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1مؤتمر
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
2
المؤلفون: D.S. Wen, C.C.-H. Hsu, M.R. Wordeman, Tak H. Ning, D.S. Zicherman, Yuan Taur
المصدر: International Technical Digest on Electron Devices Meeting.
مصطلحات موضوعية: Materials science, business.industry, Doping, Oxide, Electrical engineering, chemistry.chemical_element, chemistry.chemical_compound, chemistry, CMOS, Stack (abstract data type), MOSFET, Optoelectronics, Reactive-ion etching, Tin, business, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2f932fe43e804a865c14dfb5c48975f5
https://doi.org/10.1109/iedm.1989.74166 -
3
المؤلفون: L.K. Wang, W. Chang, D.S. Wen, A.A. Bright, T.N. Nguyen
المصدر: International Technical Digest on Electron Devices Meeting.
مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, technology, industry, and agriculture, Oxide, food and beverages, Time-dependent gate oxide breakdown, Substrate (electronics), chemistry.chemical_compound, Quality (physics), CMOS, chemistry, Gate oxide, Plasma-enhanced chemical vapor deposition, Electronic engineering, Optoelectronics, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7456a91aa97637389f38c33a4c43e67c
https://doi.org/10.1109/iedm.1989.74322 -
4
المؤلفون: C.C.-H. Hsu, Yuan Taur, M.R. Wordeman, D.S. Wen, Tak H. Ning
المصدر: International Technical Digest on Electron Devices Meeting.
مصطلحات موضوعية: Materials science, business.industry, Oxide, Electron trapping, Time-dependent gate oxide breakdown, Injector, Instability, law.invention, Stress (mechanics), chemistry.chemical_compound, CMOS, chemistry, law, Optoelectronics, Atomic physics, business, Hot-carrier injection
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::73a4f620142477c4f113efba9408e7db
https://doi.org/10.1109/iedm.1989.74231 -
5
المؤلفون: T.C. Chen, F.L. Pesavento, P.A. McFarland, Wei Hwang, S.H. Dhong, T.V. Rajeevakumar, Gary B. Bronner, D.S. Wen, M.P. Manny, Y. Lii, W.H. Chang
المصدر: 1991 International Symposium on VLSI Technology, Systems, and Applications - Proceedings of Technical Papers.
مصطلحات موضوعية: Materials science, Silicon, business.industry, Transistor, Oxide, Electrical engineering, chemistry.chemical_element, law.invention, chemistry.chemical_compound, Capacitor, Planar, chemistry, law, Etching, Optoelectronics, Degradation (geology), business, Electronic circuit
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0e46cff8ae87f01ca183a84b53b4d509
https://doi.org/10.1109/vtsa.1991.246728 -
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المؤلفون: K.J. Stein, D.S. Wen, Z.A. Weinberg, P. Olivo
مصطلحات موضوعية: business.industry, Chemistry, Oxide, Mineralogy, Charge (physics), Trapping, Nitride, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Threshold shift, chemistry.chemical_compound, Materials Chemistry, Optoelectronics, Electrical and Electronic Engineering, business, Thin oxide, Deposition (law)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7f756ca634a7935a7bbf292bd00afcdf
http://hdl.handle.net/11392/462050 -
7
المؤلفون: P.A. McFarland, Gary B. Bronner, A.C. Megdanis, D.S. Wen, W.H. Chang, Y. Lii
المصدر: 1991 Symposium on VLSI Technology.
مصطلحات موضوعية: Materials science, CMOS, Silicon, chemistry, Etching (microfabrication), Rapid thermal processing, business.industry, Chemical-mechanical planarization, Electrical engineering, Optoelectronics, chemistry.chemical_element, business, Capacitance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::15475a6017e3c567f04876889d758a8f
https://doi.org/10.1109/vlsit.1991.706001 -
8
المؤلفون: W.H. Henkels, D.S. Wen, R.L. Mohler, R.L. Franch, T.J. Bucelot, C.W. Long, J.A. Bracchitta, W.J. Cote, G.B. Bronner, Y. Taur, R.H. Dennard
المصدر: 1991 IEEE International Solid-State Circuits Conference. Digest of Technical Papers.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b92656c533a4885edaa187b44745c1f4
https://doi.org/10.1109/isscc.1991.689050 -
9دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
10دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل.