يعرض 1 - 10 نتائج من 13 نتيجة بحث عن '"Christian Gardin"', وقت الاستعلام: 0.90s تنقيح النتائج
  1. 1
    Contour based metrology: getting more from a SEM image

    المؤلفون: Charlotte Beylier, Christian Gardin, B. Le Gratiet, Alexandre Chagoya-Garzon, R. Bouyssou, J. Ducote, Matthieu Milléquant, Christophe Dezauzier, Alain Ostrovsky, Patrick Schiavone, Paolo Petroni

    المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Aselta Nanographics

    المصدر: Proc.SPIE
    Metrology, Inspection, and Process Control for Microlithography XXXIII
    Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.109591M, ⟨10.1117/12.2511626⟩

    مصطلحات موضوعية: Image quality, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Toolbox, Image (mathematics), Metrology, law.invention, 010309 optics, Wafer fabrication, law, 0103 physical sciences, Key (cryptography), Process control, Computer vision, Artificial intelligence, Radar, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fcb8a6dfcee1ab055cfbacd2635fa899
    https://hal.archives-ouvertes.fr/hal-02326560

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  2. 2
    Etch modeling for model-based optical proximity correction for 65nm node

    المؤلفون: Emek Yesilada, Mazen Saied, Franck Foussadier, Yves Rody, Christian Gardin, Jerome Belledent, Jonathan Planchot, Frederic Robert, Amandine Borjon, Christophe Couderc, Frank Sundermann, Yorick Trouiller, Jean-Christophe Urbani

    المصدر: Microelectronic Engineering. 84:770-773

    مصطلحات موضوعية: Physics, Condensed Matter Physics, Topology, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Reduction (complexity), Dimension (vector space), Optical proximity correction, Proximity effect (audio), Node (circuits), Limit (mathematics), Electrical and Electronic Engineering, Error detection and correction, Critical dimension

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ae8fe470b22993341ac933e3cf1ff67c
    https://doi.org/10.1016/j.mee.2007.01.085

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  3. 3
    Analysis of the diffraction pattern for optimal assist feature placement

    المؤلفون: Emek Yesilada, G. Kerrien, Catherine Martinelli, Florent Vautrin, Laurent Le Cam, Christophe Couderc, Jerome Belledent, Frank Sundermann, Patrick Schiavone, Franck Foussadier, Yorick Trouiller, Jonathan Planchot, Jean-Christophe Urbani, Patrick Montgomery, Mazen Saied, Frederic Robert, Amandine Borjon, Bill Willkinson, Yves Rody, Christian Gardin

    المساهمون: Laboratoire des technologies de la microélectronique (LTM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS), Philips France Semiconducteurs, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Freescale Semiconductor (FREESCALE SEMICONDUCTOR), Freescale semiconductor, STMicroelectronics [Crolles] (ST-CROLLES), Freescale Semiconductor Inc., NXP Semiconductors, Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)

    المصدر: Microelectronic Engineering
    Microelectronic Engineering, Elsevier, 2007, 84 (5-8), pp.741-745. ⟨10.1016/j.mee.2007.01.016⟩
    Microelectronic Engineering, 2007, 84 (5-8), pp.741-745. ⟨10.1016/j.mee.2007.01.016⟩

    مصطلحات موضوعية: Diffraction, Depth of focus, Computer science, SVM, Process window, 02 engineering and technology, 01 natural sciences, 010309 optics, Optics, Optical proximity correction, Position (vector), 0103 physical sciences, Reticle, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical and Electronic Engineering, business.industry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, ORC, Failure prediction, Feature (computer vision), 0210 nano-technology, business, OPC, Exposure latitude, Algorithm

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e3544f3d1c7ef4c7bf1d47f9943f4ca
    https://doi.org/10.1016/j.mee.2007.01.016

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  4. 4
    3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

    المؤلفون: Jonathan Planchot, Amandine Borjon, Vincent Farys, Yorick Trouiller, Emek Yesilada, Christophe Couderc, Frederic Robert, Nicolo Morgana, Bill Wilkinson, Jean Christophe Urbani, Yves Rody, J. L. Di-Maria, Jerome Belledent, Christian Gardin, Frank Sundermann, Franck Foussadier, G. Kerrien, Catherine Martinelli, Isabelle Schanen, Florent Vautrin, Laurent LeCam, Mazen Saied

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Materials science, business.industry, Rounding, Near and far field, law.invention, Optics, Resist, Optical proximity correction, law, Phase-shift mask, Off-axis illumination, Photolithography, business, Lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4b32f3aa447c96f40cbe921d420a2bf8
    https://doi.org/10.1117/12.752613

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  5. 5
    Characterization of inverse SRAF for active layer trenches on 45-nm node

    المؤلفون: Jonathan Planchot, Catherine Martinelli, Patrick Montgomery, Christophe Couderc, Emek Yesilada, Frederic Robert, Laurent LeCam, G. Kerrien, J. L. Di-Maria, Nicolo Morgana, Bill Wilkinson, Amandine Borjon, Yorick Trouiller, Jean-Christophe Urbani, Jerome Belledent, Franck Foussadier, Florent Vautrin, Mazen Saied, Yves Rody, Christian Gardin, Frank Sundermann, Jean-Damien Chapon, Vincent Farys

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Depth of focus, Engineering, Optical proximity correction, business.industry, Electronic engineering, Node (circuits), Process window, Process optimization, business, Lithography, Exposure latitude, Design for manufacturability

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e71cc7f64b7fe94a9a02e09c87c79f7e
    https://doi.org/10.1117/12.728960

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  6. 6
    32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner

    المؤلفون: Scott Warrick, Will Conley, Mazen Saied, Yves Rody, Christian Gardin, Jonathan Planchot, Christophe Couderc, Patrick Montgomery, Pierre-Jerome Goirand, Catherine Martinelli, Amandine Borjon, Frank Sundermann, Bill Wilkinson, Yorick Trouiller, Jean-Christophe Urbani, Frederic Robert, Laurent Le Cam, Florent Vautrin, G. Kerrien, Jerome Belledent, Emic Yesilada, Vincent Farys

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Resolution enhancement technologies, Computer science, Transistor, Integrated circuit, Design for manufacturability, law.invention, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Multiple patterning, Process window, System on a chip, Photolithography, Lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c32fba57c3e8540d10beaa1e15e963b6
    https://doi.org/10.1117/12.714116

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  7. 7
    OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

    المؤلفون: Mazen Saied, Amandine Borjon, Jerome Belledent, Florent Vautrin, Laurent LeCam, Christophe Couderc, Franck Foussadier, Catherine Martinelli, Bill Wilkinson, Emek Yesilada, Yves Rody, Christian Gardin, Jean-Luc Di Maria, Frederic Robert, Nicolo Morgana, Vincent Farys, Jonathan Planchot, Yorick Trouiller, Patrick Montgomery, Frank Sundermann, Jean-Christophe Urbani, G. Kerrien

    المصدر: 23rd European Mask and Lithography Conference.

    مصطلحات موضوعية: Wafer fabrication, Engineering drawing, Engineering, Optical proximity correction, business.industry, Reticle, Process (computing), Factory (object-oriented programming), Node (circuits), business, Computer hardware, Signature (logic), Metrology

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::856affff9df2abfcafe621e436d4142e
    https://doi.org/10.1117/12.736927

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  8. 8
    Sensitivity of a variable threshold model toward process and modeling parameters

    المؤلفون: Kevin Lucas, Amandine Borjon, Mazen Saied, Yves Rody, Christian Gardin, Christophe Couderc, Isabelle Schanen, Jerome Belledent, Laurent LeCam, Emek Yesilada, Franck Foussadier, Frank Sundermann, Yorick Trouiller, Jean-Christophe Urbani

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Optical proximity correction, Kernel (image processing), Node (circuits), Process window, Sensitivity (control systems), Threshold model, Biological system, Reference model, Stability (probability), Simulation, Mathematics

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::70c634bcf40a1f1be3dbc19039147714
    https://doi.org/10.1117/12.686666

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  9. 9
    Process window OPC verification: dry versus immersion lithography for the 65nm node

    المؤلفون: Jerome Belledent, Patrick Schiavone, F. Foussadier, Christophe Couderc, Kevin Lucas, Frank Sundermann, Yorick Trouiller, Jean-Christophe Urbani, Amandine Borjon, Yves Rody, Christian Gardin

    المساهمون: Laboratoire des technologies de la microélectronique (LTM), Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Philips France Semiconducteurs, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Freescale Semiconductor (FREESCALE SEMICONDUCTOR), Freescale semiconductor, STMicroelectronics [Crolles] (ST-CROLLES), Donis G. Flagello, Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)

    المصدر: SPIE Proceedings vol. 6154, Optical Microlithography XIX

    مصطلحات موضوعية: Engineering, Proximity effect (electron beam lithography), Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 01 natural sciences, 010309 optics, Optics, Optical proximity correction, process window, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Miniaturization, failure prediction, Process window, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Lithography, Immersion lithography, business.industry, Process (computing), 021001 nanoscience & nanotechnology, ORC, resist modelling, Node (circuits), 0210 nano-technology, business, OPC

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6d4d3068cbacade6854d57fed44c073
    https://doi.org/10.1117/12.657056

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  10. 10
    Critical failure ORC: Improving model accuracy through enhanced model generation

    المؤلفون: Amandine Borjon, Patrick Schiavone, Frank Sundermann, Kyle Patterson, Yorick Trouiller, Jean-Christophe Urbani, Jerome Belledent, Kevin Lucas, Yves Rody, Christian Gardin, Christophe Couderc, Stanislas Baron, F. Foussadier

    المساهمون: Laboratoire des technologies de la microélectronique (LTM), Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Philips France Semiconducteurs, Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Freescale Semiconductor (FREESCALE SEMICONDUCTOR), Freescale semiconductor, STMicroelectronics [Crolles] (ST-CROLLES), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)

    المصدر: Microelectronic Engineering
    Microelectronic Engineering, Elsevier, 2006, 83, Issues 4-9, pp.1017-1022. ⟨10.1016/j.mee.2006.01.034⟩
    Microelectronic Engineering, 2006, 83, Issues 4-9, pp.1017-1022. ⟨10.1016/j.mee.2006.01.034⟩

    مصطلحات موضوعية: Computer science, SVM, 020208 electrical & electronic engineering, Process (computing), Process window, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Support vector machine, Reduction (complexity), Optical proximity correction, ORC, Failure prediction, Statistical learning theory, 0202 electrical engineering, electronic engineering, information engineering, Node (circuits), Electrical and Electronic Engineering, 0210 nano-technology, Algorithm, OPC, Aerial image

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dfb2f29442c8d94a5b03357359bfa6ef
    https://hal.archives-ouvertes.fr/hal-00023226

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