يعرض 1 - 10 نتائج من 185 نتيجة بحث عن '"Elisabeth, Blanquet"', وقت الاستعلام: 2.39s تنقيح النتائج
  1. 1
    In the New Potential Synthesis Route of Molybdenum Nitride Nanosheets by Nitriding Mos2 Deposited by Atomic Layer Deposition (Ald)

    المؤلفون: Julien Patouillard, Rémy Gassilloud, Frédéric Mercier, Arnaud Mantoux, Raphaël Boichot, Mathieu Bernard, Nicolas Gauthier, Stéphane Cadot, Christine Raynaud, Frédéric Gianesello, Elisabeth Blanquet

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b624e4d2dc53b27f425435c21c708138
    https://doi.org/10.2139/ssrn.4367262

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  2. 2
    Synthesis of upconversion TiO2:Er3+-Yb3+ nanoparticles and deposition of thin films by spin coating technique

    المؤلفون: Fatma Trabelsi, Frédéric Mercier, Alexandre Crisci, R. Salhi, Elisabeth Blanquet

    المساهمون: Science et Ingénierie des Matériaux et Procédés (SIMaP), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)

    المصدر: Ceramics International
    Ceramics International, Elsevier, 2020, 46 (18), pp.28183-28192. ⟨10.1016/j.ceramint.2020.07.317⟩

    مصطلحات موضوعية: Spin coating, Materials science, Process Chemistry and Technology, Nanoparticle, [CHIM.MATE]Chemical Sciences/Material chemistry, 02 engineering and technology, [CHIM.INOR]Chemical Sciences/Inorganic chemistry, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Photon upconversion, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, [SPI]Engineering Sciences [physics], [CHIM.GENI]Chemical Sciences/Chemical engineering, Chemical engineering, Materials Chemistry, Ceramics and Composites, Deposition (phase transition), [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Thin film, 0210 nano-technology, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::064b7e0208ac2d685e57052226f36543
    https://doi.org/10.1016/j.ceramint.2020.07.317

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  3. 3
    Green upconversion improvement of TiO2 codoped Er3+-Yb3+ nanoparticles based thin film by adding ALD-Al2O3 for silicon solar cell applications

    المؤلفون: Fatma Trabelsi, Frédéric Mercier, Elisabeth Blanquet, Alexandre Crisci, Raphael Boichot, Danying Chen, Rached Salhi

    المصدر: Journal of Luminescence. 252:119282

    مصطلحات موضوعية: Biophysics, General Chemistry, Condensed Matter Physics, Biochemistry, Atomic and Molecular Physics, and Optics

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c69b8e4ecd4a9e7042b7bfc4798c814
    https://doi.org/10.1016/j.jlumin.2022.119282

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  4. 4
    Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Deposition

    المؤلفون: Liang Tian, Stéphane Daniele, Erwann Jeanneau, Shashank Mishra, Catherine Marichy, Rajeev Ahuja, Deobrat Singh, Elisabeth Blanquet, Ioana Nuta

    المساهمون: Institut de recherches sur la catalyse et l'environnement de Lyon (IRCELYON), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut des Sciences Analytiques (ISA), Science et Ingénierie des Matériaux et Procédés (SIMaP), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA), Department of Physics and Astronomy [Uppsala], Uppsala University, Indian Institute of Technology Ropar (IIT Ropar), Laboratoire des Multimatériaux et Interfaces (LMI), Catalyse, Polymérisation, Procédés et Matériaux (CP2M), Université de Lyon-Université de Lyon-École supérieure de Chimie Physique Electronique de Lyon (CPE)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Centre de diffractométrie Henri Longchambon, Institut de Chimie de Lyon, École normale supérieure de Lyon (ENS de Lyon)-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-École normale supérieure de Lyon (ENS de Lyon)-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon, Université de Lyon-Université de Lyon-École Supérieure de Chimie Physique Électronique de Lyon (CPE)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut de Chimie du CNRS (INC)-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)

    المصدر: Crystal Growth & Design
    Crystal Growth & Design, American Chemical Society, 2021, ⟨10.1021/acs.cgd.1c01136⟩
    Crystal Growth & Design, 2021, ⟨10.1021/acs.cgd.1c01136⟩

    مصطلحات موضوعية: Materials science, Inorganic chemistry, 02 engineering and technology, Chemical vapor deposition, 010402 general chemistry, 01 natural sciences, deposition, Adduct, chemical vapor deposition, Metal, chemistry.chemical_compound, [CHIM.ANAL]Chemical Sciences/Analytical chemistry, [CHIM]Chemical Sciences, General Materials Science, Redistribution (chemistry), Thin film, Bimetallic strip, ligands, General Chemistry, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 0104 chemical sciences, chemistry, thin films, visual_art, Alkoxide, visual_art.visual_art_medium, precursors, 0210 nano-technology, Derivative (chemistry)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::565fc3131d1faa06c79146c6716d5cab
    https://hal.archives-ouvertes.fr/hal-03510420

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  5. 5
    Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor deposition

    المؤلفون: Jorge Sánchez Espinoza, Fatma Trabelsi, Christophe Escape, Ludovic Charpentier, Marc Fivel, Elisabeth Blanquet, Frédéric Mercier

    المصدر: Surface and Coatings Technology. 447:128815

    مصطلحات موضوعية: Materials Chemistry, Surfaces and Interfaces, General Chemistry, Condensed Matter Physics, Surfaces, Coatings and Films

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3580da5c2cedb9d8b396fd8f877e17fa
    https://doi.org/10.1016/j.surfcoat.2022.128815

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  6. 6
    Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

    المؤلفون: Frédéric Mercier, Michel Pons, Elisabeth Blanquet, Juan Su, Raphaël Boichot

    المساهمون: Science et Ingénierie des Matériaux et Procédés (SIMaP ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])

    المصدر: CrystEngComm
    CrystEngComm, Royal Society of Chemistry, 2019, 21 (26), pp.3974-3981. ⟨10.1039/C9CE00488B⟩

    مصطلحات موضوعية: Materials science, chemistry.chemical_element, 02 engineering and technology, Chemical vapor deposition, 01 natural sciences, chemistry.chemical_compound, TiN, 0103 physical sciences, Decorative and functional coatings, General Materials Science, Texture (crystalline), Thin film, 010302 applied physics, Supersaturation, [CHIM.MATE]Chemical Sciences/Material chemistry, General Chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Titanium nitride, Amorphous solid, Chemical Vapor Deposition, chemistry, Chemical engineering, 0210 nano-technology, Tin, Titanium

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a53d2bc787ced14c325c870096db2875
    https://doi.org/10.1039/c9ce00488b

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  7. 7
    MOCVD Copper Metallization for High Aspect Ratios TSV 3D Integration

    المؤلفون: Elisabeth Blanquet, Dean Stephens, Patrice Gergaud, Chris Jones, Thierry Mourier, Sabrina Fadloun, Steve Burgess, Amit Rastogi

    المصدر: International Symposium on Microelectronics. 2018:000718-000727

    مصطلحات موضوعية: Materials science, business.industry, chemistry.chemical_element, 02 engineering and technology, Chemical vapor deposition, 010402 general chemistry, 021001 nanoscience & nanotechnology, Microstructure, 01 natural sciences, Copper, 0104 chemical sciences, Barrier layer, chemistry, Automotive Engineering, Optoelectronics, Wafer, Metalorganic vapour phase epitaxy, 0210 nano-technology, business, Tin, Layer (electronics)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::660df4e05091d3f13ea5a32f624dd2ab
    https://doi.org/10.4071/2380-4505-2018.1.000718

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  8. 8
    Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface properties

    المؤلفون: Frédéric Mercier, E. Gicquel, Jean-Jacques Blandin, Carmen Jiménez, Rémy Dendievel, Elisabeth Blanquet, Michel Pons, A. Moll

    المساهمون: Science et Ingénierie des Matériaux et Procédés (SIMaP), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA), Laboratoire des matériaux et du génie physique (LMGP ), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA)

    المصدر: Surface and Coatings Technology
    Surface and Coatings Technology, Elsevier, 2021, 415, pp.127130. ⟨10.1016/j.surfcoat.2021.127130⟩
    Surface and Coatings Technology, Elsevier, 2021, 415, ⟨10.1016/j.surfcoat.2021.127130⟩

    مصطلحات موضوعية: Materials science, 02 engineering and technology, Substrate (electronics), Surface finish, Chemical vapor deposition, engineering.material, 010402 general chemistry, 01 natural sciences, Nitrides, Coating, chemistry.chemical_compound, Atomic layer deposition, Barrier layer, Oxidation, Materials Chemistry, Deposition (phase transition), Titanium alloys, Surfaces and Interfaces, General Chemistry, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Microstructure, CVD, Titanium nitride, 0104 chemical sciences, Surfaces, Coatings and Films, chemistry, Chemical engineering, engineering, 0210 nano-technology

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d75f08282f035f53d3a68f18a6a86c7f
    https://hal.archives-ouvertes.fr/hal-03262005

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  9. 9
    Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

    المؤلفون: Francois Weiss, Victor Marchetto, G. Berthomé, Frédéric Mercier, Arnaud Mantoux, Ivane Bottala-Gambetta, Roman Reboud, Laetitia Rapenne, Alexandre Crisci, A. Sulpice, Manoel Jacquemin, Carmen Jiménez, Liang Tian, Elisabeth Blanquet

    المساهمون: Science et Ingénierie des Matériaux et Procédés (SIMaP), Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Magnétisme et Supraconductivité (MagSup), Institut Néel (NEEL), Université Grenoble Alpes (UGA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes (UGA)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Laboratoire des matériaux et du génie physique (LMGP ), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2020-....] (UGA [2020-....])-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes [2020-....] (UGA [2020-....]), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes [2020-....] (UGA [2020-....])-Université Grenoble Alpes [2020-....] (UGA [2020-....])-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes [2020-....] (UGA [2020-....])-Université Grenoble Alpes [2020-....] (UGA [2020-....])-Centre National de la Recherche Scientifique (CNRS), Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes [2020-....] (UGA [2020-....])-Université Grenoble Alpes [2020-....] (UGA [2020-....]), Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2020-....] (UGA [2020-....])-Institut polytechnique de Grenoble - Grenoble Institute of Technology [2020-....] (Grenoble INP [2020-....]), Institut polytechnique de Grenoble - Grenoble Institute of Technology [2020-....] (Grenoble INP [2020-....]), Université Grenoble Alpes [2020-....] (UGA [2020-....])-Université Grenoble Alpes [2020-....] (UGA [2020-....])-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology [2020-....] (Grenoble INP [2020-....]), Laboratoire des matériaux et du génie physique [2020-....] (LMGP [2020-....]), Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)-Institut polytechnique de Grenoble - Grenoble Institute of Technology [2020-....] (Grenoble INP [2020-....])

    المصدر: Thin Solid Films
    Thin Solid Films, Elsevier, 2020, 709, pp.138232. ⟨10.1016/j.tsf.2020.138232⟩

    مصطلحات موضوعية: Materials science, Niobium nitride, Annealing (metallurgy), Niobium, chemistry.chemical_element, 02 engineering and technology, Thermal treatment, [CHIM.INOR]Chemical Sciences/Inorganic chemistry, 01 natural sciences, [SPI]Engineering Sciences [physics], Atomic layer deposition, chemistry.chemical_compound, [CHIM.GENI]Chemical Sciences/Chemical engineering, Condensed Matter::Superconductivity, 0103 physical sciences, Materials Chemistry, Thin film, Composite material, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, ComputingMilieux_MISCELLANEOUS, 010302 applied physics, Superconductivity, Superconducting radio frequency, Metals and Alloys, Surfaces and Interfaces, [CHIM.MATE]Chemical Sciences/Material chemistry, 021001 nanoscience & nanotechnology, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry, 13. Climate action, 0210 nano-technology

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b98249980bb3976289b41cc0739e041
    https://hal.archives-ouvertes.fr/hal-03053402

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  10. 10
    In situ x-ray studies of the incipient ZnO atomic layer deposition on In0.53Ga0.47As

    المؤلفون: L. Pithan, Elisabeth Blanquet, Hubert Renevier, Jean-Luc Deschanvres, Evgeniy V. Skopin, G. Ciatto, Marie-Ingrid Richard, Dillon D. Fong, Laetitia Rapenne

    المصدر: Physical Review Materials. 4

    مصطلحات موضوعية: 010302 applied physics, In situ, Atomic layer deposition, Materials science, Physics and Astronomy (miscellaneous), 0103 physical sciences, X-ray, Analytical chemistry, General Materials Science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 0210 nano-technology, 01 natural sciences

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::26b7978b33a140a0d7e7b5a5d2448f03
    https://doi.org/10.1103/physrevmaterials.4.043403

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