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المؤلفون: Chun-Lin Kuo, Jyung-Dong Lin, Chih-Jung Hsia
المصدر: Materials Chemistry and Physics. 137:848-858
مصطلحات موضوعية: Plasma etching, Materials science, Non-blocking I/O, Metallurgy, chemistry.chemical_element, Plasma, Condensed Matter Physics, Microstructure, law.invention, Amorphous solid, Nickel, chemistry, Chemical engineering, law, General Materials Science, Electron microscope, Thin film