المؤلفون: Davis, C., Ku, J.H., Schiml, T., Sudijono, J., Yang, I., Steegen, A., Coolbough, D., Hierlemann, M., Ng, H., Amos, R., Sherony, M., Belyansky, M., Widodo, J., Tjoa, T., Edleman, N., Kwon, O., Panda, S., Yuan, J., Nguyen, P., Nivo, N., Luo, Z., Chidambarrao, D., Stierstorfer, R., Kim, J., Park, J., Ajmera, A., Baiocco, C., Ko, Y., Tan, S.S., Teh, Y.W., Dyer, T., Gao, W., Fang, S., Chen, X.

المصدر: 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers. VLSI Technology, 2006. Digest of Technical Papers. 2006 Symposium on. :60-61 2006

Relation: 2006 Symposium on VLSI Technology

المؤلفون: Park, D.-G., Luo, Z.J., Edleman, N., Zhu, W., Nguyen, P., Wong, K., Cabral, C., Jamison, P., Lee, B.H., Chou, A., Chudzik, M., Bruley, J., Gluschenkov, O., Ronsheim, P., Chakravarti, A., Mitchell, R., Ku, V., Kim, H., Duch, E., Kozlowski, P., D'Emic, C., Narayanan, V., Steegen, A., Wise, R., Jammy, R., Rengarajan, R., Ng, H., Sekiguchi, A., Wann, C.H.

المصدر: Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. VLSI technology VLSI Technology, 2004. Digest of Technical Papers. 2004 Symposium on. :186-187 2004

Relation: 2004 Symposium on VLSI Technology. Digest of Technical Papers

المؤلفون: Divakaruni, R., Radens, C., Belyansky, M., Chudzik, M., Park, D.-G., Saroop, S., Chidambarrao, D., Weybright, M., Akatsu, H., Economikos, L., Settlemyer, K., Strane, J., Dobuzinsky, D., Edleman, N., Feng, G., Li, Y., Jammy, R., Crabbe, E., Bronner, G.

المصدر: 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) VLSI technology VLSI Technology, 2003. Digest of Technical Papers. 2003 Symposium on. :59-60 2003

Relation: 2003 Symposium on VLSI Technology. Digest of Technical Papers

المؤلفون: Wang, A., Babcock, J. R., Edleman, N. L., Metz, A. W., Lane, M. A., Asahi, R., Dravid, V. P., Kannewurf, C. R., Freeman, A. J., Marks, T. J.

المصدر: Proceedings of the National Academy of Sciences of the United States of America, 2001 Jun . 98(13), 7113-7116.

URL الوصول: https://www.jstor.org/stable/3055951

المؤلفون: Belot, J. A., Wang, A., Edleman, N. L., Babcock, J. R., Metz, M. V., Marks, T. J.^Aff16, Markworth, P. R., Chang, R. P. H.

المصدر: MRS Online Proceedings Library. 574(1):37-43

المؤلفون: Babcock, J. R., Wang, A., Edleman, N. L., Benson, D. D., Metz, A. W., Metz, M. V., Marks, T. J.^{Aff143, IDArt43_cor7}

المصدر: MRS Online Proceedings Library. 623(1)

المؤلفون: Edleman, N. L., Belot, J. A., Babcock, J. R., Metz, A. W., Metz, M. V., Stern, C. L., Marks, T. J.^{Aff150, IDArt50_cor7}

المصدر: MRS Online Proceedings Library. 623(1)

المؤلفون: Wang, A., Edleman, N. L., Babcock, J. R., Marks, T. J., Lane, M. A., Brazis, P. W., Kannewurf, C. R.

المصدر: MRS Online Proceedings Library. 607(1)

المؤلفون: Babcock, J. R., Wang, A., Metz, A. W., Edleman, N. L., Metz, M. V., Lane, M. A., Kannewurf, C. R., Marks, T. J.

المصدر: Chemical Vapor Deposition; Nov2001, Vol. 7 Issue 6, p239-242, 4p

المؤلفون: Cui, J., Wang, A., Edleman, N. L., Ni, J., Lee, P., Armstrong, N. R., Marks, T. J.

المصدر: Advanced Materials; Oct2001, Vol. 13 Issue 19, p1476-1480, 5p