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1Design and characterization of a CMOS off-chip driver/receiver with reduced power-supply disturbance
المؤلفون: Chen Chen, R.H. Dennard, Hussein I. Hanafi, R. J. Weiss, D.S. Zicherman
المصدر: IEEE Journal of Solid-State Circuits. 27:783-791
مصطلحات موضوعية: Physics, Noise (signal processing), business.industry, Circuit design, Electrical engineering, Integrated circuit, Chip, Signal, law.invention, CMOS, Transmission line, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Electrical and Electronic Engineering, business, Voltage
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2
المؤلفون: D.S. Wen, C.C.-H. Hsu, M.R. Wordeman, Tak H. Ning, D.S. Zicherman, Yuan Taur
المصدر: International Technical Digest on Electron Devices Meeting.
مصطلحات موضوعية: Materials science, business.industry, Doping, Oxide, Electrical engineering, chemistry.chemical_element, chemistry.chemical_compound, chemistry, CMOS, Stack (abstract data type), MOSFET, Optoelectronics, Reactive-ion etching, Tin, business, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2f932fe43e804a865c14dfb5c48975f5
https://doi.org/10.1109/iedm.1989.74166 -
3
المؤلفون: M. Rodriguez, S. Brodsky, N. Mazzeo, Bijan Davari, Tak H. Ning, K. Pettrilo, R. Lombardi, T.J. Bucelot, D.S. Zicherman, P.A. McFarland, M.R. Polcari, A. Fink, Ghavam G. Shahidi
المصدر: 1992 Symposium on VLSI Technology Digest of Technical Papers.
مصطلحات موضوعية: Materials science, business.industry, Doping, Electrical engineering, NAND gate, Silicon on insulator, Hardware_PERFORMANCEANDRELIABILITY, law.invention, Capacitor, CMOS, law, Logic gate, Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Breakdown voltage, business, Hardware_LOGICDESIGN, Electronic circuit
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5031f18bd6a8140812b816f32b4995e4
https://doi.org/10.1109/vlsit.1992.200671 -
4
المؤلفون: R. Schulz, B. Wu, Keith Jenkins, D.S. Zicherman, Bijan Davari, Tak H. Ning, P.J. Coane, J.Y.-C. Sun, James D. Warnock, Denny D. Tang, Ghavam G. Shahidi, C.L. Chen, M. Rodriguez, M.R. Polcari, D. Klaus, P.A. McFarland, Yuan Taur, C.Y. Wong
المصدر: 1992 Symposium on VLSI Technology Digest of Technical Papers.
مصطلحات موضوعية: Materials science, Ion implantation, CMOS, business.industry, Shallow trench isolation, Electrical engineering, Optoelectronics, Ring oscillator, business, Lithography, NMOS logic, Electron-beam lithography, Common emitter
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::13c9b7e2694ecf1ee7d312e8a23b666b
https://doi.org/10.1109/vlsit.1992.200630 -
5
المؤلفون: D.S. Zicherman, Bijan Davari, Phillip J. Restle, Yuan Taur, C.C.-H. Hsu, H.I. Nanafi, D.R. Lombardi, Ghavam G. Shahidi, M.R. Wordeman
المصدر: IEEE Electron Device Letters. 13:267-269
مصطلحات موضوعية: Yield (engineering), Materials science, Channel length modulation, business.industry, Extraction (chemistry), Electronic, Optical and Magnetic Materials, Length measurement, CMOS, MOSFET, Electronic engineering, Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Communication channel
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6
المؤلفون: George Anthony Sai-Halasz, S. Rishton, H.Y. Ng, Heinz Schmid, M.R. Wordeman, Phillip J. Restle, E. Ganin, M. Polcari, Tai-Hon Philip Chang, R.H. Dennard, D.S. Zicherman, Dieter P. Kern
المصدر: IEEE Electron Device Letters. 8:463-466
مصطلحات موضوعية: Engineering, business.industry, Transconductance, Electrical engineering, Substrate (electronics), Electronic, Optical and Magnetic Materials, Power (physics), Optoelectronics, Field-effect transistor, Electrical and Electronic Engineering, business, Lithography, Quantum tunnelling, Electronic circuit, Voltage
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7
المؤلفون: M.R. Polcari, J.Y.-C. Sun, Fang-Shi J. Lai, T.J. Bucelot, L.K. Wang, D.S. Zicherman, E.J. Petrillo, Yuan Taur, K. Petrillo, S.K. Chicotka
المصدر: IEEE Transactions on Electron Devices. 33:1308-1320
مصطلحات موضوعية: Materials science, business.industry, Subthreshold conduction, Nanotechnology, Substrate (electronics), Integrated circuit, Electronic, Optical and Magnetic Materials, law.invention, chemistry.chemical_compound, Ion implantation, CMOS, chemistry, law, Titanium disilicide, Optoelectronics, Wafer, Electrical and Electronic Engineering, business, Common emitter
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8
المؤلفون: E. Ganin, H. Ng, D.S. Zicherman, S. Rishton, George Anthony Sai-Halasz, Robert H. Dennard, Dan Moy, M.R. Wordeman, T.H.P. Chang, D.P. Kern
المصدر: 1987 International Electron Devices Meeting.
مصطلحات موضوعية: Materials science, business.industry, Transconductance, Gate length, Hardware_PERFORMANCEANDRELIABILITY, Cryogenics, Characterization (materials science), Hardware_INTEGRATEDCIRCUITS, Optoelectronics, Wafer, business, Lithography, NMOS logic, Hardware_LOGICDESIGN
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bb3990325936eefd0c43e5f77f7b4cfd
https://doi.org/10.1109/iedm.1987.191441 -
9
المؤلفون: Phillip J. Restle, T.J. Buccelot, Hussein I. Hanafi, R.W. Weiss, D.S. Zicherman
مصطلحات موضوعية: Materials science, business.industry, Semiconductor device modeling, Electrical engineering, Saturation velocity, Hardware_PERFORMANCEANDRELIABILITY, Atmospheric temperature range, Liquid nitrogen, ASTAP, Threshold voltage, Computer Science::Hardware Architecture, Computer Science::Emerging Technologies, CMOS, Hardware_INTEGRATEDCIRCUITS, business, Electronic circuit
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::28fbdd114ce457b5c6cb46d2d8f4754c
https://doi.org/10.1007/978-3-642-52314-4_83 -
10
المؤلفون: Karen Petrillo, S.M. Chicotka, M.R. Polcari, Y.C. Sun, E. Petrillo, F.S. Lai, L.K. Wang, Yuan Taur, D.S. Zicherman, T.J. Bucelot
المصدر: 1985 International Electron Devices Meeting.
مصطلحات موضوعية: Materials science, Fabrication, business.industry, Substrate (electronics), Nitride, chemistry.chemical_compound, Ion implantation, CMOS, chemistry, Etching (microfabrication), Silicide, Electronic engineering, Optoelectronics, business, Common emitter
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::10809fd19a3a702c4ed9bc1289e39d72
https://doi.org/10.1109/iedm.1985.191016