يعرض 1 - 10 نتائج من 14 نتيجة بحث عن '"Dabertrand, Karen"', وقت الاستعلام: 0.83s تنقيح النتائج
  1. 1
    مؤتمر
    Characterization of Heated Ion Implantation for non Amorphizing Conditions and Correlation with Kinetic Monte Carlo Simulations

    المؤلفون: Joblot, Sylvain, Duru, Romain, Guitard, Nicolas, Lu, Vincent, Nassiet, Thomas, Beneyton, Remi, Cristiano, Fuccio, Dabertrand, Karen, Borrel, Julien, Juhel, Marc, Arevalo, Edwin, Monsieur, Frederic, Borowiak, Celine, Ghegin, Elodie, Clement, Laurent, Oudot, Evan, Rideau, Denis, Zou, Wei, Pinzelli, Luc

    المصدر: 2018 22nd International Conference on Ion Implantation Technology (IIT) Ion Implantation Technology (IIT), 2018 22nd International Conference on. :121-124 Sep, 2018

    Relation: 2018 22nd International Conference on Ion Implantation Technology (IIT)

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  2. 2
    دورية أكاديمية
    Ni(Pt)-based CMOS-compatible contacts on p-InGaAs for III–V photonic devices

    المؤلفون: Boyer, Flore, Dabertrand, Karen, Bernier, Nicolas, Jany, Christophe, Gergaud, Patrice, Grégoire, Magali, Rafhay, Quentin, Rodriguez, Philippe

    المصدر: In Materials Science in Semiconductor Processing February 2023 154

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  3. 3
    مؤتمر
    Effective work function engineering by sacrificial lanthanum diffusion on HfON-based 14 nm NFET devices

    المؤلفون: Suarez-Segovia, Carlos, Leroux, Charles, Domengie, Florian, Dabertrand, Karen, Joseph, Vincent, Romano, Giovanni, Caubet, Pierre, Zoll, Stephane, Weber, Olivier, Ghibaudo, Gerard, Reimbold, Gilles, Haond, Michel

    المصدر: 2015 45th European Solid State Device Research Conference (ESSDERC) Solid State Device Research Conference (ESSDERC), 2015 45th European. :246-249 Sep, 2015

    Relation: ESSDERC 2015 - 45th European Solid-State Device Research Conference

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  4. 4
    دورية أكاديمية
    Modification of Ge-rich GeSbTe surface during the patterning process of phase-change memories

    المؤلفون: Canvel, Yann, Lagrasta, Sébastien, Boixaderas, Christelle, Barnola, Sébastien, Mazel, Yann, Dabertrand, Karen, Martinez, Eugénie

    المصدر: In Microelectronic Engineering 15 January 2020 221

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  5. 5
    دورية أكاديمية

    لا يتم عرض هذه النتيجة على الضيوف.

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  6. 6
    دورية أكاديمية
    Integration of the Ni/InP system on a 300 mm platform for III-V/Si hybrid lasers.

    المؤلفون: Boyer, Flore, Gergaud, Patrice, Dabertrand, Karen, Mariolle, Denis, Jany, Christophe, Nemouchi, Fabrice, Grégoire, Magali, Rafhay, Quentin, Rodriguez, Philippe

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jan2020, Vol. 38 Issue 1, p1-12, 12p

    مصطلحات موضوعية: SURFACE morphology, LASERS, OHMIC contacts, SURFACE states, INDIUM

    Find this article in full text from Scitation.
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  7. 7
    Croissance de diélectrique à forte permittivité par la technique MOCVD en phase liquide pulsée : Elaboration, et caractérisation de films de HfO2

    المؤلفون: Dabertrand, Karen

    المساهمون: Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Université Joseph-Fourier - Grenoble I, Gilbert Vincent(gilbert.vincent@ujf-grenoble.fr), Dabertrand, Karen

    المصدر: Micro et nanotechnologies/Microélectronique. Université Joseph-Fourier-Grenoble I, 2006. Français
    Micro et nanotechnologies/Microélectronique. Université Joseph-Fourier-Grenoble I, 2006. Français. ⟨NNT : ⟩

    مصطلحات موضوعية: electrical caracterization, [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, « high-k », Microelectronic, MOS, Microélectronique, high-k, crystal phases, transition thickness, caractérisations électriques, MOCVD, phases cristallines, épaisseur de transition, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, HfO2

    وصف الملف: application/pdf

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::9fd0bcdab43e990877cdfe1a8490ca01
    https://tel.archives-ouvertes.fr/tel-00130390/file/These_KD_fev07.pdf

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  8. 8
    مؤتمر
    Intrafield process control for 45 nm CMOS logic patterning.

    المؤلفون: Le Gratiet, Bertrand, Massin, Jean, Ostrovski, Alain, Monget, Cedric, Decaux, Marianne, Thivolle, Nicolas, Faure, Romuald, Baron, Fabrice, Chapon, Jean-Damien, Dabertrand, Karen, Sundermann, Frank, Gouraud, Pascal, Babaud, Laurène, Thevenon, Lionel, Cluet, Nicolas, VandeWalle, Boris

    المصدر: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72722P-72722P-10, 10p

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  9. 9
    مؤتمر
    Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning.

    المؤلفون: Dabertrand, Karen, Touchet, Mathieu, Kremer, Stephanie, Chaton, Catherine, Gatefait, Maxime, Aparicio, Enrique, Polli, Marco, Royer, Jean-Claude

    المصدر: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69220W-69220W-12, 12p

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  10. 10
    مؤتمر
    Process control for 45 nm CMOS logic gate patterning.

    المؤلفون: Le Gratiet, Bertrand, Gouraud, Pascal, Aparicio, Enrique, Babaud, Laurene, Dabertrand, Karen, Touchet, Mathieu, Kremer, Stephanie, Chaton, Catherine, Foussadier, Franck, Sundermann, Frank, Massin, Jean, Chapon, Jean-Damien, Gatefait, Maxime, Minghetti, Blandine, de-Caunes, Jean, Boutin, Daniel

    المصدر: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69220Z-69220Z-11, 11p

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