يعرض 1 - 10 نتائج من 137 نتيجة بحث عن '"Electron resists"', وقت الاستعلام: 0.96s تنقيح النتائج
  1. 1
    دورية أكاديمية
    Identification of Important Parameters for Laser Photoresist Removal Process Through the Use of Adaptive Neuro-Fuzzy Inference System (ANFIS) Methodology.

    المؤلفون: PETKOVIĆ, B., RESIC, S., PETKOVIĆ, D.

    المصدر: International Journal of Laser Science: Fundamental Theory & Analytical Methods; 2021, Vol. 2 Issue 3/4, p181-193, 13p

    مصطلحات موضوعية: PHOTORESISTS, MICROELECTRONICS, ELECTRON resists, FUZZY systems, EXCIMER lasers

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  2. 2
    دورية أكاديمية
    Energetic Ion Reflections at Interplanetary Shocks: First Observations From ARTEMIS.

    المؤلفون: Zhou, Xiaoyan, Gedalin, Michael, Russell, Christopher T., Angelopoulos, Vassilis, Drozdov, Alexander Y.

    المصدر: Journal of Geophysical Research. Space Physics; Nov2020, Vol. 125 Issue 11, p1-17, 17p

    مصطلحات موضوعية: ELECTRON resists, MAGNETIC reconnection, ELECTRODYNAMICS, HYPOTHESIS, QUANTITATIVE research

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  3. 3
    دورية أكاديمية
    Magnetotransport Study on Iron Doped Novel 2D Nanoribbons via Electron – Acoustical Phonon Interactions.

    المؤلفون: Pandya, Ankur, Jha, Prafulla K.

    المصدر: International Journal of Nanoscience; Dec2018, Vol. 17 Issue 6, pN.PAG-N.PAG, 7p

    مصطلحات موضوعية: ELECTRON transport, PHONONS, ELECTRON resists, TRANSITION metals, NANORIBBONS

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  4. 4
    دورية أكاديمية
    Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography.

    المؤلفون: Bhattarai, Suchit, Neureuther, Andrew R., Naulleau, Patrick P.

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-10, 10p

    مصطلحات موضوعية: PHOTORESISTS, EXTREME ultraviolet lithography, ELECTRON beam lithography, ELECTRON energy loss spectroscopy, ELECTRON resists

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  5. 5
    دورية أكاديمية
    Improvement of Ohmic contacts on Ga2O3 through use of ITO-interlayers.

    المؤلفون: Carey IV, Patrick H., Jiancheng Yang, Fan Ren, Hays, David C., Pearton, Stephen J., Akito Kuramata, Kravchenko, Ivan I.

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-5, 5p

    مصطلحات موضوعية: OHMIC contacts, ANNEALING of metals, ELECTRON transport, ELECTRON resists, CONTACT resistance (Materials science)

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  6. 6
    دورية أكاديمية
    Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography.

    المؤلفون: Caillau, Mathieu, Crémillieu, Pierre, Laurenceau, Emmanuelle, Chevolot, Yann, Leclercq, Jean-Louis, Alekseev, Sergeï, Chevalier, Céline, Delair, Thierry

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-6, 6p

    مصطلحات موضوعية: ELECTRON beam lithography, CHITOSAN, NANOLITHOGRAPHY, SILICA, PLASMA etching, ELECTRON resists

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  7. 7
    دورية أكاديمية
    Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization.

    المؤلفون: Sharp, Brandon L., Narcross, Hannah L., Tolbert, Laren M., Henderson, Clifford L.

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-7, 7p

    مصطلحات موضوعية: DEPOLYMERIZATION, CROSSLINKING (Polymerization), ACID catalysts, ELECTRON beam lithography, ELECTRON resists

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  8. 8
    دورية أكاديمية
    Adjustable sidewall slopes by electron-beam exposure layout.

    المؤلفون: Kaspar, Corinna, Butschke, Jörg, Irmscher, Mathias, Martens, Stephan, Sailer, Holger, Kirchner, Robert, Guzenko, Vitaliy A., Schift, Helmut, Burghartz, Joachim N.

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-6, 6p

    مصطلحات موضوعية: ELECTRON beam lithography, NANOFABRICATION, MICROFABRICATION, ELECTRON resists, THIN films, POLYMETHYLMETHACRYLATE

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  9. 9
    دورية أكاديمية
    Isofocal dose based proximity effect correction tolerance to the effective process blur.

    المؤلفون: Lopez, Gerald G., Azadi, Mohsen, Metzler, Meredith G., Belic, Nikola, Hofmann, Ulrich

    المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2017, Vol. 35 Issue 6, p1-8, 8p

    مصطلحات موضوعية: ELECTRON beam lithography, ELECTRON resists, ELECTRON beam focusing, ELECTRON beams, PARTICLE beam focusing

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  10. 10
    دورية أكاديمية
    Fabrication of three-dimensional microstructures in positive photoresist through two-photon direct laser writing.

    المؤلفون: Tsutsumi, Naoto, Fukuda, Asato, Nakamura, Ryotaro, Kinashi, Kenji, Sakai, Wataru

    المصدر: Applied Physics A: Materials Science & Processing; Aug2017, Vol. 123 Issue 8, p1-7, 7p

    مصطلحات موضوعية: PHOTORESISTS, MICROELECTRONICS, ELECTRON resists, FEMTOSECOND lasers, LASERS

    Find this article in full text from Springer Verlag. Full Text Finder
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