يعرض 1 - 10 نتائج من 33 نتيجة بحث عن '"Du, Chunshan"', وقت الاستعلام: 1.10s تنقيح النتائج
  1. 1
    مؤتمر
    A.I. Driven Process Control by Machine Learning Based Virtual Metrology for High Product Mix Manufacturing

    المؤلفون: Lee, Hyung Joo, Choi, Sanghyun, Greeneltch, Nathan, Jayaram, Srividya, Zhang, Shiwei, Wan, Qijian, Du, Chunshan

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-3 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  2. 2
    مؤتمر
    Photolithography Hotspot Detection Based on Deep Learning LHD Model

    المؤلفون: Jiang, Xiaolong, Ren, Kun, Lin, Zebang, Gao, Dawei, Wu, Yongyu, Jin, Yadong, Du, Chunshan, Tian, Zhengguo, Zou, Sihang, Sun, Chenwei, Hu, Xinyi, Wan, Qijian

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-5 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  3. 3
    مؤتمر
    Metrology Evaluation Indicators of Gate Line End Patterning of SRAM by Using SEM Contour Extraction

    المؤلفون: Wang, Rui, Ren, Kun, Gao, Dawei, Wu, Yongyu, Li, Xiaoci, Wan, Qijian, Zou, Sihang, Du, Chunshan

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-3 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  4. 4
    مؤتمر
    Designing high quality test chips with improved coverage for design rule exploration, process variation improvement and hotspot discovery

    المؤلفون: Chen, Yining, Guo, Pang, Kwan, Joe, Kabeel, Aliaa, Rizk, Sarah, Du, Chunshan, Hu, Xinyi, Wan, Qijian, Yan, Xizi

    المصدر: 2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-4 Oct, 2022

    Relation: 2022 International Workshop on Advanced Patterning Solutions (IWAPS)

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  5. 5
    مؤتمر
    Contour based process characterization and modeling for HVM

    المؤلفون: Zhou, Kan, Wan, Qijian, Chen, Ao, Zhou, Wenzhan, Du, Chunshan, Zhang, Recoo, Zhang, Yu, Wu, Wenming, Fenger, Germain, Rampoori, Seshadri

    المصدر: 2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-6 Oct, 2022

    Relation: 2022 International Workshop on Advanced Patterning Solutions (IWAPS)

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  6. 6
    مؤتمر
    Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours and feed forward intra CDU by mask MTT

    المؤلفون: Zhou, Kan, Zhao, Hongwen, Zhou, Wenzhan, Zhang, Yu, Chen, Ao, Wu, Wenming, Wan, Qijian, Dou, Huaiyang, Du, Chunshan, Zhang, Liguo, Fenger, Germain

    المصدر: 2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-5 Oct, 2022

    Relation: 2022 International Workshop on Advanced Patterning Solutions (IWAPS)

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  7. 7
    مؤتمر
    SONR based layout decomposition and applications

    المؤلفون: Xu, Rui, Li, Xuan, Jin, Yao, Jiang, Xiaolong, Yang, Lingxue, Ren, Kun, Wu, Yongyu, Gao, Dawei, Du, Chunshan, Wan, Qijian, Hu, Xinyi, Zou, Sihang, Jiang, Fan, Hong, Le

    المصدر: 2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-3 Oct, 2022

    Relation: 2022 International Workshop on Advanced Patterning Solutions (IWAPS)

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  8. 8
    مؤتمر
    Contour Based Solution For Identifying Mask Induced Error

    المؤلفون: Yu, Yinsheng, Liu, Guoping, Zhao, Hongwen, Zhou, Kan, Li, Yuhui, Zhou, Wenzhan, Zhang, Yu, Wan, Qijian, Chen, Ao, Du, Chunshan, Zhang, Liguo, Fenger, Germain

    المصدر: 2021 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2021 International Workshop on. :1-3 Dec, 2021

    Relation: 2021 International Workshop on Advanced Patterning Solutions (IWAPS)

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  9. 9
    مؤتمر
    Reducing Systematic Defects using Calibre Wafer Defect Engineering and Machine Learning Solutions

    المؤلفون: Jiang, Jet, Hou, Frank, Li, Gavin, Chen, Summy, Fei, Marfei, Xie, Qian, Cao, Liang, Wan, Qijian, Hu, Xinyi, Du, Chunshan, Wang, David, Huang, Elven, Paninjath, Sankaranarayanan, Madhusudhan, Saikiran, Tian, Leo

    المصدر: 2020 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2020 International Workshop on. :1-3 Nov, 2020

    Relation: 2020 International Workshop on Advanced Patterning Solutions (IWAPS)

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  10. 10
    دورية أكاديمية

    لا يتم عرض هذه النتيجة على الضيوف.

    View this record from ISI Web of Science
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