يعرض 1 - 10 نتائج من 28,404 نتيجة بحث عن '"EXTREME-ULTRAVIOLET"', وقت الاستعلام: 0.83s تنقيح النتائج
  1. 1
    مؤتمر
    Towards Full Field-of-View Fourier Ptychography for Extreme Ultraviolet Microscope

    المؤلفون: Gu, Chaoying, Islegen-Wojdyla, Antoine, Benk, Markus, Goldberg, Kenneth A., Waller, Laura

    المصدر: 2024 IEEE Conference on Computational Imaging Using Synthetic Apertures (CISA) Computational Imaging Using Synthetic Apertures (CISA), 2024 IEEE Conference on. :01-05 May, 2024

    Relation: 2024 IEEE Conference on Computational Imaging Using Synthetic Apertures (CISA)

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  2. 2
    مؤتمر
    Multi-Modal Extreme-Ultraviolet Reflectometer: Solving Inverse Problems in Nanostructure Metrology

    المؤلفون: Shao, Yunzhe, Jenkins, Nicholas W., Klein, Clay, Li, Yunhao, Esashi, Yuka, Murnane, Margaret M., Kapteyn, Henry C., Tanksalvala, Michael

    المصدر: 2024 IEEE Conference on Computational Imaging Using Synthetic Apertures (CISA) Computational Imaging Using Synthetic Apertures (CISA), 2024 IEEE Conference on. :1-5 May, 2024

    Relation: 2024 IEEE Conference on Computational Imaging Using Synthetic Apertures (CISA)

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  3. 3
    دورية أكاديمية
    High-Performance 4H-SiC EUV Photodiode With Lateral p-n Junction Fabricated by Selective-Area Ion Implantation

    المؤلفون: Wang, Y., Wang, Z., Xu, W., Zhou, F., Zhou, D., Ren, F., Chen, D., Zhang, R., Zheng, Y., Lu, H.

    المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 45(5):857-860 May, 2024

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  4. 4
    مؤتمر
    Advances, Application and Challenges of Lithography Techniques

    المؤلفون: Raza, Ali, Saeed, Zubair, Aslam, Adnan, Nizami, Syeda Mehwish, Habib, Kanwal, Malik, Ahmad Nazir

    المصدر: 2024 5th International Conference on Advancements in Computational Sciences (ICACS) Advancements in Computational Sciences (ICACS), 2024 5th International Conference on. :1-6 Feb, 2024

    Relation: 2024 5th International Conference on Advancements in Computational Sciences (ICACS)

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  5. 5
    دورية أكاديمية
    The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades

    المؤلفون: Kaiser, W.

    المصدر: IEEE Electron Devices Magazine IEEE Electron Devices Mag. Electron Devices Magazine, IEEE. 2(1):23-34 Mar, 2024

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  6. 6
    دورية أكاديمية
    Patterning Infrastructure Development for Advanced EUV Lithography: Continuing Dimensional Scaling Through EUV Lithography to Support Moore’s Law

    المؤلفون: Ronse, K.

    المصدر: IEEE Electron Devices Magazine IEEE Electron Devices Mag. Electron Devices Magazine, IEEE. 2(1):35-44 Mar, 2024

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  7. 7
    دورية أكاديمية
    Exposure Tool Development Toward Advanced EUV Lithography: A Journey of 40 Years Driving Moore’s Law

    المؤلفون: Schoot, J.v.

    المصدر: IEEE Electron Devices Magazine IEEE Electron Devices Mag. Electron Devices Magazine, IEEE. 2(1):8-22 Mar, 2024

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  8. 8
    مؤتمر
    Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

    المؤلفون: Zhang, Xinyi, Chen, Yuqing, Nan, Yanbei, Li, Yanqiu

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-5 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  9. 9
    مؤتمر
    EUV Energy Efficiency

    المؤلفون: Thijssen, Theo, Van der Net, Ton, Janssen, Toni, Luijten, Carlo

    المصدر: 2023 International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2023 International. :1-4 Dec, 2023

    Relation: 2023 International Electron Devices Meeting (IEDM)

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  10. 10
    دورية أكاديمية
    Dissociative photoionization of phenyl triflate, a photoacid generator for photolithography, at 92 eV.

    المؤلفون: Laffert, V., Sajjadian, F. S., Richter, R., van Setten, M. J., Holzmeier, F.

    المصدر: Journal of Chemical Physics; 4/7/2024, Vol. 160 Issue 13, p1-8, 8p

    مصطلحات موضوعية: PHOTOLITHOGRAPHY, PHOTOIONIZATION, COINCIDENCE circuits, EXTREME ultraviolet lithography, SYNCHROTRON radiation, INTEGRATED circuits

    Find this article in full text from Scitation.
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