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1
المؤلفون: Run-Sheng Zhai, Chien-Kui Hsu, Jen-Jen Lin, T.J. Chuang
المصدر: Journal of Physics and Chemistry of Solids. 65:1333-1336
مصطلحات موضوعية: Aluminium oxides, Chemical state, Nanostructure, X-ray photoelectron spectroscopy, Magnetoresistance, Chemistry, Sputtering, Transmission electron microscopy, Nano, Analytical chemistry, General Materials Science, General Chemistry, Condensed Matter Physics
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2
المؤلفون: Run-Sheng Zhai, Arindam Das, Chien-Kui Hsu, Chau-Chung Han, Taizoon Canteenwala, T.J. Chuang, Long Y. Chiang
المصدر: Carbon. 42:395-403
مصطلحات موضوعية: Reaction mechanism, Fullerene, Oxide, General Chemistry, Photochemistry, chemistry.chemical_compound, Photopolymer, chemistry, Polymerization, X-ray photoelectron spectroscopy, Organic chemistry, Molecule, General Materials Science, Thin film
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3
المؤلفون: Chien-Kui Hsu, Tiao-Yuan Huang, Fu-Hsiang Ko, T.C. Chu, Hsuen-Li Chen, Ben-Chang Chen, L.S. Li
المصدر: Japanese Journal of Applied Physics. 41:4163-4166
مصطلحات موضوعية: Materials science, Physics and Astronomy (miscellaneous), business.industry, Extreme ultraviolet lithography, General Engineering, General Physics and Astronomy, Nanotechnology, law.invention, Resist, law, Optoelectronics, X-ray lithography, Stencil lithography, Photolithography, business, Lithography, Next-generation lithography, Immersion lithography
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4
المؤلفون: Manabendra Mukherjee, Tung J. Chuang, Ping Chuang, Yuet Loy Chan, Ruth Klauser, Chien-Kui Hsu, Run-Sheng Zhai
المصدر: Langmuir : the ACS journal of surfaces and colloids. 20(9)
مصطلحات موضوعية: Chain propagation, Photoemission spectroscopy, Chemistry, Electron energy loss spectroscopy, Radical, Thermal desorption, Surfaces and Interfaces, Condensed Matter Physics, Chemical kinetics, Chemisorption, Desorption, Electrochemistry, Physical chemistry, General Materials Science, Spectroscopy
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5
المؤلفون: Hsuen-Li Chen, Chien-Kui Hsu, Fu-Hsiang Ko, T.C. Chu, Ben-Chang Chen, Tiao-Yuan Huang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, engineering.material, medicine.disease_cause, law.invention, Optics, Anti-reflective coating, Coating, Stack (abstract data type), law, engineering, medicine, Photolithography, Photomask, business, Layer (electronics), Fabry–Pérot interferometer, Ultraviolet
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::652cdbba3c0c5bc1f44e7ff275af512c
https://doi.org/10.1117/12.438347 -
6
المؤلفون: Tiao-Yuan Huang, Chien-Kui Hsu, Ben-Chang Chen, Jung-Yen Yang, T.C. Chu, Fu-Hsiang Ko, Hsuen-Li Chen
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Nanotechnology, Photoresist, law.invention, Resist, law, Optoelectronics, X-ray lithography, Dry etching, Photolithography, business, Lithography, Next-generation lithography, Electron-beam lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3e2062c7eebb46674ac1752acd96eec1
https://doi.org/10.1117/12.436705 -
7
المؤلفون: Fu-Hsiang Ko, Hsuen-Li Chen, Wonder Fan, Tzyy Jyann Wang, Tung Jung Chuang, Run Sheng Zhai, Chien Kui Hsu
المصدر: Applied Optics. 43:2141
مصطلحات موضوعية: Materials science, business.industry, Materials Science (miscellaneous), Chemical vapor deposition, Laser, Industrial and Manufacturing Engineering, law.invention, chemistry.chemical_compound, Optical coating, Optics, Anti-reflective coating, Silicon nitride, chemistry, law, Thermal stability, Business and International Management, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f18e3fa291d5eb93da5a9639b00da163
https://doi.org/10.1364/ao.43.002141 -
8
المؤلفون: Tiao Yuan Huang, Hsuen-Li Chen, Chien Kui Hsu, Tieh Chi Chu, Fu-Hsiang Ko
المصدر: Applied Optics. 41:3961
مصطلحات موضوعية: Materials science, business.industry, Materials Science (miscellaneous), Industrial and Manufacturing Engineering, law.invention, Optics, Anti-reflective coating, Stack (abstract data type), law, Optoelectronics, Business and International Management, Thin film, Photomask, Photolithography, business, Layer (electronics), Lithography, Fabry–Pérot interferometer
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c603fa628aa7453d25989f271236bad2
https://doi.org/10.1364/ao.41.003961 -
9دورية أكاديمية
المؤلفون: Run-Sheng Zhai, Yuet Loy Chan, Chien-Kui Hsu, Ping Chuang, Ruth Klauser, Tung J. Chuang
المصدر: ChemPhysChem; Jul2004, Vol. 5 Issue 7, p1038-1041, 4p