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المؤلفون: Donis G. Flagello
المصدر: Optical Microlithography XXXIV.
مصطلحات موضوعية: Microelectromechanical systems, Computer science, Emerging technologies, business.industry, Extreme ultraviolet lithography, Systems engineering, 3D printing, Augmented reality, Chip, business, Lithography, Field (computer science)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::044809aa614b968248c3a15a91b907ba
https://doi.org/10.1117/12.2589151 -
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المؤلفون: Donis G. Flagello, Daniel Smith
المصدر: aot. 1:237-248
مصطلحات موضوعية: Physics, business.industry, Computer vision, Artificial intelligence, business, Instrumentation, Lithography, Atomic and Molecular Physics, and Optics, Aerial image, Electronic, Optical and Magnetic Materials
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::629e570fae443560f55fcbb8ec25ed56
https://doi.org/10.1515/aot-2012-0028 -
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المؤلفون: Peter Jenkins, Bruce A. Tirri, Donis G. Flagello, Jan Mulkens, Harry Sewell, James A. McClay
المصدر: Journal of Photopolymer Science and Technology. 15:569-576
مصطلحات موضوعية: Window of opportunity, Materials science, Birefringence, Polymers and Plastics, business.industry, Computational lithography, Organic Chemistry, Context (language use), Optics, Materials Chemistry, Laser illumination, business, Lithography, Maskless lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d3a000b7d9f44d8209fbe5ed72b32231
https://doi.org/10.2494/photopolymer.15.569 -
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المصدر: SPIE Proceedings.
مصطلحات موضوعية: Image formation, Optical proximity correction, Computational lithography, Computer science, Computer graphics (images), Hardware_INTEGRATEDCIRCUITS, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Near and far field, Algorithm, Lithography, Finite element method
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::31eea58dc3302268507a4a228ea2454f
https://doi.org/10.1117/12.2011613 -
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المؤلفون: Tomoyuki Matsuyama, Tomoya Noda, Naonori Kita, Ryota Matsui, Donis G. Flagello, Hajime Aoyama
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Variable (computer science), Computer science, Real-time computing, Process window, Degrees of freedom (mechanics), Algorithm
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::19c87d43d8fd788cc529352e70970470
https://doi.org/10.1117/12.2008267 -
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المؤلفون: Tomoyuki Matsuyama, Ryota Matsui, Kazuhiro Yano, Donis G. Flagello
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Optics, business.industry, Computer science, Extreme ultraviolet, Optical engineering, Extreme ultraviolet lithography, Electronic engineering, Surface finish, Photoresist, Thin film, Threshold model, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dac9bb4ddcf8b71162519fd5b4befe3b
https://doi.org/10.1117/12.917030 -
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المؤلفون: Tomoyuki Matsuyama, Ryota Matsui, Nobumichi Kanayamaya, Naonori Kita, Shane R. Palmer, Donis G. Flagello, Daniel Smith
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Loop (topology), Computer science, business.industry, Immersion (virtual reality), Computer vision, Artificial intelligence, business, Pupil
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::55b06a070bd5866952f8a0cd8448fc6b
https://doi.org/10.1117/12.879116 -
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المؤلفون: Lin Zschiedrich, Frank Schmidt, Donis G. Flagello, Sven Burger, Jan Pomplun, Jacek K. Tyminski, Nakashima Toshiharu
مصطلحات موضوعية: Basis (linear algebra), Computational lithography, Computer science, FOS: Physical sciences, Solver, Computational Physics (physics.comp-ph), Finite element method, Modeling and simulation, Node (circuits), Lithography, Algorithm, Physics - Computational Physics, Immersion lithography, Optics (physics.optics), Physics - Optics
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3241de6539643e90d0e56c9ae4704ebe
http://arxiv.org/abs/1011.2902 -
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المؤلفون: Frank Hartung, Robert Kazinczi, Scott Halle, Young O. Kim, Frank Rohmund, Jaione Tirapu-Azpiroz, Joerg Zimmermann, Geoffrey W. Burr, John A. Hoffnagle, Rene Carpaij, Joost Hageman, Daniel Corliss, Bernhard Kneer, Saeed Bagheri, Christoph Hennerkes, Carsten Russ, Michael S. Hibbs, Manfred Maul, Alfred Wagner, Donis G. Flagello, Greg McIntyre, Moutaz Fakhry, Tom Faure, Martin Burkhardt, Alan E. Rosenbluth, Kafai Lai, Andre Engelen, Kehan Tian, Remco Jochem Sebastiaan Groenendijk, Emily Gallagher, David O. S. Melville
المصدر: SPIE Proceedings.
مصطلحات موضوعية: business.industry, Computer science, Emphasis (telecommunications), ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Mask inspection, Integrated circuit design, Lithography process, law.invention, Optics, law, Electronic engineering, Wafer, Node (circuits), Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8fce3aad081efaf57fa2ff563aa36102
https://doi.org/10.1117/12.814680 -
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المؤلفون: Kehan Tian, Alan E. Rosenbluth, Donis G. Flagello, Vladan Blahnik, David O. S. Melville, Michael Totzeck, Kafai Lai, Armand Eugene Albert Koolen, Jaione Tirapu Azpiroz
المصدر: Optical Microlithography XXI.
مصطلحات موضوعية: Diffraction, Angular spectrum method, Physics, Brightness, Optics, Pixel, Optical proximity correction, business.industry, Solid angle, Radiance, Trigonometric functions, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8009bccb68f4310a4c4d483b2a54a026
https://doi.org/10.1117/12.775121