المؤلفون: Vu Luong, Vicky Philipsen, Eric Hendrickx, Karl Opsomer, Christophe Detavernier, Christian Laubis, Frank Scholze, Marc Heyns

المصدر: Applied Sciences, Vol 8, Iss 4, p 521 (2018)

مصطلحات موضوعية: mask absorber, binary intensity mask, nickel, aluminum, mask 3D, imaging impact, EUV lithography, Technology, Engineering (General). Civil engineering (General), TA1-2040, Biology (General), QH301-705.5, Physics, QC1-999, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: http://www.mdpi.com/2076-3417/8/4/521; https://doaj.org/toc/2076-3417

URL الوصول: https://doaj.org/article/b0f1a5d806d64779ba1e19566d7153a5

المؤلفون: Qais Saadeh, Hazem Mesilhy, Victor Soltwisch, Andreas Erdmann, Richard Ciesielski, Leonhard Lohr, Anna Andrle, Vicky Philipsen, Devesh Thakare, Christian Laubis, Frank Scholze, Michael Kolbe

المصدر: Photomask Technology 2022.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::98c1dcc64f0ef20ee22d170c04a09760
https://doi.org/10.1117/12.2643246

المؤلفون: Marco Barbera, Ugo Lo Cicero, Luisa Sciortino, Michela Todaro, Elena Puccio, Fabio D'Anca, Nicola Montinaro, Salvatore Varisco, Pekka Törmä, Lauri Riuttanen, Ilkka Varjos, Bjorn Mikladal, Elena Magnano, Igor Pis, Christian Gollwitzer, Evelyn Handick, Michael Krumrey, Christian Laubis

المساهمون: den Herder, Jan-Willem A., Barbera, Marco, Lo Cicero, Ugo, Sciortino, Luisa, Todaro, Michela, Puccio, Elena, D'Anca, Fabio, Montinaro, Nicola, Varisco, Salvatore, Törmä, Pekka, Riuttanen, Lauri, Varjos, Ilkka, Mikladal, Bjorn, Magnano, Elena, Pis, Igor, Gollwitzer, Christian, Handick, Evelyn, Krumrey, Michael, Laubis, Christian

المصدر: Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray.

مصطلحات موضوعية: Settore FIS/05 - Astronomia E Astrofisica, X-ray detectors for astrophysics, optical blocking filters, CNT, synchrotron, absorption spectroscopy, X-ray photoelectron spectroscopy, mechanical tests

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e23ecc28d2d08b5f2a997ef4add37613
https://doi.org/10.1117/12.2631516

المؤلفون: Qais Saadeh, Philipp Naujok, Devesh Thakare, Meiyi Wu, Vicky Philipsen, Frank Scholze, Christian Buchholz, Zanyar Salami, Yasser Abdulhadi, Danilo Ocaña García, Heiko Mentzel, Anja Babuschkin, Christian Laubis, Victor Soltwisch

المصدر: Optik. 273:170455

مصطلحات موضوعية: Science & Technology, INFORMATION, Thin films, MIRRORS, Optics, Cobalt, X-ray reflectivity, FREQUENCY-ANALYSIS, Carbon, Atomic and Molecular Physics, and Optics, REFLECTOMETRY, Electronic, Optical and Magnetic Materials, Extreme ultraviolet, THIN-FILMS, Physical Sciences, Optical constants, SCATTERING, WAVELET-TRANSFORM, Electrical and Electronic Engineering, EXTREME-ULTRAVIOLET, OPTIMIZATION

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a602b48134dc31327ebb4ab40174841
https://doi.org/10.1016/j.ijleo.2022.170455

المؤلفون: Victor Soltwisch, Anja Schönstedt, Qais Saadeh, Christian Buchholz, Christian Stadelhoff, Anna Andrle, Philipp Naujok, Vicky Philipsen, Philipp Hönicke, Heiko Mentzel, Frank Scholze, Christian Laubis

المصدر: Optics Express. 29:40993

مصطلحات موضوعية: Materials science, Extreme ultraviolet lithography, FOS: Physical sciences, Synchrotron radiation, chemistry.chemical_element, 02 engineering and technology, 01 natural sciences, Molecular physics, Electromagnetic radiation, 010309 optics, Condensed Matter::Materials Science, symbols.namesake, Optics, Robustness (computer science), 0103 physical sciences, Thin film, Condensed Matter - Materials Science, business.industry, Materials Science (cond-mat.mtrl-sci), Markov chain Monte Carlo, 021001 nanoscience & nanotechnology, Atomic and Molecular Physics, and Optics, Ruthenium, X-ray reflectivity, chemistry, symbols, 0210 nano-technology, business, Optics (physics.optics), Physics - Optics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e36b4388881437c3b84abee11bb5dd4
https://doi.org/10.1364/oe.426029

المؤلفون: Sebastian Heidenreich, Konstantin Nikolaev, Michael Kolbe, Maren Casfor Zapata, Frank Scholze, Christian Laubis, Mika Pflüger, Victor Soltwisch, Nando Farchmin

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.

مصطلحات موضوعية: Polynomial chaos, Surrogate model, Computer science, Monte Carlo method, Sobol sequence, Sensitivity (control systems), Inverse problem, Algorithm, Finite element method, Metrology

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4055a46cfc5152dddeb1449ecd0a6541
https://doi.org/10.1117/12.2552037

المؤلفون: Andreas Erdmann, Jens Rip, Philipp Hönicke, Christian Laubis, Laurent Souriau, Eric Hendrickx, Peter Evanschitzky, Christophe Detavernier, Vicky Philipsen, Kim Vu Luong, Karl Opsomer, Victor Soltwisch

المصدر: Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology.

مصطلحات موضوعية: Plasma etching, Test flow, Materials science, business.industry, Extreme ultraviolet lithography, Thermal, Optoelectronics, Wafer, Photomask, business, Reflectometry, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::abe3519e94c1ed721063bbaca25898f3
https://doi.org/10.1117/12.2537967

المؤلفون: Annett Barboutis, Ayhan Babalik, Jana Puls, Christian Stadelhoff, Anja Schönstedt, Jana Lehnert, Claudia Tagbo, Christian Laubis, Michael Sintschuk, Anja Babuschkin, Heiko Mentzel, Andreas Fischer, Frank Scholze, Christian Buchholz, Sina Jaroslawzew

المصدر: Extreme Ultraviolet (EUV) Lithography X.

مصطلحات موضوعية: Optics, Materials science, Beamline, business.industry, Extreme ultraviolet lithography, Detector, Radiant energy, Radiometry, business, Fluence, Metrology, Diode

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::37df636c64aaf4f39073c293cb67a02f
https://doi.org/10.1117/12.2514933

المؤلفون: Vu Luong, Christophe Detavernier, Marc Heyns, Christian Laubis, Vicky Philipsen, Karl Opsomer, Frank Scholze, Jens Rip, Eric Hendrickx

المصدر: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

مصطلحات موضوعية: Inert, Materials science, Technology and Engineering, Hydrogen, business.industry, Process Chemistry and Technology, Extreme ultraviolet lithography, chemistry.chemical_element, Molar absorptivity, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Metal, chemistry.chemical_compound, chemistry, visual_art, Telluride, Materials Chemistry, visual_art.visual_art_medium, Optoelectronics, Electrical and Electronic Engineering, Photomask, Tellurium, business, Instrumentation

وصف الملف: application/pdf

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8274d32c3dbf36f763d115cdae99c0b0
https://biblio.ugent.be/publication/8661503/file/8661517

المؤلفون: Claudia Tagbo, Victor Soltwisch, Christian Laubis, Frank Scholze, Christian Buchholz, Andreas Fischer

المصدر: International Conference on Extreme Ultraviolet Lithography 2018.

مصطلحات موضوعية: Wavelength, Optics, Optical coating, Materials science, business.industry, Extreme ultraviolet lithography, Transmittance, Synchrotron radiation, Magnification, Reflectometry, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5a7adc4a4ac5a55fb1c6ed7075425101
https://doi.org/10.1117/12.2501774