المؤلفون: Carole Braley, Esidor Ntsoenzok, Frédéric Mazen, Chrystel Deguet, François Rieutord, Aurélie Tauzin

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 277:93-97

مصطلحات موضوعية: Nuclear and High Energy Physics, Thin layers, Materials science, Silicon, Hydrogen, business.industry, Annealing (metallurgy), chemistry.chemical_element, Fluence, chemistry, Optoelectronics, Wafer, Crystalline silicon, Fourier transform infrared spectroscopy, business, Instrumentation

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::aa9d2c9de793a231793f419551dfa179
https://doi.org/10.1016/j.nimb.2011.12.056

المؤلفون: H. Moriceau, Carole Braley, Frédéric Mazen, Chrystel Deguet, François Rieutord, Aurélie Tauzin

المصدر: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 277:84-92

مصطلحات موضوعية: Nuclear and High Energy Physics, Materials science, Hydrogen, Silicon, Wafer bonding, Silicon on insulator, chemistry.chemical_element, Nanotechnology, Substrate (electronics), Ion implantation, chemistry, Wafer, Instrumentation, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5acffd874e0afc8639b6961aa0a01944
https://doi.org/10.1016/j.nimb.2011.12.050

المؤلفون: Chrystel Deguet, Hubert Moriceau, Rachid Taibi, F. Fournel, Laure Libralesso, François Rieutord, C. Moulet, L. Di Cioccio, P. Gueguen

المصدر: Microelectronics Reliability. 52:331-341

مصطلحات موضوعية: Materials science, business.industry, Process (computing), Heterojunction, Nanotechnology, Direct bonding, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Reliability (semiconductor), Microsystem, Microelectronics, Electrical and Electronic Engineering, Safety, Risk, Reliability and Quality, business, Smoothing, Metallic bonding

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d348933cb418b3cfb049691256c17b2b
https://doi.org/10.1016/j.microrel.2011.08.004

المؤلفون: L. Di Cioccio, Barbara Charlet, Laurent Clavelier, O. Renault, N. Rochat, Chrystel Deguet, B. Charlet

المصدر: Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT). 2011:000817-000835

مصطلحات موضوعية: Interconnection, business.industry, Chemistry, Stacking, Flux, Nanotechnology, Atmospheric-pressure plasma, Plasma, Contact angle, visual_art, Electronic component, visual_art.visual_art_medium, Optoelectronics, Pharmacology (medical), business, Electronic circuit

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6b68981a859ec01e00201ae1cb3f192f
https://doi.org/10.4071/2011dpc-tp15

المؤلفون: Thierry Billon, Laurent Clavelier, Olivier Faynot, M. Piccin, Jéro^me Dechamp, Thomas Signamarcheix, Fabrice Lallement, Arnaud Rigny, Jean-Francois Damlencourt, Chrystel Deguet, Sorin Cristoloveanu, Marie-Anne Jaud, Alexandra Abbadie, Konstantin Bourdelle, Michel Pellat, K. Romanjek, Loic Sanchez, Cécile Maurois, A. Pouydebasque, Fabien Boulanger, Nicolas Daval, Perrine Batude, Cyrille Le Royer, Claude Tabone, Aurélie Tauzin, Eric Guiot, Charlotte Drazek, Frédéric Mazen, Emmanuel Augendre, P. Scheiblin, Bruno Ghyselen, Jean-Michel Hartmann, William Van Den Daele, Maud Vinet, Marc Zussy, Lamine Benaissa, Nicolas Blanc

المصدر: ECS Transactions. 25:351-362

مصطلحات موضوعية: Fabrication, Materials science, chemistry, Passivation, Tunneling field effect transistor, chemistry.chemical_element, Nanotechnology, Germanium, Insulator (electricity), Engineering physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3185bda807608d17f62d2d6fb7791798
https://doi.org/10.1149/1.3203972

المؤلفون: Chrystel Deguet, K. Romanjek, Laurent Clavelier, S. Soliveres, R. Truche, M. Vinet, A. Pouydebasque, G. Le Carval, M.-C. Roure, C. Le Royer, H. Grampeix, Loic Sanchez, Claude Tabone, Simon Deleonibus, J.M. Hartmann

المصدر: Solid-State Electronics. 52:1285-1290

مصطلحات موضوعية: Materials science, Silicon, business.industry, Transconductance, chemistry.chemical_element, Nanotechnology, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Ion implantation, chemistry, MOSFET, Materials Chemistry, Optoelectronics, Wafer, Electrical and Electronic Engineering, business, Metal gate, Current density, High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4797045475f182408fcd7fcafbe23250
https://doi.org/10.1016/j.sse.2008.04.019

المؤلفون: Fabrice Letertre, Alexandra Abbadie, L. Sanchez, Francois Brunier, Chrystel Deguet, Jean-Michel Hartmann

المصدر: ECS Transactions. 6:263-269

مصطلحات موضوعية: Crystallography, Materials science, Order (business), Etching (microfabrication), Engineering physics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::576d9f57639f4f2841911270bb2a4043
https://doi.org/10.1149/1.2728870

المؤلفون: Cécile Berne, Takeshi Akatsu, Muriel Martinez, Jean-Michel Hartmann, Christophe Figuet, Yves-Matthieu Le Vaillant, Chrystel Deguet, Cecile Aulnette, Fabrice Lallement, Lionel Portigliatti, Frederic Allibert, Nicolas Boudou, Alexandra Abbadie, Fanny Triolet, Y. Bogumilowicz, Cyrille Colnat, Phuong Nguyen, Cécile Delattre, Kira Tsyganenko, Denis Rouchon

المصدر: ECS Transactions. 3:107-117

مصطلحات موضوعية: Materials science, business.industry, Optoelectronics, Strained silicon, Insulator (electricity), business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b4e7f02313f6da506b31ebafdda93bbd
https://doi.org/10.1149/1.2357060

المؤلفون: N. Kernevez, Frédéric Mazen, Laurent Clavelier, Chrystel Deguet, Jean-Michel Hartmann, Denis Rouchon, Frederic Allibert, Fabrice Letertre, Takeshi Akatsu, L. Sanchez, Thomas Signamarcheix, C. Richtarch, Virginie Loup, Carlos Mazure, Alice Boussagol, Yves Campidelli

المصدر: Materials Science in Semiconductor Processing. 9:444-448

مصطلحات موضوعية: Materials science, business.industry, Mechanical Engineering, Transistor, Silicon on insulator, Photodetector, chemistry.chemical_element, Nanotechnology, Germanium, Condensed Matter Physics, law.invention, Ion implantation, chemistry, Mechanics of Materials, law, MOSFET, Optoelectronics, General Materials Science, Wafer, Charge carrier, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::05ea5c0bbd701839ba465c060424786b
https://doi.org/10.1016/j.mssp.2006.08.077

المؤلفون: Fabrice Lallement, François Rieutord, Chrystel Deguet, F. Gonzatti, Didier Landru, Shay Reboh, Florence Madeira, A. Royal, F. Mazen

المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Silicon-on-Insulator Technologies (SOITEC), Parc Technologique des Fontaines, SOITEC SA, Nanostructures et Rayonnement Synchrotron (NRS ), Modélisation et Exploration des Matériaux (MEM), Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Fondamentale (CEA) (DRF (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Centre d'élaboration de matériaux et d'études structurales (CEMES), Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie de Toulouse (ICT-FR 2599), Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Institut de Chimie du CNRS (INC)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut de Recherche pour le Développement (IRD)-Institut de Chimie du CNRS (INC)-Institut National des Sciences Appliquées - Toulouse (INSA Toulouse), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA), Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut de Recherche Interdisciplinaire de Grenoble (IRIG), Institut National des Sciences Appliquées - Toulouse (INSA Toulouse), Institut National des Sciences Appliquées (INSA)-Université de Toulouse (UT)-Institut National des Sciences Appliquées (INSA)-Université de Toulouse (UT)-Institut de Chimie de Toulouse (ICT), Institut de Recherche pour le Développement (IRD)-Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Institut de Recherche pour le Développement (IRD)-Université Toulouse III - Paul Sabatier (UT3), Université de Toulouse (UT)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Centre National de la Recherche Scientifique (CNRS)

المصدر: 20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014)
20TH INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY (IIT 2014), Jun 2014, Portland, United States. pp.1-4, ⟨10.1109/iit.2014.6940054⟩

مصطلحات موضوعية: Thin layers, Materials science, Silicon, business.industry, Inorganic chemistry, Nanocrystalline silicon, chemistry.chemical_element, Strained silicon, Substrate (electronics), trapping, [PHYS.PHYS.PHYS-GEN-PH]Physics [physics]/Physics [physics]/General Physics [physics.gen-ph], [PHYS.MECA.MEMA]Physics [physics]/Mechanics [physics]/Mechanics of materials [physics.class-ph], Ion implantation, chemistry, hydrogen, layer transfer, Optoelectronics, Wafer, ion implantation, business, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f50c8aeaac8ba1ed477cd51e4be86706
https://hal.univ-grenoble-alpes.fr/hal-02016588