المؤلفون: Current, M.I., Sakaguchi, T., Kawasaki, Y., Samu, V., Pongracz, A., Sinko, L., Kerekes, A., Durko , Z.

المصدر: IEEE Journal of the Electron Devices Society IEEE J. Electron Devices Soc. Electron Devices Society, IEEE Journal of the. 12:399-406 2024

المؤلفون: Lee, Y., Cho, T., Chuang, S., Hsueh, F., Lu, Y., Sung, P., Chen, H., Current, M.I., Tseng, T., Chao, T., Hu, C., Yang, F.

المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(7):3983-3983 Jul, 2023

المؤلفون: Lee, Y., Hsueh, F., Current, M.I., Wu, C., Chao, T.

المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 44(6):1015-1015 Jun, 2023

المؤلفون: Current, M.I.

المصدر: 2016 IEEE Workshop on Microelectronics and Electron Devices (WMED) Microelectronics and Electron Devices (WMED), 2016 IEEE Workshop on. :1-5 Apr, 2016

Relation: 2016 IEEE Workshop on Microelectronics and Electron Devices (WMED)

المؤلفون: Sung, P., Cho, T., Hou, F., Hsueh, F., Chung, S., Lee, Y., Current, M.I., Chao, T.

المصدر: IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 64(5):2054-2060 May, 2017

المؤلفون: Lukaszek, W., Current, M.I., Daryanani, S., Larson, L., Rhoad, T., Shields, J., Vella, M., Wagner, D.

المصدر: 2003 8th International Symposium Plasma- and Process-Induced Damage. Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2003 8th International Symposium. :182-185 2003

Relation: 2003 8th International Symposium on Plasma- and Process-Induced Damage

المؤلفون: Current, M.I.

المصدر: Extended Abstracts of the Third International Workshop on Junction Technology, 2002. IWJT. Junction technology Junction Technology, 2002. IWJT. Extended Abstracts of the Third International Workshop on. :97-101 2002

Relation: Extended Abstracts of the Third International Workshop on Junction Technology. IWJT

المؤلفون: Current, M.I.

المصدر: Extended Abstracts of the First International Workshop on Junction Technology (IEEE Cat. No.00EX464) Junction technology Junction Technology, 2000, The first international workshop on, Extended abstracts of. :13-17 2000

Relation: Extended Abstracts of the First International Workshop on Junction Technology

المؤلفون: Feng, L.M., Lamm, A.J., Liu, W., Garces, E., Chan, C., Current, M.I., Henley, F.J.

المصدر: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Ion implantation technology Ion Implantation Technology, 2000. Conference on. :289-292 2000

Relation: 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000

المؤلفون: Current, M.I., Lukaszek, W., Vella, M.C.

المصدر: 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) Plasma process-induced damage Plasma Process-Induced Damage, 2000 5th International Symposium on. :137-140 2000

Relation: 2000 5th International Symposium on Plasma Process-Induced Damage