 Apr, 2011
Relation: 2011 IEEE International Reliability Physics Symposium (IRPS)
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2
المؤلفون: J. Y. Wu, Chi-Mao Hsu, C. L. Yang, H. K. Hsu, Welch Lin, Teng-Chun Tsai, R. P. Huang, J. F. Lin, Hung-Chin Huang, M. C. Tsai
المصدر: Microelectronic Engineering. 106:56-62
مصطلحات موضوعية: Materials science, Metallurgy, chemistry.chemical_element, Pinhole, Condensed Matter Physics, Microstructure, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, Aluminium, Chemical-mechanical planarization, Physical vapor deposition, Electrical and Electronic Engineering, Composite material, Metal gate, Wetting layer, High-κ dielectric
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3
المؤلفون: Wen-Chin Lin, Jack Lin, J. Y. Wu, J. F. Lin, C. C. Hwang, Teng-Chun Tsai, Chi-Mao Hsu, C. C. Liu
المصدر: Microelectronic Engineering. 92:115-118
مصطلحات موضوعية: Yield (engineering), Materials science, Dielectric strength, Polishing, Low-k dielectric, Time-dependent gate oxide breakdown, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Chemical-mechanical planarization, Surface roughness, Forensic engineering, Electrical and Electronic Engineering, Composite material, Layer (electronics)
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4
المؤلفون: Li-Wei Cheng, Ying-Tsung Chen, Chia-Jung Hsu, Chi-Mao Hsu, Chien-Ming Lai
المصدر: Thin Solid Films. 520:4482-4485
مصطلحات موضوعية: Materials science, Metals and Alloys, Analytical chemistry, Oxide, chemistry.chemical_element, Equivalent oxide thickness, Nanotechnology, Surfaces and Interfaces, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Metal, chemistry.chemical_compound, chemistry, visual_art, Materials Chemistry, Fluorine, visual_art.visual_art_medium, Field-effect transistor, Work function, Tin, High-κ dielectric
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5
المؤلفون: Chi-Mao Hsu, J. F. Lin, C. M. Cheng, Juan-Yuan Wu, Climbing Huang, C. C. Liu, H. K. Hsu, Chia-Lin Hsu, Teng-Chun Tsai, Wen-Chin Lin, Jack Lin, Willis Chen, W. C. Tsao
المصدر: 2011 International Reliability Physics Symposium.
مصطلحات موضوعية: Barrier layer, Materials science, Dielectric strength, Chemical-mechanical planarization, Surface roughness, Electronic engineering, Low-k dielectric, Polishing, Time-dependent gate oxide breakdown, Dielectric, Composite material
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c13246bcda7e9927a1c32ab4bbd010a5
https://doi.org/10.1109/irps.2011.5784470 -
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المؤلفون: Jin-Fu Lin, Yan-Chun Liu, Wen-Chin Lin, Hsin-Fu Huang, Chi-Mao Hsu, Climbing Huang, Kun-Hsien Lin, Jy Wu, Chun-Min Cheng
المصدر: 2011 International Reliability Physics Symposium.
مصطلحات موضوعية: Reliability (semiconductor), Materials science, business.industry, Electronic engineering, Optoelectronics, Time-dependent gate oxide breakdown, Node (circuits), Dielectric, Thin film, business, Chip, Failure mode and effects analysis, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3dfeed8bdc886d5e1aee540883fe93db
https://doi.org/10.1109/irps.2011.5784552 -
7
المؤلفون: Wen-Kuan Yeh, Chien-Ting Lin, C.-T. Tsai, Liang-Wei Chen, Y.-T. Huang, Chieh-Ming Lai, Chia-Wei Hsu, Yean-Kuen Fang, Chi-Mao Hsu
المصدر: 2007 IEEE Conference on Electron Devices and Solid-State Circuits.
مصطلحات موضوعية: Electron mobility, Offset (computer science), Materials science, business.industry, Transistor, Process changes, law.invention, Stress (mechanics), CMOS, Parasitic capacitance, law, Ultimate tensile strength, Electronic engineering, Optoelectronics, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4ef9a9aafd7b93e47b0ca6cded5ae259
https://doi.org/10.1109/edssc.2007.4450063
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