المؤلفون: GUAN Mengxue, FAN Qixiang, GUO Minglu, ZHANG Shuo, HAO Xuehui, WU Zhenghuan, CAO Fengting, WANG Tiegang

المصدر: Cailiao Baohu, Vol 57, Iss 5, Pp 128-136 (2024)

مصطلحات موضوعية: magnetron sputtering, deposition pressure, microstructure, mechanical property, high-temperature oxidation resistance, Materials of engineering and construction. Mechanics of materials, TA401-492, Technology

وصف الملف: electronic resource

Relation: http://www.mat-pro.com/fileup/1001-1560/PDF/20240516.pdf; https://doaj.org/toc/1001-1560

URL الوصول: https://doaj.org/article/2947aba9530948929630aa38f51e3702

المؤلفون: Gülten, Gökhan^Aff16, Yeşilyurt, Mustafa^Aff16, Yaylalı, Banu^Aff16, Totik, Yaşar^Aff16, Efeoğlu, İhsan^Aff16

المساهمون: Chaari, Fakher, Series Editor^Aff1, Gherardini, Francesco, Series Editor^Aff2, Ivanov, Vitalii, Series Editor^Aff3, Cavas-Martínez, Francisco, Editorial Board Member^Aff4, di Mare, Francesca, Editorial Board Member^Aff5, Haddar, Mohamed, Editorial Board Member^Aff6, Kwon, Young W., Editorial Board Member^Aff7, Trojanowska, Justyna, Editorial Board Member^Aff8, Xu, Jinyang, Editorial Board Member^Aff9, Maleque, Md. Abdul, editor^Aff10, Ahmad Azhar, Ahmad Zahirani, editor^Aff11, Sarifuddin, Norshahida, editor^Aff12, Syed Shaharuddin, Sharifah Imihezri, editor^Aff13, Mohd Ali, Afifah, editor^Aff14, Abdul Halim, Nor Farah Huda, editor^Aff15

المصدر: Proceeding of 5th International Conference on Advances in Manufacturing and Materials Engineering : ICAMME 2022, 9—10 August, Kuala Lumpur, Malaysia. :245-250

المؤلفون: Mingjie Zhao, Jiahao Yan, Yaotian Wang, Qizhen Chen, Rongjun Cao, Hua Xu, Dong-Sing Wuu, Wan-Yu Wu, Feng-Min Lai, Shui-Yang Lien, Wenzhang Zhu

المصدر: Nanomaterials, Vol 14, Iss 8, p 690 (2024)

مصطلحات موضوعية: α-IGZO, thin-film transistor (TFT), HiPIMS, two-step deposition pressure, room-temperature fabrication, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/14/8/690; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/f1e593b8d6de457a9414f29f81bdbaf3

المؤلفون: Hashim, S. B., Mahzan, N. H., Herman, S. H., Bakar, R. Abu, Noor, U. Mohd, Rusop, M.

المصدر: 2012 10th IEEE International Conference on Semiconductor Electronics (ICSE) Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on. :111-114 Sep, 2012

Relation: 2012 10th IEEE International Conference on Semiconductor Electronics (ICSE)

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المؤلفون: Wei-hang Chang, Hai-chao Cai, Yu-jun Xue, Xian-qing Lei, Hang Li

المصدر: Materials, Vol 16, Iss 3, p 1141 (2023)

مصطلحات موضوعية: deposition pressure, magnetron sputtering, rare earth, CrAgCeN coating, microstructure, mechanical properties, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85

وصف الملف: electronic resource

Relation: https://www.mdpi.com/1996-1944/16/3/1141; https://doaj.org/toc/1996-1944

URL الوصول: https://doaj.org/article/442dab58a3264d378f470b2f1d7e8a6b

المؤلفون: Yin-Hung Chen, Pei-Ing Lee, Shikha Sakalley, Chao-Kuang Wen, Wei-Chun Cheng, Hui Sun, Sheng-Chi Chen

المصدر: Nanomaterials, Vol 12, Iss 16, p 2814 (2022)

مصطلحات موضوعية: copper nitride (Cu3N) thin films, High Power Impulse Magnetron Sputtering (HiPIMS), peak power density, deposition pressure, conductivity type, Chemistry, QD1-999

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2079-4991/12/16/2814; https://doaj.org/toc/2079-4991

URL الوصول: https://doaj.org/article/ac314d6ed6234e8fb469b533824ca72c

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