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1
المؤلفون: Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sejung Ham, Dongsu Kim, Dongsuk Lim, Kangmin Lee, Jeongpyo Lee, Minho Jung, Nanglyeom Oh, Dongsub Choi, Hedvi Spielberg, Ohad Bachar
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::353269b1161aab4f664663159521c4ad
https://doi.org/10.1117/12.2670420 -
2
المؤلفون: Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Hong Goo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joon-Seuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, DoHwa Lee, Nanglyeom Oh, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a4ae546ca830c02f1716b12852fdfc72
https://doi.org/10.1117/12.2655681 -
3
المؤلفون: Hyun-Sok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, DongSub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::78f51fe1a7382a07e568f494f3690c2e
https://doi.org/10.1117/12.2657678 -
4
المؤلفون: Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, DongSub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0c05aa936e1e9836d39d6691bea3e420
https://doi.org/10.1117/12.2657632 -
5
المؤلفون: Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, DongYoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Chanha Park, DongSub Choi, Jeonghoon Lee
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9448f397f1a5148d5ab98e8292243c56
https://doi.org/10.1117/12.2607571 -
6
المؤلفون: Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, DongYoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::87c2c7efc3be8f8bbcc7e2039896893f
https://doi.org/10.1117/12.2608053 -
7
المؤلفون: Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Normalization (statistics), Reduction (complexity), Maxima and minima, Computer science, Brute-force search, Process optimization, Overlay, Statistical process control, Algorithm, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40281cffdd759f39620381e8b04e1092
https://doi.org/10.1117/12.2583638 -
8
المؤلفون: Chanha Park, Xiaolei Liu, Dongyoung Lee, Chen Dror, Eltsafon Ashwal, Dongsoo Kim, Sanghuck Jeon, Zephyr Liu, Katya Gordon, Honggoo Lee, Eitan Hajaj, Mark Ghinovker, Diana Shaphirov, Sang-Ho Lee, Dongsub Choi, Dohwa Lee, Raviv Yohanan
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Reduction (complexity), business.industry, Robustness (computer science), Computer science, Receiver autonomous integrity monitoring, Process (computing), Overlay, business, Grid, Computer hardware, Dram, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0c6be2fb79531aea498fc923d2afaeb1
https://doi.org/10.1117/12.2584524 -
9
المؤلفون: Ik-Hyun Jeong, Sanghuck Jeon, Liran Yerushalmi, Dongsub Choi, Honggoo Lee, Ohad Bachar, Boaz Ophir, Hyun-Sok Kim, Seung-Woo Koo, Dong-Jin Lee, Jeongpyo Lee, Alexander Verner
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Ground truth, Accuracy and precision, Computer science, business.industry, Computation, Total measurement, Overlay, Machine learning, computer.software_genre, Metrology, Node (circuits), Artificial intelligence, business, computer, Dram
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::83c1af938611bc489c437d241b6a6b12
https://doi.org/10.1117/12.2551850 -
10
المؤلفون: Anna Golotsvan, Efi Megged, Roie Volkivich, Dohwa Lee, Dongsub Choi, Jaesun Woo, Sanghuck Jeon, Jin-Soo Kim, Seongjae Lee, Dongyoung Lee, Honggoo Lee, Chunsoo Kang, Chanha Park, Shlomit Katz
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: Computer science, Electronic engineering, NAND gate, Tuner, Node (circuits), Overlay, Grating, Lithography, Dram, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7036c662aaea6e4c5a3625f36eb48f37
https://doi.org/10.1117/12.2541933